Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Optical proximity correction. Figure Legend: From: Optical proximity correction.

Slides:

Advertisements

Similar presentations

Date of download: 4/16/2015 Copyright © 2015 SPIE. All rights reserved. Fabrication process of a polymethylmethacrylate (PMMA)-based microfluidic system.

Advertisements

Date of download: 5/27/2016 Copyright © 2016 SPIE. All rights reserved. A structure of the PH network 9 with averaged parameters. Figure Legend: From:

Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. SEM images of (a) one-level piston MMA, (b) one-level tilt MMA, and (c) two-level.

Date of download: 5/28/2016 Copyright © 2016 SPIE. All rights reserved. Layout of essential elements of the EUV energy monitor. Figure Legend: From: Source.

Date of download: 5/29/2016 Copyright © 2016 SPIE. All rights reserved. Schematics of the water-immersible scanning mirror design: (a) side view and (b)

Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Scheme of the experimental setup: 1-guided-vane pump; 2-fine ceramic porous filter;

Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. Working principle of the immersion schemes: (a) focusing in air, (b) focusing through.

Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. SEM images of TiO 2 /SiO 2, after etching in ICP-RIE for 15 min with (a) Al mask.

Date of download: 5/30/2016 Copyright © 2016 SPIE. All rights reserved. The stages of the SU-8 process along with their interdependence and effect on final.

Date of download: 5/31/2016 Copyright © 2016 SPIE. All rights reserved. (a) Schematic of printhead (Picojet) and (b) its computational domain. Figure Legend:

Date of download: 5/31/2016 Copyright © 2016 SPIE. All rights reserved. (a) Real and imaginary part of the experimental data for gold 2 and fitting with.

Date of download: 5/31/2016 Copyright © 2016 SPIE. All rights reserved. Design of the multisite elongated neural microelectrode array showing the recording.

Date of download: 5/31/2016 Copyright © 2016 SPIE. All rights reserved. Immersion lithography relies on the insertion of a high-refractive-index liquid.

Date of download: 6/1/2016 Copyright © 2016 SPIE. All rights reserved. (a) Image pattern captured by CCD before Gamma correction, and (b) the 1-D Fourier.

Date of download: 6/1/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of the electrochemical micromachining process. Figure Legend: From: Modeling.

Date of download: 6/1/2016 Copyright © 2016 SPIE. All rights reserved. Main processes for surface micromachining of an InP-based FP cavity structure: (a)

Date of download: 6/2/2016 Copyright © 2016 SPIE. All rights reserved. Metrology quality and capability association to the profitability. Figure Legend:

Date of download: 6/3/2016 Copyright © 2016 SPIE. All rights reserved. (a) The working principle of the tilt-beam CD-SEM. The feature of interest is imaged.

Date of download: 6/3/2016 Copyright © 2016 SPIE. All rights reserved. (a) Segment Voronoi diagram under L∞ metric, with five distinct sites S1,S2,S3,S4,S5,

Date of download: 6/3/2016 Copyright © 2016 SPIE. All rights reserved. Overlay budget analysis of gate layer for sub-60-nm memory device. Scanner contributions.

Date of download: 6/6/2016 Copyright © 2016 SPIE. All rights reserved. Sample data showing the importance of including a leading multiplier in the cost.

Date of download: 6/9/2016 Copyright © 2016 SPIE. All rights reserved. Basic stages involved in the design of a classification system. Figure Legend: From:

Date of download: 6/9/2016 Copyright © 2016 SPIE. All rights reserved. Process flow chart of the trilevel resist system using the polysilazane on the spin-on.

Date of download: 6/18/2016 Copyright © 2016 SPIE. All rights reserved. Schematic flow diagram of CER evaluation methodology as implemented on software.

Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Typical SiO2 microneedles with (a) circular tip and (b) triangular tip additionally.

Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. (a) Traditional simplified lithographic system showing components considered in.

Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. Scanning mechanisms for (a) conventional FD-OCT and (b) streak-mode FD-OCT. Figure.

Date of download: 6/21/2016 Copyright © 2016 SPIE. All rights reserved. The aerial image intensity profile of eight model terms for a typical pattern.

Date of download: 6/22/2016 Copyright © 2016 SPIE. All rights reserved. The schematic of FBAW filters structure. Figure Legend: From: Development of 2.4-GHz.

Date of download: 6/22/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of wafer geometry and loading considered in the analytical and 2-D finite.

Date of download: 6/22/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of the axisymmetric ‘Plate-model’. Figure Legend: From: Particle contamination.

Date of download: 6/23/2016 Copyright © 2016 SPIE. All rights reserved. The concept of DECIGO. Figure Legend: From: Comparison of three semiconductor laser.

Date of download: 6/25/2016 Copyright © 2016 SPIE. All rights reserved. Transmission loss compensation by reducing absorber CD. Figure Legend: From: Throughput.

Date of download: 6/27/2016 Copyright © 2016 SPIE. All rights reserved. (a)Three-dimensional (3-D) model of the air amplifier where d1 and d2 are the depth.

Date of download: 6/29/2016 Copyright © 2016 SPIE. All rights reserved. Illustration of optimum D-S combinations. Figure Legend: From: In situ measurement.

Date of download: 6/29/2016 Copyright © 2016 SPIE. All rights reserved. Experimental SEM images of an ArF-photoresist pattern. The images are 2000 nm long.

Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Schematic view of the layered structure of the fabricated cantilever device. Figure.

