1 Fabrication techniques (only very brief overview) Planar waveguides –Deposited thin films sputtering deposition from solutions polymerization CVD –Diffusion.

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Presentation transcript:

1 Fabrication techniques (only very brief overview) Planar waveguides –Deposited thin films sputtering deposition from solutions polymerization CVD –Diffusion –Ion exchange –Ion implantation –Carrier removal –Epitaxial growth 3D Waveguides Optical fibers

2

3 monolitické OIC jen hybridní OIC α < 0.3 dB/cm (vlnovod) α ~ 2 dB/cm (vlnovod) (GaInAsP 1.3/1.55 μm - „telekomunikační“ vlnové délky)

4 Planar waveguides

5 Sputtering e.g. plasma discharge glass, KDP, Si... vacuum (2-20) torr inert gas

6 e.g. ion bean sputtering system Sputtering

7 Deposition from solutions

8 Diffusion Ti film

9

10 Ion exchange

11 Ion exchange ~ 300°

12 Carrier removal free carriers reduce the index of refraction GaAs, GaP the cut-off condition is independent of wavelength

13 annealing

14 Epitaxial growth fabrication of monolitic optical io formed on a semiconductor substrate required bangap:

15

16

17

18 Molecular beam epitaxy (MBE) e.g. GaAlAs or GaInAsP

19 3D waveguides

20

21

22 Waveguide gratings

23 Optical fibers CVD:

24 1st step: preform fabrication using MCVD SiCl 4 + O 2 dopants

25 2nd step: fiber drawing