Photolithography PEOPLE Program.

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Presentation transcript:

Photolithography PEOPLE Program

How is Lithography Related to Computers? Computer chips are made using photolithography Instead of drawing with a sharp tip, it uses light to transfer a tiny pattern from a photomask to a light-sensitive chemical Packaging Central Processing Unit (CPU)

How is Lithography Related to Computers? ENIAC (Electronic Numerical Integrator and Computer) First general-purpose electronic computer Apple II An early personal computer Apple MacBook Air Modern laptop computer weighing only 3 pounds! 65 years… and many advances in photolithography!

Photolithography Role of the Resist: Light exposure changes solubility and allows mask formation Applications: Making tiny, detailed stuff! For example, microelectronics, microfluidics, MEMS, bioanalytics, sensing, and many more Main Benefit: High throughput! Geissler, et al. Adv. Mater. 2004, 16, 1249-1269

Exposure of Photosensitive Material to Light What do you think “photosensitive” means?

Exposure of Photosensitive Material to Light What do you think “photosensitive” means? Photosensitive materials react when exposed to light. Examples: Suntan Faded Paint

Transferring the Pattern: Make a Mask! Substrate that will “receive” the pattern Mask that controls the passage of light Silicon wafer Transparency with desired pattern

? Transferring the Pattern to the Silicon Wafer Mask Silicon wafer 1. Coat silicon wafer with photoresist Photoresist Silicon Wafer Mask 2. Tightly place mask on top 3. Expose to UV light Silicon wafer 4. Develop and Rinse ? Depends on the type of photoresist

What it mean if something can dissolve What it mean if something can dissolve? What does it mean if something can’t dissolve?

What could be some examples of things that can dissolve in H2O What could be some examples of things that can dissolve in H2O? What could be some examples of things that cannot dissolve in H2O?

Our definition Dissolve: A solid loses its structure and becomes dispersed into a liquid.* Examples: Table salt (NaCl) dissolves in water. Sand (SiO2) does not dissolve in water. Gasoline does not dissolve in water. A breath-strip dissolves in your saliva. *Dissolving can take other forms, as well. For example a gas can dissolve into another gas, or a gas can dissolve into a liquid.

Positive vs. Negative Photoresist Positive Photoresist: Exposed areas become able to dissolve in the developer (so the exposed portion is dissolved by the developer) Negative Photoresist: Exposed areas become not able to be dissolved in the developer (so the unexposed portion is dissolved by the developer) We will use S-1813, a common positive photoresist

Positive vs. Negative Photoresist 3. Expose to UV light POSITIVE Photoresist NEGATIVE Photoresist 4. Develop and rinse 4. Develop and rinse 5. Etch patterns into wafer 5. Etch patterns into wafer 6. Remove residual photoresist 6. Remove residual photoresist

Positive vs. Negative Photoresist 3. Expose to UV light POSITIVE Photoresist NEGATIVE Photoresist 4. Develop and rinse 4. Develop and rinse 5. Etch patterns into wafer 5. Etch patterns into wafer Positive vs Negative Painting 6. Remove residual photoresist 6. Remove residual photoresist

Make sure you get it! Fill in the blanks: In a _____ photoresist, _____ light reacts with the photoresist to make it unable to be dissolved, so it is rinsed away by the _____. 3. Expose to UV light POSITIVE Photoresist NEGATIVE Photoresist 4. Develop and rinse 4. Develop and rinse 5. Etch patterns into wafer 5. Etch patterns into wafer 6. Remove residual photoresist 6. Remove residual photoresist

Review! What is cross-linking? Do you think that a substance that has a lot of cross-links would be more easily or less easily dissolved? Why do you think so?

Today’s Activity: Photolithography Bucky masks have been created for you Glass slides have been primed and coated S1813 photoresist You will be performing photolithography using these masks Your Mask: PEOPLE Program 2016 Your Name

Today’s Activity: Photolithography 7) Inspect 4) Post-exposure bake 5) Develop 6) Hard bake UV Light Mask  3) Alignment and Exposure Resist 1) Spin coat 2) Soft bake