J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 1 X-ray Optics J. B. Hastings Beam definition Attenuators Slits Pulse picker Focusing Be lens Kirkpatrick-Baez Mirror systems Diffractive optics Monochromator Pulse compressor Split and delay Summary Beam definition Attenuators Slits Pulse picker Focusing Be lens Kirkpatrick-Baez Mirror systems Diffractive optics Monochromator Pulse compressor Split and delay Summary

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics SXR Imag 2AMOS (LCLS) 3XR pump-probe Full instrument 4XPCS Full instrument 5CXI Full instrument 6HEDS 1SXR Imag 2AMOS (LCLS) 3XR pump-probe Full instrument 4XPCS Full instrument 5CXI Full instrument 6HEDS LCLS LUSI HEDS (NNSA) Offset Monochromator Exp. Chamber Detector Beam Transport LUSI schematic XPP 3 XCS CXI

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 3 Instruments XCS XPPCXI

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 4 Attenuators XCSXPPCXI Attenuators Variable, up to 10 6 reduction High damage threshold (Be or B 4 C) Attenuators Variable, up to 10 6 reduction High damage threshold (Be or B 4 C)

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 5 Slits System XCSXPPCXI Slit systems Variable horizontal and vertical gap from 5 μm – 5 mm Can withstand full LCLS flux – unfocused Minimize background scatter from blades Slit systems Variable horizontal and vertical gap from 5 μm – 5 mm Can withstand full LCLS flux – unfocused Minimize background scatter from blades B. Lengeler et al., J. Synchrotron Rad., 6, (1999).

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 6 Pulse Picker XCSXPPCXI Pulse picker Permit LCLS operation at 120 hz Single pulses. Useful for samples supported on substrates Reduced rate ex. 10 hz operation High damage threshold Use rotating discs, concept already in use at ESRF Pulse picker Permit LCLS operation at 120 hz Single pulses. Useful for samples supported on substrates Reduced rate ex. 10 hz operation High damage threshold Use rotating discs, concept already in use at ESRF

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 7 Be Focusing Lenses XCSXPPCXI Beryllium CRL > 40% throughput Positioning resolution and repeatability to 1 µm Z translation to vary spot size Beryllium CRL > 40% throughput Positioning resolution and repeatability to 1 µm Z translation to vary spot size

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 8 KB Mirror XCSXPPCXI

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 9 KB focusing mirrors Mirror system (1 µm and 0.1 µm KB) KB mirrors have produced 50 nm focuses of SR (Yamauchi et al., SRI 2006). Bent plane mirrors – or pre-figured Achromatic focusing. Use B 4 C as coating Damage resistant Good reflectivity

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 10 KB Pair for 0.1 μ m focus Grazing angle 0.2 Deg B 4 C coating Horz. Mirror 20 cm Vert. Mirror 10 cm Focal spot size (FWHM in microns) Horz: Vert: 0.083

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 11 LLNL has state-of-the-art surface metrology for the figure, mid- and high spatial frequency ranges Slope error = 100  rad rms  = 2.7 Ǻ rms  = 17.6 Ǻ rms AFM R. Soufli, E. Spiller, M. A. Schmidt, J. C. Robinson, S. L. Baker, S. Ratti, M. A. Johnson, E. M. Gullikson, Opt. Eng. 43(12), (2004).

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 12 The LLNL DC-magnetron sputtering system can fit multiple large- area substrates in a single deposition 4-mirror and 2-mirror EUV cameras have been multilayer-coated in a single deposition run, achieving optic-to-optic wavelength matching within 1  = nm Underneath view of LLNL chamber lid with 5 sputtering targets R. Soufli, E. Spiller, M. A. Schmidt, J. C. Davidson, R. F. Grabner, E. M. Gullikson, B. B. Kaufmann, S. L. Baker, H. N. Chapman, R. M. Hudyma, J. S. Taylor, C. C. Walton, C. Montcalm, and J. A. Folta, Proc. SPIE 4343, (2001).

