Copyright 2013 by Raith University of Massachusetts - Lowell Basic Training – September 2013

Copyright 2013 by Raith Training Week Topics Software Training Introduction to the Raith and Column Software Pattern design using the GDSII editor Setting up and maintaining the parameters of a multi-user lithography system Raith Lithography Operation Understanding the coordinate systems: Global vs. Local Adjusting the coordinate system: Origin/Angle Correction/3 point AlignWriteField: calibrating the beam deflection Exposure: setup, parameters, automation, Mix & Match Process Technology Electron scattering and Proximity effect Parameters: Beam energy, beam current Resist: selection, interactions, resolution Metrology ‘Hands on’ - Working with the Raith System Column: focus, stigmation & aperture alignment Lithography: exposure of standard demo pattern, initial + overlay Question & Answer

Copyright 2013 by Raith SEM part: - Reimer, L.; Scanning Electron Microscopy; (1998) Springer, Berlin - (downloads: A guide to Scanning Microscope Observation) - Gersley, J. Appl. Phys. 65 (3), 914 (1989) [tip geometries] Lithography part: - Mark A. McCord, Introduction to Electron-Beam Lithography, Short Course Notes Microlithography 1999, SPIE's International Symposium on Microlithography March) SPIE HANDBOOK OF MICROLITHOGRAPHY, MICROMACHINING AND MICROFABRICATION Volume 1: Microlithography - [chapter 2 of the book mentioned above] - [manual Raith 150] - D. F. Kyser and N. S. Viswanathan, "Monte Carlo simulation of spatially distributed beams in electron-beam lithography", J. Vac. Sci. Technol. 12(6), (1975) [electron/solid interactions] - Brewer, Electron-Beam Technology in Microelectronics Fabrication, Academic Press (1980) [electron scattering] - Y. Lee, W. Lee, and K. Chun 1998/9, A new 3 D simulator for low ernergy (~1keV) Electron Beam System; [development depth depending on the used acceleration voltage] - [resist recipes] References