Date of download: 7/1/2016 Copyright © 2016 SPIE. All rights reserved. Process of repair and postrepair treatment. Figure Legend: From: Evaluation of multilayer.

Date of download: 7/2/2016 Copyright © 2016 SPIE. All rights reserved. Transmitted intensity at the resist top surface I0z+(0) for TE waves [black (thicker)

Date of download: 7/2/2016 Copyright © 2016 SPIE. All rights reserved. Fragmentation-based hotspot signature extraction. (a) Layout patterns and the Hanan.

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Illumination geometry for vertical and horizontal lines, respectively. The illumination.

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Left: Cropped top-down SEM-CD images for 1st, 2nd, 4th, and 100th captured image.

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of RIE system: (a) capacitive coupled plasma (CCP) RIE, and (b) inductive.

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Transmission of light rays through an optically transparent wave guide. (a) Side.

Date of download: 7/7/2016 Copyright © 2016 SPIE. All rights reserved. Greatly Reduced Array of Processor Element with Data Reduction (GRAPE-DR) architecture.

Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Points are the nominal spot locations on the calibration standard and the test specimen.

Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Resist loss observed for narrow lines caused by the leakage of light into dark mask.

Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Schematic of the barometric pressure sensor. Figure Legend: From: Complementary.

Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Cross section of capacitor TEG. Figure Legend: From: Dielectric-thickness dependence.

Date of download: 7/8/2016 Copyright © 2016 SPIE. All rights reserved. Cross section of MOS capacitor TEG. Figure Legend: From: Evaluation of damage induced.

Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Schematic diagram of magnetic fields and their sensing on a tooth of an electric.

Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Flowcharts of the (a) previous and (b) new writing parameter optimization methods.

Date of download: 7/9/2016 Copyright © 2016 SPIE. All rights reserved. Electron beam lithography systems. Figure Legend: From: Datapath system for multiple.

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. The ISAR image and segmentation results of the container ship: (a) the optical.

Date of download: 7/11/2016 Copyright © 2016 SPIE. All rights reserved. (a) Schematic of the proposed Fabry–Pérot (FP) cavity with curved surfaces. The.

Date of download: 7/11/2016 Copyright © 2016 SPIE. All rights reserved. In extreme ultraviolet lithography (EUVL), the leakage of the EUV light in the.

Date of download: 9/16/2016 Copyright © 2016 SPIE. All rights reserved. Typical thin film heads (TFH) process comparison with typical semiconductor processes.

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Talbot self-imaging effect with monochromatic (a) and broadband (b) radiation.

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Photograph of phase II prototype system. Figure Legend: From: High dynamic range.

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. (a) Schematic definition of line edge roughness (LER) and line width roughness.

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. The direct self-assembly (DSA)-aware mask synthesis flow. Three functions are unique.

Date of download: 9/18/2016 Copyright © 2016 SPIE. All rights reserved. The response curve for a 1.0-μm thick Shipley1813 photoresist coating is shown.

Date of download: 9/18/2016 Copyright © 2016 SPIE. All rights reserved. Schematic overview of impact of low-k1 on pattern fidelity. Figure Legend: From:

Date of download: 9/18/2016 Copyright © 2016 SPIE. All rights reserved. Illustration of rejection threshold for online pruning of unlikely nodes:(a) priority.

Date of download: 9/18/2016 Copyright © 2016 SPIE. All rights reserved. Fin structure with thin films deposited on top. (a) Typical top-down CD-SEM fragment.

Date of download: 9/19/2016 Copyright © 2016 SPIE. All rights reserved. The average protection level is shown with a solid line (averaged over y−z plane.

Date of download: 9/19/2016 Copyright © 2016 SPIE. All rights reserved. Higher-order Raman gain generation with pump power of 0.9 W (——), 2 W (....) and.

Date of download: 9/20/2016 Copyright © 2016 SPIE. All rights reserved. Top view of the studied mask and the splitting strategy for the investigated LELE.

Date of download: 11/12/2016 Copyright © 2016 SPIE. All rights reserved. A sketch of a micro four-point probe with integrated CNTs in situ grown from nickel.

Date of download: 11/12/2016 Copyright © 2016 SPIE. All rights reserved. (a) A close-up SEM of a rotary comb actuated device. The innermost and outermost.

Presentation transcript:

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Optical proximity correction. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Examples of edge types. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Overview of the proposed method. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Layout features: (a) CSS and (b) CCAS. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Concept of the proposed HBM. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Comparison between CCAS and CSS on different parameter rin (l=1.0 μm). Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Comparison between CCAS and CSS on different parameter l (rin=150 nm). Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Sampling results of hidden variables. R^ values of σf, σr(normal), σr(convex), σr(concave), and σr(line-end) are 1.09, 1.01, 0.99, 0.98, and 1.00, respectively. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. Performance comparison on different training sample number. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. EPE distributions. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. OPC results on a one-dimensional layout: the red line is model-based OPC, while the blue line is HBM-based OPC. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM

Date of download: 7/10/2016 Copyright © 2016 SPIE. All rights reserved. OPC results on two-dimensional layouts: the red line is model-based OPC, while the blue line is HBM-based OPC. (a) pattern 1, (b) pattern 2, (c) pattern 3, and (d) pattern 4. Figure Legend: From: Optical proximity correction with hierarchical Bayes model J. Micro/Nanolith. MEMS MOEMS. 2016;15(2): doi: /1.JMM