Laboratorio di Strumentazione Elettronica Annual Report of Activities – a.a. 2009/2010 – October 15, 2010Phone Meeting – October 29, 2010 Characterization.

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Laboratorio di Strumentazione Elettronica Annual Report of Activities – a.a. 2009/2010 – October 15, 2010Phone Meeting – October 29, 2010 Characterization of Superpix0 chips Noise scan results A. Manazza, G. Traversi, L. Ratti UNIVERSITA’ DEGLI STUDI DI PAVIA Laboratorio di Strumentazione Elettronica

Annual Report of Activities – a.a. 2009/2010 – October 15, 2010Phone Meeting – October 29, 2010 SuperPix0 - Fine Pitch Hybrid Pixel Sensor The prototype chip contains 4096 readout cells of 50 μm × 50 μm arranged in a 32 × 128 matrix and organized in MacroPixels (MP) We have tested 3 chips with no sensor connected: o CHIP4 o CHIP6 o CHIP7 SuperPix0 layout Photograph of the prototype Cross sectional view of the metal layers used in the layout of the SuperPix0 chip ALUCAP CHIP1 could not be tested because some bonding wires were damaged

Laboratorio di Strumentazione Elettronica Annual Report of Activities – a.a. 2009/2010 – October 15, 2010Phone Meeting – October 29, 2010 SuperPix0 - Analog Cell PA I FB C inject C detector C FB DISC + - V TH FFD InjectMaskClock In-pixel digital logic HIT Q inject QD InjectMaskIn InjectMaskOut Pixel layout integrated in the SuperPix0 chip ENC = 90 Q = e- ENC = 120 ENC = 120 e e-/fC * Cd ENC = 90 e e-/fC * Cd

Laboratorio di Strumentazione Elettronica Annual Report of Activities – a.a. 2009/2010 – October 15, 2010Phone Meeting – October 29, 2010 Noise Scan Measurements We measured the occupancy as a function of the comparator threshold and we fitted the histogram and extracted noise and dispersion parameters with the function: O(V th - V bl ) = 1 – exp [- T oss ν o exp (- (V th - V bl )/2 σ 2 )] There are 8 pixels that have larger occupancy than the others. This happens only for pixels in a particular position in the MP The fastOR and the latch enable lines run below the bump bonding pad and when they change state it is like the pixel is injected Frequency at zero threshold Observation window (120 μs) Baseline voltage Noise

Laboratorio di Strumentazione Elettronica Annual Report of Activities – a.a. 2009/2010 – October 15, 2010Phone Meeting – October 29, 2010 Noise scan results SimulationsCHIP 4CHIP 6CHIP 7 THRESHOLD [mV] ± ± ± 0.2 THRESHOLD DISPERSION [mV] 2.52 (350 e-) 2.43 ± ± ± 0.13 NOISE [mV] 0.63 (90 e-) 0.51 ± ± ± 0.01 The threshold dispersion and the ENC parameters are calculated with post-layout charge sensitivity (Gq = 44 mV/fC) The threshold and noise histograms are referred to chip 4