Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Transmission of light rays through an optically transparent wave guide. (a) Side.

Slides:



Advertisements
Similar presentations
Date of download: 4/16/2015 Copyright © 2015 SPIE. All rights reserved. Fabrication process of a polymethylmethacrylate (PMMA)-based microfluidic system.
Advertisements

Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Layout of essential elements of the EUV energy monitor. Figure Legend: From: Source.
Date of download: 5/29/2016 Copyright © 2016 SPIE. All rights reserved. Schematics of the water-immersible scanning mirror design: (a) side view and (b)
Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Scheme of the experimental setup: 1-guided-vane pump; 2-fine ceramic porous filter;
Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Working principle of the immersion schemes: (a) focusing in air, (b) focusing through.
Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. SEM images of TiO 2 /SiO 2, after etching in ICP-RIE for 15 min with (a) Al mask.
Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. The stages of the SU-8 process along with their interdependence and effect on final.
Date of download: 5/31/2016 Copyright © 2016 SPIE. All rights reserved. (a) Schematic of printhead (Picojet) and (b) its computational domain. Figure Legend:
Date of download: 5/31/2016 Copyright © 2016 SPIE. All rights reserved. Design of the multisite elongated neural microelectrode array showing the recording.
Date of download: 5/31/2016 Copyright © 2016 SPIE. All rights reserved. Immersion lithography relies on the insertion of a high-refractive-index liquid.
Date of download: 6/1/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of the electrochemical micromachining process. Figure Legend: From: Modeling.
Date of download: 6/1/2016 Copyright © 2016 SPIE. All rights reserved. Main processes for surface micromachining of an InP-based FP cavity structure: (a)
Date of download: 6/1/2016 Copyright © 2016 SPIE. All rights reserved. (a) Optical image of fore and hind wings from a male S. charonda butterfly at different.
Date of download: 6/2/2016 Copyright © 2016 SPIE. All rights reserved. Metrology quality and capability association to the profitability. Figure Legend:
Date of download: 6/2/2016 Copyright © 2016 SPIE. All rights reserved. (a) Lerdemo line edge detection (black lines) of top-down CDSEM image. (b) Height-height.
Date of download: 6/3/2016 Copyright © 2016 SPIE. All rights reserved. (a) The working principle of the tilt-beam CD-SEM. The feature of interest is imaged.
Date of download: 6/3/2016 Copyright © 2016 SPIE. All rights reserved. (a) Segment Voronoi diagram under L∞ metric, with five distinct sites S1,S2,S3,S4,S5,
Date of download: 6/9/2016 Copyright © 2016 SPIE. All rights reserved. Process flow chart of the trilevel resist system using the polysilazane on the spin-on.
Date of download: 6/18/2016 Copyright © 2016 SPIE. All rights reserved. Schematic flow diagram of CER evaluation methodology as implemented on software.
Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Typical SiO2 microneedles with (a) circular tip and (b) triangular tip additionally.
Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. (a) Traditional simplified lithographic system showing components considered in.
Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. The aerial image intensity profile of eight model terms for a typical pattern.
Date of download: 6/22/2016 Copyright © 2016 SPIE. All rights reserved. The schematic of FBAW filters structure. Figure Legend: From: Development of 2.4-GHz.
Date of download: 6/22/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of wafer geometry and loading considered in the analytical and 2-D finite.
Date of download: 6/22/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of the axisymmetric ‘Plate-model’. Figure Legend: From: Particle contamination.
Date of download: 6/23/2016 Copyright © 2016 SPIE. All rights reserved. The concept of DECIGO. Figure Legend: From: Comparison of three semiconductor laser.
Date of download: 6/23/2016 Copyright © 2016 SPIE. All rights reserved. Experimental pattern of interference of vortex laser beam (with different optical.
Date of download: 6/23/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of MIM-slit plasmonic waveguide. Figure Legend: From: Transmission characteristics.
Date of download: 6/25/2016 Copyright © 2016 SPIE. All rights reserved. Transmission loss compensation by reducing absorber CD. Figure Legend: From: Throughput.
Date of download: 6/27/2016 Copyright © 2016 SPIE. All rights reserved. (a)Three-dimensional (3-D) model of the air amplifier where d1 and d2 are the depth.
