ECE 875: Electronic Devices

Slides:



Advertisements
Similar presentations
1 Chapter 5-1. PN-junction electrostatics You will also learn about: Poisson’s Equation Built-In Potential Depletion Approximation Step-Junction Solution.
Advertisements

ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
ECE 875: Electronic Devices
Metal-semiconductor (MS) junctions
ECE 4339: Physical Principles of Solid State Devices
Spring 2007EE130 Lecture 10, Slide 1 Lecture #10 OUTLINE Poisson’s Equation Work function Metal-Semiconductor Contacts – equilibrium energy-band diagram.
Metal-Semiconductor System: Contact
ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
ENE 311 Lecture 9.
© 2012 Eric Pop, UIUCECE 340: Semiconductor Electronics ECE 340 Lecture 30 Metal-Semiconductor Contacts Real semiconductor devices and ICs always contain.
ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
1 Prof. Ming-Jer Chen Department of Electronics Engineering National Chiao-Tung University October 11, 2012 DEE4521 Semiconductor Device Physics One of.
ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
ECE 875: Electronic Devices
ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
CHAPTER 4: P-N JUNCTION Part I.
ECE 875: Electronic Devices
ECE : Nanoelectronics Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
EE 5340 Semiconductor Device Theory Lecture 10 – Fall 2010 Professor Ronald L. Carter
President UniversityErwin SitompulSDP 11/1 Lecture 11 Semiconductor Device Physics Dr.-Ing. Erwin Sitompul President University
CSE251 CSE251 Lecture 2 and 5. Carrier Transport 2 The net flow of electrons and holes generate currents. The flow of ”holes” within a solid–state material.
ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University
ECE 875: Electronic Devices
ECE 875: Electronic Devices
Lecture 15 OUTLINE The MOS Capacitor Energy band diagrams
Electronics The Seventh and Eighth and Lectures
Lecture-13 • Current flow at a junction • Carrier injection
Lecture 8 OUTLINE Metal-Semiconductor Contacts (cont’d)
Chapter 14. MS Contacts and Practical Contact Considerations
ECE 875: Electronic Devices
Degenerate Semiconductors
Depletion Region ECE 2204.
EMT362: Microelectronic Fabrication CMOS ISOLATION TECHNOLOGY Part 1
Current Flow ECE 2204.
Lecture 7 OUTLINE Poisson’s equation Work function
Lecture 8 OUTLINE Metal-Semiconductor Contacts (cont’d)
Lecture 8 OUTLINE Metal-Semiconductor Contacts (cont’d)
EE 5340 Semiconductor Device Theory Lecture 8 - Fall 2010
ECE 874: Physical Electronics
ECE 874: Physical Electronics
ECE 874: Physical Electronics
Lecture 7 OUTLINE Poisson’s equation Work function
EE130/230A Discussion 5 Peng Zheng.
Chapter 4.1 Metal-semiconductor (MS) junctions
ECE 874: Physical Electronics
Chapter 7, PN Junction 22 and 24 February 2016
ECE 874: Physical Electronics
ECE 875: Electronic Devices
ECE 875: Electronic Devices
EE 5340 Semiconductor Device Theory Lecture 8 - Fall 2003
ECE 874: Physical Electronics
Lecture 7 OUTLINE Work Function Metal-Semiconductor Contacts
ECE 875: Electronic Devices
Lecture 15 OUTLINE The MOS Capacitor Energy band diagrams
ECE 875: Electronic Devices
ECE 875: Electronic Devices
ECE 875: Electronic Devices
ECE 874: Physical Electronics
ECE 874: Physical Electronics
ECE 875: Electronic Devices
EE 5340 Semiconductor Device Theory Lecture 9 - Fall 2009
ECE 875: Electronic Devices
ECE 875: Electronic Devices
EE 5340 Semiconductor Device Theory Lecture 7 - Fall 2003
ECE 875: Electronic Devices
PN-JUNCTION.
Notes 4 March 2013 Start Chapter 7, “pn Junction”
Presentation transcript:

ECE 875: Electronic Devices Prof. Virginia Ayres Electrical & Computer Engineering Michigan State University ayresv@msu.edu

Lecture 21, 26 Feb 14 Chp. 03: metal-semiconductor junction: Schottky barrier Ideal barrier Effective barrier VM Ayres, ECE875, S14

