PK-1500 Technical data sheet KOLON Central Research Park Electronic Materials Research Institute 2010. 11.

Minimum developing time (sec.) General Properties sst / 21sst PK-1540 PK-1550 Minimum developing time (sec.) 24 29 Exposure Energy (mJ/cm2) 6 sst 12 13 7 sst 17 20 8 sst 22 27 9 sst 33 38 10 sst 47 55 Resolution (μm) 25 30 32 35 39 41 48 Adhesion (μm) 34 46 23 1/1 Resolution(μm) 45 28 40 29 13 19 25 37 53 27 33 38 34 30 26

Exposure Energy vs. Sensitivity SST / 21SST PK-1540 PK-1550 Exposure Energy (mJ/cm2) 6 sst 12 13 7 sst 17 20 8 sst 22 27 9 sst 33 38 10 sst 47 55 Test Conditions Test Artwork : KOLON Test Artwork(Glass Mask) Lamination : 110 °C, 4kg/cm2, 2.0m/min Exposure : 5Kw, collimated light Development : 1.0wt% Na2CO3, Temp. 30 °C, Break Point 50%, Spray Pressure 1.5kg/cm2

Resolution SST / 21SST PK-1540 PK-1550 Resolution (um) Test Conditions 25 30 7 sst 29 32 8 sst 33 9 sst 35 39 10 sst 41 48 Test Conditions Test Artwork : KOLON Test Artwork(Glass Mask) Lamination : 110 °C, 4kg/cm2, 2.0m/min Exposure : 5Kw, collimated light Development : 1.0wt% Na2CO3, Temp. 30 °C, Break Point 50%, Spray Pressure 1.5kg/cm2

Adhesion SST / 21SST PK-1540 PK-1550 Adhesion (um) Test Conditions 34 46 7 sst 29 33 8 sst 25 32 9 sst 23 30 10 sst 20 Test Conditions Test Artwork : KOLON Test Artwork(Glass Mask) Lamination : 110 °C, 4kg/cm2, 2.0m/min Exposure : 5Kw, collimated light Development : 1.0wt% Na2CO3, Temp. 30 °C, Break Point 50%, Spray Pressure 1.5kg/cm2

1/1 Resolution SST / 21SST PK-1540 PK-1550 1/1 Resolution (um) 30 45 7 sst 28 38 8 sst 27 35 9 sst 10 sst 40 Test Conditions Test Artwork : KOLON Test Artwork(Glass Mask) Lamination : 110 °C, 4kg/cm2, 2.0m/min Exposure : 5Kw, collimated light Development : 1.0wt% Na2CO3, Temp. 30 °C, Break Point 50%, Spray Pressure 1.5kg/cm2

Stripping Properties SST / 21SST PK-1540 PK-1550 Stripping Properties (sec., size) NaOH 3.0 wt% 6 sst 35 M 49, MS 7 sst 37 ML 54, ML 8 sst 40 L 59, ML 9 sst 42 L 63, ML 10 sst 46 L 69, ML Test Conditions Pretreatment  Lamination  Exposure  Developing  Stripping Stripping condition: 50oC, NaOH 3.0 wt% Test method: Dipping Method Stripped particle size: S (small, lower than 0.5cm), M (medium, 0.5~2cm), L (large, 2~5cm), LL (extra large, larger than 5cm)

SEM Images (Line/space = 40/40㎛, x400) (Line/space = 40/40㎛, x200) PK-1540, 7sst /21sst PK-1540, 8sst /21sst PK-1540, 9sst /21sst (Line/space = 40/40㎛, x200) PK-1540, 7sst /21sst PK-1540, 8sst /21sst PK-1540, 9sst /21sst

SEM Images (Line/space = 50/50㎛, x350) (Line/space = 50/50㎛, x200) PK-1550, 8sst /21sst PK-1550, 9sst /21sst PK-1550, 10sst /21sst (Line/space = 50/50㎛, x200) PK-1550, 8sst /21sst PK-1550, 9sst /21sst PK-1550, 10sst /21sst

Scum / Sludge Test <Sludge/Scum Test condition> Defoamer(%) Filtering Time (50ml) Filtering Time (100ml) Sludge Weight (300ml filtering) SCUM PK-1540 NO 28 Sec. 57 Sec. 0.20 g <Sludge/Scum Test condition> Filter paper : ADVANTEC-5A Filtering Time : Measuring after being filtered 50ml and 100ml Sludge Weight : Measuring sludge weight after being filtered 300ml Scum Generator : Running Time is 4hrs temp: 30oC

Scum / Sludge Test 1. Test condition. 2. Test method. * Scum & sludge test : Na2CO3 1.0 wt% , 300mL , DFR amount 1㎡/L , 30℃, 300rpm 2. Test method. Immerse 1 m2/L of DFR to 1.0 wt% of developing solution(Na2CO3) Mechanical Stirring for 1 hrs Under yellow room Homo-mixer Stirring for 4 hrs (RPM : 3000, Temp : 30℃) After holding 1day, Check the sludge Occurred & Filtering test

General Process Guideline Best Condition Recommendation Specification Lamination Roll Temp. (°C) 110 110 ± 10 Exit Temp.: 50  10 °C Speed (m/min) 2.0 2.0 ± 1.0 Roll Pressure (Kgf/cm2) 4.0 3.5 ± 1.5 Holding Time Time (min) 15min~4hrs 15min – 8hrs Under Yellow Light Exposure Exposure Energy (mJ/cm2) Step Held 8/21ST 7~9/21ST Without Artwork Resist Step 1hrs 15min – 24hrs Development Chemical 1.0wt% 1.0 ± 0.2wt% Na2CO3 - Temp. (°C) 30 30 ± 2 Break Point 50% 50~70% Spray Pressure (Kgf/cm2) 2.0 ± 0.5 Stripping 3 2 - 4wt% NaOH 50 45-55 40~60% * Clean Room: 20~22 °C, 50 ± 10 % RH