Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. The direct self-assembly (DSA)-aware mask synthesis flow. Three functions are unique to DSA: grouping, synthesis, and DSA verification. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Poor guiding pattern designs result in (a) phase transition, (b) large placement error (PE), and (c) CD/shape change from target. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Template contour shape characterization. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. DSA cylinders measurements: CD and PE. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Given CDTX=36 nm and CDTY=54 nm (a) the pitch contour map with respect to CDTBL and CDTBW; each contour line is labeled with its associated pitch value of the DSA cylinders and (b) the design zone with |ΔPitchDSA|≤2 nm as labeled in red ellipse. Color code: black and gray meet the requirements, but white does not. The darker the region is, the smaller the deviation from the target. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Given CDTX=36 nm and CDTY=54 nm, we determine the design zones where (a) |ΔCDDY|≤1 nm and (b) [(CDDX−CDDY)/CDDY]≤10% red-ellipse: the design zone meeting the pitch requirement; green ellipse: the design zone meeting the CD requirements. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Given CDTX=36 nm and CDTY=54 nm (a) the PE map with contours labeled with its associated PE values and (b) the design zone with |PE|≤0.65 nm overlapping with the design zone (in green) found based on pitch and CD. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Optimization of template contours with a customer-defined objective function of template error enhancement factor (TEEF). Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. The test space for TEEF to predict with the nominal design centered in the 4×4×4 nm3 cube. We use template designs at its eight corners and on one top-right edge to do the experiment. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. (a) Template design to print with 193i. (b) Source generated from Mentor Graphics source mask optimization (SMO) tool. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. ILT mask solutions and printing results with SMO for iso and dense template designs to yield 60-nm-pitch contact with DSA. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. Matrix OPC Mask solutions and printing results with SMO for iso and dense template designs to yield 60-nm-pitch contact with DSA. The ILT-generated subresolution assist features is used. Monte Carlo simulation results are obtained with nominal imaging contours. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM

Date of download: 9/17/2016 Copyright © 2016 SPIE. All rights reserved. The “possibility” contour map generated with the TEEF in post-OPC for PE<0.6 nm. The numbers labeled on the contour lines represent the possibility of finding a template design with PE<0.6 nm when varying its shape parameters from its nominal design. Figure Legend: From: Directed self-assembly graphoepitaxy template generation with immersion lithography J. Micro/Nanolith. MEMS MOEMS. 2015;14(3): doi: /1.JMM