Date of download: 6/27/2016 Copyright © 2016 SPIE. All rights reserved. Cross-sections of a DIPV system based on light projection. (a) When the dye molecules.
Date of download: 6/29/2016 Copyright © 2016 SPIE. All rights reserved. Illustration of optimum D-S combinations. Figure Legend: From: In situ measurement.
Date of download: 6/29/2016 Copyright © 2016 SPIE. All rights reserved. Experimental SEM images of an ArF-photoresist pattern. The images are 2000 nm long.
Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Schematic view of the layered structure of the fabricated cantilever device. Figure.
Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Process of repair and postrepair treatment. Figure Legend: From: Evaluation of multilayer.
Date of download: 7/2/2016 Copyright © 2016 SPIE. All rights reserved. Transmitted intensity at the resist top surface I0z+(0) for TE waves [black (thicker)
Date of download: 7/2/2016 Copyright © 2016 SPIE. All rights reserved. Fragmentation-based hotspot signature extraction. (a) Layout patterns and the Hanan.
Date of download: 7/2/2016 Copyright © 2016 SPIE. All rights reserved. Simulation of the ablation cross section by a sequence of laser pulses with an ideal.
Date of download: 7/5/2016 Copyright © 2016 SPIE. All rights reserved. (a) Simulated measurement system scanning a surface element at position P(r→). (b)
Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Illumination geometry for vertical and horizontal lines, respectively. The illumination.
Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Left: Cropped top-down SEM-CD images for 1st, 2nd, 4th, and 100th captured image.
Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of RIE system: (a) capacitive coupled plasma (CCP) RIE, and (b) inductive.
Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Points are the nominal spot locations on the calibration standard and the test specimen.
Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Resist loss observed for narrow lines caused by the leakage of light into dark mask.
Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of the barometric pressure sensor. Figure Legend: From: Complementary.
Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Cross section of capacitor TEG. Figure Legend: From: Dielectric-thickness dependence.
Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Cross section of MOS capacitor TEG. Figure Legend: From: Evaluation of damage induced.
Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Flowcharts of the (a) previous and (b) new writing parameter optimization methods.
Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Electron beam lithography systems. Figure Legend: From: Datapath system for multiple.
Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Schematics of a 2-θ angular scatterometry configuration. Figure Legend: From: Physical.
Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Optical proximity correction. Figure Legend: From: Optical proximity correction.
Date of download: 7/11/2016 Copyright © 2016 SPIE. All rights reserved. (a) Schematic of the proposed Fabry–Pérot (FP) cavity with curved surfaces. The.
Date of download: 7/11/2016 Copyright © 2016 SPIE. All rights reserved. In extreme ultraviolet lithography (EUVL), the leakage of the EUV light in the.
Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Talbot self-imaging effect with monochromatic (a) and broadband (b) radiation.
Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Photograph of phase II prototype system. Figure Legend: From: High dynamic range.
Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. (a) Schematic definition of line edge roughness (LER) and line width roughness.
Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. The direct self-assembly (DSA)-aware mask synthesis flow. Three functions are unique.
Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Experimental layout. (a) Schematic of phantom showing the cross-sectional and overhead.
Date of download: 9/18/2016 Copyright © 2016 SPIE. All rights reserved. The response curve for a 1.0-μm thick Shipley1813 photoresist coating is shown.
Date of download: 9/18/2016 Copyright © 2016 SPIE. All rights reserved. Schematic overview of impact of low-k1 on pattern fidelity. Figure Legend: From:
Date of download: 9/18/2016 Copyright © 2016 SPIE. All rights reserved. Fin structure with thin films deposited on top. (a) Typical top-down CD-SEM fragment.
Date of download: 9/19/2016 Copyright © 2016 SPIE. All rights reserved. Schematics of the 3-D printed probe for tissue collagen differentiation. (a) The.
Date of download: 9/19/2016 Copyright © 2016 SPIE. All rights reserved. The average protection level is shown with a solid line (averaged over y−z plane.
Date of download: 9/19/2016 Copyright © 2016 SPIE. All rights reserved. Experimental system for laser-based pallet release: (a) optical system; (b) schematic.
Date of download: 9/20/2016 Copyright © 2016 SPIE. All rights reserved. Top view of the studied mask and the splitting strategy for the investigated LELE.