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 13 Stress and roughness vs. pressure Lower pressure films reduce roughness Also increase stress Curves shift upwards as thickness grows Favor thinner films grown at higher pressures  Higher micro-roughness, minimize risk of delamination

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 14 Offset Monochromator XCSXPPCXI ParameterValue Energy Range6 – 24 keV Horizontal Offset600 mm Scattering Angle  Accuracy 0.02 arcsec χ Accuracy4 arcsec Double Crystal Offset monochromator Increase longitudinal coherence length (narrow X-ray spectrum) Multiplexes LCLS beam Double Crystal Offset monochromator Increase longitudinal coherence length (narrow X-ray spectrum) Multiplexes LCLS beam

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 15 Offset Monochromator Double Crystal Offset monochromator for 2 µm Si 1.5 Å 85% transmission,2.5% - Mono beam, 1.3% - Diagnostics beam Double Crystal Offset monochromator for 2 µm Si 1.5 Å 85% transmission,2.5% - Mono beam, 1.3% - Diagnostics beam Scattering Angles (2 theta) 1.5 Å0.5 Å Silicon °9.1° Silicon °14.9° Diamond °13.9° Diamond °

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 16 Pulse Compressor XCSXPPCXI λ (nm) d (nm) θBθB bSin β H (mm) Δλ/λ (%) º % Parameters for a Laue case pulse compressor for the LCLS.

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 17 Split and Delay XCSXPPCXI Provided by DESY/SLAC MoU Prototype existing 1 st Commissioning May 2007 pulse duration < delay < 3 ns based on Si (511) with 2 θ = 90º E=8.389 keV Provided by DESY/SLAC MoU Prototype existing 1 st Commissioning May 2007 pulse duration < delay < 3 ns based on Si (511) with 2 θ = 90º E=8.389 keV

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 18 Summary Optical components are conceptually the same as those for SR experiments: slits, attenuators, double crystal monochromators, refractive lens, KB focusing Optical components are in general not beyond state of the art Characteristics of the LCLS beam demand extreme precision and damage tolerance: sub-micro radian rotations, B 4 C coatings Multiplexing capability relies on thin Si or perfect diamond crystals

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 19

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics nm, 3:1 elbows (Patrick Naulleau, LBNL) Added figure error = nm rms M1 mirror, PO Box 2 SES at ALS M2 mirror, MET Set 1 MET camera Added figure error = nm rms Thickness error (nm) Normalized film thickness Measured wavefront = 0.55 nm rms K. A. Goldberg et al, J. Vac. Sci. Technol. B 22(6), (2005) Printed 25 nm equal-line, and 29 nm isolated-line features P. P. Naulleau et al, Proc. SPIE 5751, (2005) R. Soufli et al, Appl. Opt. 46 (June 20, 2007) Measured wavefront = 0.55 nm rms K. A. Goldberg et al, J. Vac. Sci. Technol. B 22(6), (2005) Printed 25 nm equal-line, and 29 nm isolated-line features P. P. Naulleau et al, Proc. SPIE 5751, (2005) R. Soufli et al, Appl. Opt. 46 (June 20, 2007) Projection optics with diffraction-limited performance have been coated at LLNL during the EUVL program

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 21 Reflectometry and scattering beamline at the ALS synchrotron (LBNL) is operated by CXRO Beamline Specifications Wavelength precision: 0.007% Wavelength uncertainty: 0.013% Reflectance precision: 0.08% Reflectance uncertainty: 0.08% Spectral purity: 99.98% Dynamic range: Precision Reflectometer 10  m  300  m beam size 10  m positioning precision Angular precision 0.01 deg 6 degrees of freedom Sample size up to 200 mm PI = Eric M. Gullikson Cross-calibration results are shown between ALS beamline and the PTB facility at the BESSY synchrotron (Berlin, Germany) 1-50 nm wavelength range

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 22 B 4 C film thickness, roughness and density are verified by fitting of EUV reflectance data B 4 C film density and composition have been determined through X-ray Photoelectron Spectroscopy and Rutherford Backscattering

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics X-ray Optics Double Crystal Offset Monochromator Motion 0.02 arcsecond resolution and repeatability (100 nrad) Flexure Stages Piezoelectric Stages

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 24 KB Pair for 1 μ m focus Grazing angle 0.2 Deg B 4 C coating Horz. Mirror 20 cm Vert. Mirror 10 cm Focal spot size (FWHM in microns) Horz: 0.6 Vert: 0.9

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 25 XPP focusing optics Lens Mono 190 m 4 m

J. B. Hastings LUSI DOE Review July 23, 2007 X-ray Optics 26 Be lens calculation for 10 micron focus Focal spot size including diffraction and roughness FWHM in microns: Horiz: 12.0 Vert: 10.1