Energy deposition as function of intensity and emittance  The damage potential of a beam does not only depend on the total intensity Energy deposition.

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Presentation transcript:

Energy deposition as function of intensity and emittance  The damage potential of a beam does not only depend on the total intensity Energy deposition as function of spot size  x ×  y Assumed round beams in this context Peak energy deposition in Cu

Energy Deposition in Graphite

ATTENUATION

Attenuation Requirements for Generic Protection Devices  Design for ultimate intensity  The protection devices for LIU beams and BCMS after LS1 need to attenuate more than the current design.  Longer jaws or higher Z.  For BCMS after LS1 would need 100 % more attenuation.  The protection devices for LIU beams and BCMS after LS1 need to attenuate more than the current design.  Longer jaws or higher Z.  For BCMS after LS1 would need 100 % more attenuation. Bunch intensity Normalized emittance Number of bunches (N b /  ) / (N ultimate /  ultimate ) nominal1.15 ×  m ultimate  m 2881 standard run  m BCMS run  m 288 = 6 x HL 25 ns2.3 ×  m BCMS LIU2 ×  m 288 = 6 x 483.1

ROBUSTNESS

Material Comparison  Stress resistance criterion for graphite: Mohr-Coulomb F s > 1 New optics criterion, LIU BCMS beam  For the same intensity and emittance: graphite is the best. The LHC ring collimator CFC between h-BN and graphite.

Beam status Emittance [ Pi.mm.mrad ] Spot Size ( β x* β y) [m^2] Bunch Intensity Material Number of Bunches Max. T emperature [°C] Tens. Strength /Max Tens. Stress Comp. Strength /Max Comp. Stress Mohr-Coulomb S.F. Status Run2 BCMS e11 h-BN ,87/1259/ ,922/1359/ ,427/1259/ Run2 Standar d e ,239/1274/ Robustness simulations: TDI Results for TDI injection stopper Sufficient attenuation for all cases

Beam status Emittance [ Pi.mm.mrad ] Spot Size ( β x* β y) [m^2] Bunch Intensity Material Number of Bunches Max. T emperature [°C] Tens. Strength /Max Tens. Stress Comp. Strength /Max Comp. Stress Mohr-Coulomb S.F. Status Run2 BCMS e11 Graphite /32118/ /24118/ /18118/ Run2 Standard e /15118/42.52 Robustness simulations: Transfer Line Collimators  Note: Transfer line collimators still at locations with smaller beta functions after LS1   Similar energy deposition for run 2 BCMS as for LIU BCMS. Sufficient attenuation only for ≤ 144 bunches. Similar to 50 ns particle density in 2012.

The 3 BCMS cases Brightness limit is 144 bunches with 1.3e+11 in 1.4 um. Limit comes from TCDIs Standard 25 ns: 1.2e+11 in 2.6 um. Case# bunchesBunch intensityEmittance Case e Case e Case e

Same brightness means higher stress in graphite If intensity is increased: f > 1 Example TDI: But as 192 bunches are OK for TDI with 1.4 um emittance, 240 are OK with 2.32 um emittance.

Other Devices in SPS and TLs DeviceCommentMaterial  x x  y Case 1Case 2Case 3 TIDVGSweep, intensity limitation not brightness. Continuous dumping problematic Sandwich: Graphite, Al,Cu, W -OK (with special super cycle) TPSG450 GeV: Assume all beam in one spot Sandwich: graphite CfC, Ti, Inconel 2178tbc TED450 GeV. Continuous dumping problematic. Sandwich: Graphite, Al, Cu- Be, Cu 3388OK TIDPMomentum collimator. n/a n/a TBSJInjection dump: 26 GeV. Max intensity: 48 bunches per shot Stainless steel2290tbc TIDHSweep. Dump at 28 GeV Al-OK