Example from Exam: For the equilibrium condition:

E (x) Junction metal n0= 1017 cm-3 Depletion region W ~ WDn Equilibrium: metal contact to n-type Si when work functions qFm > qFs Junction metal n0= 1017 cm-3 Although the charges are balanced, the layer on the metal side is very thin: similar to p+: ionized acceptors qybi EC EF EF - - P+ P+ P P P P P P P Ei EV Neutral region n-side E (x) Depletion region W ~ WDn

--Nd+ Nd+ n --Nd+ Nd+ Answer: (a) qV0 = (b) Band-bending diagram: q FB = 4.0 eV – 3.8 eV = 0.2 eV q ybi =qV0 = 0.057 eV W = 0.14 mm

Ideal Schottky barrier: q ybi = 0.057 eV q fBn0 = 0.2 eV EC ECm = EF EF - - P+ P+ W ≈ WDn = 0.14 mm More accurately to scale: q ybi = 0.057 eV EC q fBn0 = 0.2 eV ECm = EF EF - - P+ P+ W ≈ WDn = 0.14 mm

Ideal Schottky barrier: q ybi = 0.057 eV EC q fBn0 = 0.2 eV q fn ECm = EF EF - - ND+ ND+ W ≈ WDn = 0.14 mm EC – EF = q fn : Chp. 01: NC = effective DOS at the conduction band edge (eq’n (18)). Practical: use Appendix G n ≈ ND assumes fully fully ionized donors in saturation Temp range

qfBn0 = height of ideal Schottky barrier as seen from the metal = qybi + [qfn = (EC - EF)]

n-type semiconductor qfn = EC - EF p-type semiconductor qfp = EF - EV

Assume: 300 K Equilibrium condition

Draw band-diagrams with the following values marked on it: Barrier height on metal side: qfBn0 = 0.8 eV = given Barrier height on semiconductor side: qybi Barrier width W: primarily on n-side: WDn

Draw band-diagrams with the following values marked on it: Barrier height on metal side: qfBn0 = 0.8 eV = given Barrier height on semiconductor side: qybi Barrier width W: primarily on n-side: WDn

Fixed: 0.0259V @ r.t. Two factors change as a function of doping concentration Competing effects

q ybi = ? EC q fBn0 = 0.8 eV q fn ECm = EF EF - - ND+ ND+ W ≈ WDn = ? EC – EF = q fn : Chp. 01:

Lecture 21, 26 Feb 14 Chp. 03: metal-semiconductor junction: Schottky barrier Ideal Schottky barrier Effective Schottky barrier VM Ayres, ECE875, S14

During a C-V voltage sweep, real current is flowing. Current flowing lowers the ideal barrier height Lowered barrier height is called the effective barrier height Any active measurement will give you the effective barrier height not the ideal one

Same as abrupt junction Pr. 02, Chp. 02 Intercept  ybi Slope  N Pr. 8(a), Chp. 03: VR to VF is plotted right to left Not left to right You take a C-V curve data in F/V. But Units in eqn’s and Fig 30 are C = es/WD in F/cm2 The extra factor 1012 or 13 came from normalizing to a contact area to get the F/cm2 unit.

Current flowing lowers the ideal barrier height Why: During a C-V voltage sweep, real current is flowing. Current flowing lowers the ideal barrier height Lowered barrier height is called the effective barrier height Any active measurement will give you the effective barrier height not the ideal one

Consider an e- in a current reaching a previously established Schottky barrier as shown: --Nd+ Nd+ n --Nd+ Nd+ e-

The e- is leaving the metal. -- e-

An e- that leaves a metal induces a re-arrangement of charge in the metal. Keep in mind that metallic electrons can rearrange very easily. The real re-arrangements of e- and + that develops can be described as an image charge. Mathematical equivalent REAL -- + e- ++ e-

The image charge field also does work on the e-, independent of anything the depletion region field E is doing. e0 => es as the e- is really transporting into a semiconductor.

Combined potential energy of an e- entering the semiconductor from image charge field AND depletion region field : e0 => es as the e- is really transporting into a semiconductor.

Lowered barrier height is called the effective barrier height qfBn During a C-V voltage sweep, real current is flowing. Current flowing lowers the ideal barrier height and shifts the max to xm Lowered barrier height is called the effective barrier height qfBn Any active measurement will give you the effective barrier height not the ideal one