Acknowledgements: UWEC Materials Science Center Dr. Anthony Wagner, MSC Analytical Scientist and Jake Pederson, UWEC Alum 4-Point Resistivity Measurements.

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Acknowledgements: UWEC Materials Science Center Dr. Anthony Wagner, MSC Analytical Scientist and Jake Pederson, UWEC Alum 4-Point Resistivity Measurements of Silicon-Carbide Nanowires University of Wisconsin-Eau Claire Kelsey Steinke, Nokoma Kohl-Blomsness, and Kyle Tollefson Dr. Doug Dunham 4-Point Resistivity Measurements of Silicon-Carbide Nanowires University of Wisconsin-Eau Claire Kelsey Steinke, Nokoma Kohl-Blomsness, and Kyle Tollefson Dr. Doug Dunham NT-21 NT-26 Shown above is a representation of a grid that can be made with the different layers. The SiC-NW can lay across the columns and the Mibot probes can be attached to the columns. Doping SiC Nanowires We are doping SiC wires to figure out what makes SiC a better Semiconductor and to control their resistivity and electrical properties. We will be testing different dopants to figure out the best one. There are two types of doping: N-type and P-type. We are currently doping SiC fibers with P and N type dopants. After we can successfully dope the SiC the next step is to create fibers with both N and P dopants and then work our way down to the SiC nanowires. Creation of the Grid One problem we have run into is that it is very hard to attach the probes to just one SiC nanowires as shown in the middle picture above. To test the resistivity of a single SiC-NW we have created a method for laying a single SiC-NW on a conductive grid and then using the Mibots to attach to the grid. To create such a grid Transmission electron microcopy (TEM) grids are glued to a silicon wafer that will contain an oxide layer. Then they are placed in an evaporator and coated with Cr and gold. Once the layer of gold is applied the TEM grids are removed what is left is a grid pattern of gold columns that the SiC-NW can lay across. The layer of oxide on the silicon wafer provides electrical insulation between the columns. The conductive gold allows us to attach the probes to the grid and test the wire that lays across the columns. The grid has to be tested to make sure that it has a high resistance from one column to the next. NT-41 NT-31 NT-27 NT-43 NT-27 NT-43 NT-41 Newly installed 4- point probe system in a Hitachi 3400 N Scanning Electron Microscope Four-Point Measurements Four-point probe MiBots were recently purchased by the Materials Science Center and are being used in conjunction with a high precision source meter to test electrical properties of the produced nanowires. The MiBots are placed directly in a Scanning Electron Microscope to attach the probes to the nanowires. Two of the probes are used to run a current and voltage through a wire and the other two probes are used to measure some parameter of interest. These can be resistance, voltage, or current. The resistivity was found to be between 6.62x10 -4 to 9.66x10 -4 Ωm for a single SiC fiber. Above is an optical image of the TEM grid super glued to a silicon wafer. Above is an optical image after the Silicon wafer has been coated with Cr and Au and the TEM grid has been removed. Multi-walled Carbon Nanotubes (CNTs) are reacted with Silicon Monoxide (SiO) using a Vapor-Liquid-Solid deposition method in an alumina crucible. The CNTs are dispersed in methanol and a small amount is dropped onto a polished graphite planchet in the crucible. The reactants are placed in a crucible unmixed and heated to 1450 °C for 4 hours. Sample Preparation X-Ray Diffraction (XRD) results show 3C-SiC as the main component.. A confocal image was taken of the grid. It is seen how there are distinct gold columns that are raised in a pyramid shape. SiC Fiber SiC Nanowires SiC nanowire sample