Secondary Electron Emission in the Limit of Low Energy and its Effect on High Energy Physics Accelerators A. N. ANDRONOV, A. S. SMIRNOV, St. Petersburg.

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Secondary Electron Emission in the Limit of Low Energy and its Effect on High Energy Physics Accelerators A. N. ANDRONOV, A. S. SMIRNOV, St. Petersburg State Polytechnical University I. D. KAGANOVICH, E. A. STARTSEV, Y. RAITSES, R. C. DAVIDSON Plasma Physics Laboratory, Princeton University V. DEMIDOV West Virginia University 1

Is the secondary electron emission coefficient approaches unity in the limit of zero primary electron energy? 2

Implications of the secondary electron emission coefficient approaching unity in the limit of zero primary electron energy Total secondary electron emission coefficient (δ) and contribution to it of secondaries and reflected electrons from a fully scrubbed Cu surface at 9 K as a function of primary electron energy. Simulated average heat load in an LHC dipole magnet as a function of proton bunch population at 0.45 TeV, for a SEY considering the elastic reflection (dashed line) or ignoring it (full line). 3

Long (forgotten) history of secondary electron emission studies suggests otherwise. Theoretical – Quantum diffraction from potential barrier Experimental – Difficulties of measurements at low incident electron energy – Previous careful measurements showing contrary observation – Probe measurements in plasma will not work 4

Quantum diffraction from potential barrier Incident electron Scattered electron Quantum-mechanical effect due to electron diffraction off a simple negative potential step at the surface. The electron reflection coefficient, R, which is the ratio of the electron reflected and incident fluxes, for an electron with energy, , from a simple negative potential step (well) of amplitude V i : Here, V i is the internal potential of solid, typically of V, not 150V as mentioned in the Letter. Eq. gives R=0.67 for  =0.01V i, and R=0.29 for  =0.1V i. However, relation for the reflection coefficient does not account for electron acceleration toward the surface by the image charge in the metal. Due to image charge, an electron with negligible initial energy approaches the surface with energy of the order internal potential of solid. Detail calculation taking the image charge force into account [1] gives R=2-4%, for typical values of the internal potential of solid 10 eV. [1]. L. A. MacColl, Phys. Rev. 56, 699 (1939). 5

Quantum diffraction from potential barrier Incident electron Scattered electron Due to image charge, an electron with negligible initial energy approaches the surface with energy of the order internal potential of solid. Electrons are scatter in collisions with atoms and cannot overcome barrier due to smaller normal to the surface velocity. Therefore, the escape angle and, as a result, escape probability and R go to zero when  -> 0*. *I. M Bronshtein, B. S Fraiman. Secondary Electron Emission. Moscow, Russia: Atomizdat, p. 408 (1969). 6

It is very difficult to produce collimated electron beam with few eV energy for measurements of secondary electron emission coefficient at low incident electron energy. An electron gun is at fixed energy. Electrons are decelerated with a retarding potential at the target. => The energy spectrum of electrons arriving at the target is not known sufficiently, and many of returning electrons are reflected from a retarding electric field without any interaction with the target. 7

Previous careful measurements showing contrary observation Total secondary electron yield of Cu as a function of incident electron energy. 1. from the letter for fully scrubbed Cu (T=10 K). 2. Experimental data for bulk Cu after heating in vacuum (room temperature). 1. R. Cimino, et al, Phys. Rev. Lett. 93, (2004). 2. I. M Bronshtein, B. S Fraiman. Secondary Electron Emission. Moscow, Russia: Atomizdat, p. 408 (1969). Other measurements reported the reflection coefficient of about 7% for incident electron energy below few electron volts for most pure metals. I.H. Khan, J. P. Hobson, and R.A. Armstrong, Phys. Rev. 129, 1513 (1963). H. Heil, Phys. Rev. 164, 887, (1967). Z. Yakubova and N. A. Gorbatyi, Russian Physics Journal, (1970). 8

Previous careful measurements showing contrary observation Total secondary electron yield of Al as a function of incident electron energy. I. M Bronshtein, B. S Fraiman. Secondary Electron Emission. Moscow, Russia: Atomizdat, p. 60 (1969). 9  Total secondary electron yield of Si. Total secondary electron yield of Ni.

Previous careful measurements showing contrary observation Total secondary electron yield of Mo as a function of incident electron energy after degassing by prolong heating of target. I. M Bronshtein, B. S Fraiman. Secondary Electron Emission. Moscow, Russia: Atomizdat, p. 60 (1969). 10 Total secondary electron yield of Ge.

Previous careful measurements showing contrary observation Total secondary electron yield of silver and tantalum as a function of incident electron energy after degassing by prolong heating of target. 11 Total secondary electron yield of Ge.

Previous careful measurements showing contrary observation 12 Total secondary electron yield of tungsten and gold.

Reflection is large in dielectrics based on oxides or halogens. Maximum is ~0.7 at 3eV 13 Total secondary electron yield of NaCl, and oxides of barium and yttrium. Emission is increased due to scattering on dislocations, phonons and surface states. Emission starts from threshold of photo-effect as a function of photon energy.

If the reflection coefficient of low energy electrons is large, the operation of probes collecting electron current will be strongly affected 1 This has not been observed. In the afterglow, electrons cool rapidly to T e ~ 0.2 eV. A small amount of fast electrons with well defined energy arise from the Penning ionization A* + A*  A + A + +e f 2. By measuring probe characteristic it is possible to determine if the peak on probe characteristic is widen or shifted relative to the value due to electron reflection form the probe surface. It was shown that there is no change in probe characteristics for clean probe within accuracy 0.16eV K. Wiesemann, Ann. Phys. Lpz (1971). 2. V. I. Demidov, N. B. Kolokolov, and O. G. Toronov, Sov. Phys. Tech. Phys. 29, 230 (1984). 14

Conclusions New study usually starts 20 years after old facts are forgotten. 15