Update on the activities in Milano

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Presentation transcript:

Update on the activities in Milano SuperB Meeting: SVT Parallel Session Update on the activities in Milano M. Citterio on behalf of INFN and University of Milan

Bus / Fan-out status (1 of 2) Production of BUS not yet started The layout has been updated once more to correct some ‘possible’ production difficulties Opening on the ground/power planes have been enlarged and re-positionated Bonding Scheme (Bus to Sensor and FE chip) has been affected and it’s ready to be reviewed with Pisa The sign-off meeting is planned for next week Production will start immediately after that (4-5 weeks) CERN under pression to complete IBL Flex (final design review will be held tomorrow) Queen Mary Univ., Sep. 2011 Mauro Citterio

Bonding Scheme Some “juggling” required …. It could be feasible at the prototype phase … Queen Mary Univ., Sep. 2011 Mauro Citterio

Bus / Fan-out status (2 of 2) Search of commercial partner for FAN-OUT (layer 0) is still on going  in May two possible firms have shown interest One firm is in France, while the other is in Italy Both company will start from a thin commercial Copper/Kapton tape (5 um / 25 um) and pattern the layout by etching Experience only for lines/space resolution of 50/50 um (twice the baseline for striplets) over 10 cm lenght as a maximum UPDATES: The French firm will not be ready for a trial circuit for at least another year The Italian firm is willingly to build a prototype first quarter of 2012 Initiated new contacts (USA firm) Queen Mary Univ., Sep. 2011 Mauro Citterio

Example Attribute Standard HDI: Dense HDI: LCP HDI: PTFE (Epoxy Glass or Polyimide) HDI: Dense (Particle Filled Epoxy) HDI: LCP (liquid crystal polymer) HDI: PTFE (PTFE) Line width 75 microns 25 microns 37.5 microns Line space 33 microns Via type mechanical laser Laser Via diameter 200 microns 50 microns Stacked vias Build up only In 2010 Capture pad diameter 400 microns 100 microns 110 microns Surface finish E-less Ni / I Au, ENEPIG Same Solder mask yes no Thickness <1mm 0.4 - .7mm 0.5mm Layers 10 12 4, 6 in 1st article 11 Queen Mary Univ., Sep. 2011 Mauro Citterio

SuperB HDI (1 of 2) AUREL “ moderate” INTEREST Technology for SuperB HDI: AlN thick film hybrid Irregula shape is not an Issue Detector fan-out is glued on the hybrid edge and chips inputs are wire bonded to the fan-out. Five conductive layers (3 power/ground layers, 2 for signal) However, each additional signal layer for HDI-0 will “degrade” planarity and line resolution New layout rules - layer thickness ~ 65 mm (5% tolerance *) (15 um conductor and 50 mm dielectric) Thickness usually decreases during oven curing Line size/space: inner signal layer >100/100 um (typical 150/150 um), 200/200 um TOP layer Pads 200 x 200 um*2 Vias 200 um, space between via ~ 250 um AUREL “ moderate” INTEREST

SuperB HDI (2 of 2) AUREL INTEREST Some Open Issues No systematic impedance control Limited possibility to change the dielectric layer thickness with the standard process. By print screening company prefers a standard “3 pass” procedure  dielectric thickness ~ 50 um. Some avenue to be pursued: evaluate the usage of dielectric in tape (predefined thickness)  limited choices of thick film materials compatible with AlN Mix AlN and Al2O3 materials. Possible after the first power/ground layer. Clock lines were “qualified” by try and test in Babar Difficult prediction of Z  dielectric constant usually not well specified by material manufacturer (ex. in next slide) Some prototypes were produced to master the technology Same approach to be pursued. Of particular interest is the implementation of differential lines (digital signal ~ 150-250 MHz) Prototype: small substrate (length counts), two layer (plane and one signal), array of lines of minimum size (number to be defined) AUREL INTEREST

SuperB HDI Impedance Test Structures AUREL is willingly to produce a ‘small’ set of substrates to measure yield and characteristics of various Layout is simple, parallel lines with lenght similar to HDI lenght We are trying to organize ourselves to make signal integrity test at AUREL production site (Modigliana) Goal is to assess the best solution Cost is moderate but not zero  it will be discussed next week Queen Mary Univ., Sep. 2011 Mauro Citterio

Low Speed / Low Power Serializer The block schematic of the SMU LOC1 shows that the typical power of the chip (~ 500 mW at 5 Gbps) has a substantial contribution coming from the PLL circuit. A “Tunable” Serializer (data rate from 2.5 to 5 Gbps) can be obtained by changing the PLL. The goal is to reduce the power to ~ 250 mW at 2. 5 Gbps Simulation results indicate that: Updates: We have intensified the discussion with SMU group. We need soon: A choice of the technology (0.25 um or the new 0.18 um Silicon on Sapphire available 2nd quarter of 2012? ) Is SOS the right choice (only one source ….) We need a set of specifications/data protocol The SMU is eager to start.   LOCs1 (mW) low power design CML Driver  96 50% PLL 173 80% Others 187 30% Queen Mary Univ., Sep. 2011 Mauro Citterio