Wet etching Isotropic etching Aim Selective removal of material by chemical reaction between etchant and material Why? Remove material.

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Presentation transcript:

Wet etching Isotropic etching

Aim Selective removal of material by chemical reaction between etchant and material Why? Remove material

Steps 1.Fotolitography 2.Etching 3.Stripping

1 Photo litografi (exposure+ develop) Material to be patterned Fotomask Fotoresist Light source

Material to be patterned Patterned Fotoresist 2 Wet Etching Etching solution

Stripping solution Patterned photoresist Etched material 3 Stripping

Compare mask and resulting structure Etched material Mask

Reflection What is the meaning of isotropy? What is the mechanism of wet etching? How can you influence the etching speed? What is the difference between dissolve and etch?