Date of download: 11/12/2016 Copyright © 2016 SPIE. All rights reserved. A sketch of a micro four-point probe with integrated CNTs in situ grown from nickel.
Date of download: 11/1/2017 Copyright © ASME. All rights reserved.
Date of download: 11/1/2017 Copyright © ASME. All rights reserved.
Date of download: 11/14/2017 Copyright © ASME. All rights reserved.
From: Magnetic Field Effects on Laser Drilling
Presentation transcript:

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Transmission of light rays through an optically transparent wave guide. (a) Side view of a LGP with micropatterned surface (lights rays tend to exit from side opposite micropatterns). (b) Geometry of a single round-tip cylindrical micro-optical structure (MOS). Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. The illumination patterns for LGPs with round-tip cylindrical MOSs located at the Y-axis mid-point of the wave-guide. Each MOS has a depth of 0.5 mm and the illumination is provided along the top edge (nine LEDs spaced 12 mm apart). (a) Single MOS. (b) Three MOSs. (c) Five MOSs. (d) Nine MOSs. Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. The cross-sectional views of the light intensity profiles given in Fig. 2. (a) X-X′ cross-sections with respect to the MOS distribution. (b) Y-Y′ cross-sections with respect to the MOS distribution. Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. The illumination patterns for LGPs with one or more rows of 26 identical microstructures starting near the middle of the wave guide. Each microstructure has a depth of 0.5 mm and the illumination is provided along the top edge (nine LEDs spaced 12 mm apart). (a) Single row of MOSs. (b) Three rows of MOSs. (c) Five rows of MOSs. (d) Nine rows of MOSs. Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. The cross-sectional views of the light-intensity profiles given in Fig. 4. (a) X-X′ cross-sections with respect to the microstructures distribution. (b) Y-Y′ cross-sections with respect to the microstructures distribution (light travels from left to right). Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Experimental set-up used to measure the luminance characteristics of the micromilled LGP samples. Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Measured illumination pattern of the micromilled LGP sample with optimally distributed MOSs. Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Micromilling fabrication and verification of microstructure surfaces. (a) Photograph showing the fabrication of the round-tip cylindrical MOSs on the prototype LGP. (b) 3-D geometry, cross-section, and two surface profiles. Average surface roughness was ∼ 78 nmRa (near optical quality surface finish). Note that the waviness may be the result of deflections in the machine-cutting tool, errors in the tool geometry, and machine vibrations. Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Change in depth of MOSs over the length of the LGP for the proposed optimization approach. Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Illumination pattern and cross-sectional profiles for a hexagonal arrangement of microstructures. Each microstructure has a radius of 0.5 mm and the illumination is provided along the top edge (9 LEDs spaced 12 mm apart). (a) Illumination pattern of the LGP for uniform depth of 0.5 mm. (b) Illumination pattern of the LGP for linearly varying depth from 0.1 mm at the light source to a microstructure depth of 5.5 mm at the distant end. (c) X-X′ illumination profiles. (d) Y-Y′ illumination profiles (light travels from left to right). Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. (a) LGP with a hexagonal array of equal-sized cylindrical microstructures. The patterned array was created using a ball-end micromill with a fixed radius (0.5 mm) and hexagonal arrangement (pitch Δx=1 mm, Δy=1 mm). (b) Fill factor calculation for hexagonal array arrangement of microstructures (adapted from Ref 10). Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Illumination of a fabricated LGP with (a) no MOSs on the patterned surface and (b) LGP with optimized array of MOSs (with varying depth of MOS). The illumination pattern for the optimized array is similar to Fig. 9(a). Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Illumination results for a (100×100×6 mm3) LGP with predefined MOS patterns. (a) Uniform illumination over selected region near the center of panel. (b) Illumination of the NRC-UWO logo. Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Near-uniform illumination for an LGP with microstructures distributed “optimally” from light entrance edge to opposite distance edge. (a) Illumination pattern on the active surface for LGP after selecting “optimal” MOS depths. (b) X-X′ illumination profile. (c) Y-Y′ illumination profile (light travels from left to right). Figure Legend: From: Micromilled optical elements for edge-lit illumination panels J. Micro/Nanolith. MEMS MOEMS. 2013;12(2): doi: /1.JMM