제목붙임 1- r. f. magnetron sputtering target 작성자김 영 신김 영 신 작성일 2010. 12. 7 No.ParameterSpecification 1MaterialW-Ti (90:10) 2Diameter 6 인치 (152.4 mm) 3Thickness.

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제목붙임 1- r. f. magnetron sputtering target 작성자김 영 신김 영 신 작성일 No.ParameterSpecification 1MaterialW-Ti (90:10) 2Diameter 6 인치 (152.4 mm) 3Thickness ¼ 인치 (6.35 mm) 4Purity99.95 % 5Densityvaries

제목붙임 2- r. f. magnetron sputtering target 작성자김 영 신김 영 신 작성일 No.ParameterSpecification 1MaterialTiO 2 2Diameter 6 인치 (152.4 mm) 3Thickness ¼ 인치 (6.35 mm) 4Purity99.99 % 5Density4.24

제목붙임 3- r. f. magnetron sputtering target 작성자김 영 신김 영 신 작성일 No.ParameterSpecification 1MaterialCu 2Diameter 6 인치 (152.4 mm) 3Thickness ¼ 인치 (6.35 mm) 4Purity % 5Density8.96

제목붙임 4- r. f. magnetron sputtering target 작성자김 영 신김 영 신 작성일 No.ParameterSpecification 1MaterialAZO(Al: 2 wt%) 2Diameter 6 인치 (152.4 mm) 3Thickness ¼ 인치 (6.35 mm) 4Purity99.99 % 5Densityvaries

제목붙임 5- r. f. magnetron sputtering target 작성자김 영 신김 영 신 작성일 No.ParameterSpecification 1MaterialSiC 2Diameter 6 인치 (152.4 mm) 3Thickness ¼ 인치 (6.35 mm) 4Purity99.99 % 5Density3.21

제목붙임 6- r. f. magnetron sputtering solenoid system 작성자 김영신 작성일 No.ParameterSpecification 1MaterialStainless, Cu 2Diameter 6.5 인치 (165.1 mm) 3Thickness 4 인치 (101.6 mm) 4Coil spec.Cu, 1 mm(dia.)*30m(line) 5Power supplyDC 60V, 5A