University of Virginia Raith50 Training – December 2007.

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University of Virginia Raith50 Training – December 2007

Pattern Preparation EBL Systems Turnkey System SEM + Attachment GDSII editor System overview EBL methods Scanning Electron Microscopy EBL System Operation Adjustment & Alignment Exposure Coordinate systems Software introduction Exposure settings Mix&Match Automation Process Technology Resist Technology Metrology Resist basics Proximity effect Metrology Resist systems & Pattern transfer Limitations in EBL Overview

SEM part: - Reimer, L.; Scanning Electron Microscopy; (1998) Springer, Berlin - (downloads: A guide to Scanning Microscope Observation) - Gersley, J. Appl. Phys. 65 (3), 914 (1989) [tip geometries] Lithography part: - Mark A. McCord, Introduction to Electron-Beam Lithography, Short Course Notes Microlithography 1999, SPIE's International Symposium on Microlithography March) SPIE HANDBOOK OF MICROLITHOGRAPHY, MICROMACHINING AND MICROFABRICATION Volume 1: Microlithography - [chapter 2 of the book mentioned above] - [manual Raith 150] - D. F. Kyser and N. S. Viswanathan, "Monte Carlo simulation of spatially distributed beams in electron-beam lithography", J. Vac. Sci. Technol. 12(6), (1975) [electron/solid interactions] - Brewer, Electron-Beam Technology in Microelectronics Fabrication, Academic Press (1980) [electron scattering] - Y. Lee, W. Lee, and K. Chun 1998/9, A new 3 D simulator for low ernergy (~1keV) Electron Beam System; [development depth depending on the used acceleration voltage] - [resist recipes] References

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