半導體專題實驗 Fermi-Level Pinning & Schottky Barrier Height 蘇璟瑋、王騰漢

Slides:



Advertisements
Similar presentations
•Introduction Structure - What are we talking about?
Advertisements

6.1 Transistor Operation 6.2 The Junction FET
L3 January 221 Semiconductor Device Modeling and Characterization EE5342, Lecture 3-Spring 2002 Professor Ronald L. Carter
Semiconductor Devices 21
The Semiconductor in Equilibrium (A key chapter in this course)
Department of Electronics Semiconductor Devices 24 Atsufumi Hirohata 11:00 Thursday, 27/November/2014 (P/T 005)
Department of Electronics Semiconductor Devices 25 Atsufumi Hirohata 11:00 Monday, 1/December/2014 (P/L 005)
Semiconductor Device Physics
Metal-semiconductor (MS) junctions
Figure 2.1 The p-n junction diode showing metal anode and cathode contacts connected to semiconductor p-type and n-type regions respectively. There are.
Electronics.
Department of Electronics Introductory Nanotechnology ~ Basic Condensed Matter Physics ~ Atsufumi Hirohata.
Department of Electronics Semiconductor Devices 26 Atsufumi Hirohata 11:00 Tuesday, 2/December/2014 (P/T 006)
Semiconductors and Superconductors Ashley Heady 510 Advanced Inorganic.
Spring 2007EE130 Lecture 10, Slide 1 Lecture #10 OUTLINE Poisson’s Equation Work function Metal-Semiconductor Contacts – equilibrium energy-band diagram.
Deviations from simple theory and metal-semiconductor junctions
MatE/EE 1671 EE/MatE 167 Diode Review. MatE/EE 1672 Topics to be covered Energy Band Diagrams V built-in Ideal diode equation –Ideality Factor –RS Breakdown.
Characterisation and Reliability Testing of THz Schottky Diodes Chris Price University of Birmingham, UK
Spring 2007EE130 Lecture 30, Slide 1 Lecture #30 OUTLINE The MOS Capacitor Electrostatics Reading: Chapter 16.3.
Metal-Semiconductor System: Contact
Chapter V July 15, 2015 Junctions of Photovoltaics.
Electrochemistry for Engineers LECTURE 11 Lecturer: Dr. Brian Rosen Office: 128 Wolfson Office Hours: Sun 16:00.
Electron And Hole Equilibrium Concentrations 18 and 20 February 2015  Chapter 4 Topics-Two burning questions: What is the density of states in the conduction.
EXAMPLE 3.1 OBJECTIVE Solution Comment
Electron And Hole Equilibrium Concentrations 24 February 2014  Return and discuss Quiz 2  Chapter 4 Topics-Two burning questions: What is the density.
ECE685 Nanoelectronics – Semiconductor Devices Lecture given by Qiliang Li.
Semiconductor Devices 22
Semiconductor Devices 27
Lecture 8 OUTLINE Metal-Semiconductor Contacts (cont’d)
EE 5340 Semiconductor Device Theory Lecture 8 - Fall 2009 Professor Ronald L. Carter
EE 5340 Semiconductor Device Theory Lecture 11 – Spring 2011 Professor Ronald L. Carter
Thickening Rate of SiO 2 半導體專題實驗期末報告 第十組 電機四 B 許恭銓 電機四 B 王彥翔.
Integrated Circuit Devices Professor Ali Javey Summer 2009 MS Junctions Reading: Chapter14.
Author: Egon Pavlica Nova Gorica Polytechic Comparision of Metal-Organic Semiconductor interfaces to Metal- Semiconductor interfaces May 2003.
Chapter Intrinsic: -- case for pure Si -- # electrons = # holes (n = p) Extrinsic: -- electrical behavior is determined by presence of impurities.
EE 5340 Semiconductor Device Theory Lecture 08 – Spring 2011 Professor Ronald L. Carter
ENE 311 Lecture 9.
ECE 4339 L. Trombetta ECE 4339: Physical Principles of Solid State Devices Len Trombetta Summer 2007 Chapters 16-17: MOS Introduction and MOSFET Basics.
1 Prof. Ming-Jer Chen Department of Electronics Engineering National Chiao-Tung University October 11, 2012 DEE4521 Semiconductor Device Physics One of.
Norhayati Soin 06 KEEE 4426 WEEK 3/1 9/01/2006 KEEE 4426 VLSI WEEK 3 CHAPTER 1 MOS Capacitors (PART 1) CHAPTER 1.
Semiconductor thermal statistics
Lecture 7 OUTLINE Poisson’s equation Work function Metal-Semiconductor Contacts – Equilibrium energy band diagrams – Depletion-layer width Reading: Pierret.
Modeling of an interface between two solids Ashcroft and Mermin Ch. 18 Sze Ch Review Chapter by Tersoff.
Chapter II Semiconductor Physics
MOS Device Physics and Designs Chap. 3 Instructor: Pei-Wen Li Dept. of E. E. NCU 1 Chap 3. P-N junction  P-N junction Formation  Step PN Junction  Fermi.
NEEP 541 Ionization in Semiconductors Fall 2002 Jake Blanchard.
EE 5340 Semiconductor Device Theory Lecture 24 – Spring 2011 Professor Ronald L. Carter
Intellectual Merit: Graduate student Xuhui Luo and Prof. Alex Demkov at UT Austin have identified the source of the Fermi level pinning at the HfO2 surface.
1 Semiconductor Devices  Metal-semiconductor junction  Rectifier (Schottky contact or Schottky barrier)  Ohmic contact  p – n rectifier  Zener diode.
Chemistry 140a Lecture #5 Jan, Fermi-Level Equilibration When placing two surfaces in contact, they will equilibrate; just like the water level.
Introduction to semiconductor technology. Outline –6 Junctions Metal-semiconductor junctions –6 Field effect transistors JFET and MOS transistors Ideal.
Integrated Circuit Devices
EE 5340 Semiconductor Device Theory Lecture 10 – Fall 2010 Professor Ronald L. Carter
President UniversityErwin SitompulSDP 11/1 Lecture 11 Semiconductor Device Physics Dr.-Ing. Erwin Sitompul President University
MOS Transistor Theory The MOS transistor is a majority carrier device having the current in the conducting channel being controlled by the voltage applied.
Intro to Semiconductors and p-n junction devices
INTRINSIC SEMICONDUCTOR  A pure semiconductor.  Its conductivity is low.  It has thermally generated current carries.  Examples of pure or intrinsic.
Solid-State Electronics Chap. 4 Instructor: Pei-Wen Li Dept. of E. E. NCU 1 Chap 4. Semiconductor in Equilibrium  Carriers in Semiconductors  Dopant.
ELECTRONIC DEVICES AND CIRCUITS ( )
Lecture 15 OUTLINE The MOS Capacitor Energy band diagrams
3) The University of Electro-Communications, Tokyo, , Japan
ECE574 – Lecture 3 Page 1 MA/JT 1/14/03 MOS structure MOS: Metal-oxide-semiconductor –Gate: metal (or polysilicon) –Oxide: silicon dioxide, grown on substrate.
Lecture 7 OUTLINE Poisson’s equation Work function
Lecture 15 OUTLINE The MOS Capacitor Energy band diagrams
Chapter 4.1 Metal-semiconductor (MS) junctions
Lecture 15 OUTLINE The MOS Capacitor Energy band diagrams
Lecture 7 OUTLINE Work Function Metal-Semiconductor Contacts
Lecture 15 OUTLINE The MOS Capacitor Energy band diagrams
Beyond Si MOSFETs Part 1.
Presentation transcript:

半導體專題實驗 Fermi-Level Pinning & Schottky Barrier Height 蘇璟瑋、王騰漢 B93501044, B93505007 電機四 1

Schottky Barrier Ideal Condition Φm: The work function of metal (about 2eV~6eV) ΦS: The work function of n-type semiconductor χ: The electron affinity (qχ=Ec – vacuum level) ΦB0: Schottkey barrier height (ΦB0= Φm - χ) In Sperated system Thermal equilibrium 2

Schottky Barrier (cont’d) Ideal Condition (Cont’d) The work function of metal 3

Schottky Barrier (cont’d) Ideal Condition (Cont’d) The deviation of Schottky barrier height The interface layer (oxide) Image-force lowering The presence of interface states 4

Schottky Barrier (cont’d) Image-force lowering Image-force lowering results the distortion of the potential barrier The effect is very small since the reduction is about 10-20 m-eV

Fermi-Level Pinning Interface States Metal / N-type semiconductor If the density of bandgap states near is very large, then addition or depletion of electrons to semiconductor doesn’t alter the Fermi level position at the surface and Fermi level is said to be pinned Netural level Acceptor type Donor type

Fermi-Level Pinning (cont’d) The Schottky Barrier Height

Fermi-Level Pinning (cont’d) The Schottky Barrier Height When surface states → ∞ The Fermi level at the surface is pinned by large amount of surface states at the value above the valence band, and the barrier height is independent of the metal work function and is entirely determined by the surface properties of the semiconductor. (Bardeen limit) When surface states → 0 Identical to the ideal condition Generally, the number of surface states is hard to control, so the barrier height is determined by experiment. Netural level Acceptor type Donor type

Fermi-Level Pinning (cont’d) The Schottky Barrier Height Metal/ n-type Si based semiconductor Experimental Result Reference: S. M. Sze, Physics of Semiconductor Devices, 3rd ed., Wiley, New York 2006, ch.3

Reference Donald A.Neamen, Semiconductor Physics and Devices – Basic Principles, 3ed ed., McGRAW-HILL, 2003, ch1 S. M. Sze, Physics of Semiconductor Devices, 3rd ed., Wiley, New York 2006, ch.3 Jasprit Singh, Semiconductors Devices Basic Principle, Wiley, New York 2001, ch.6