H. Toyokawa1, C. Saji1, M. Kawase1, S. Wu1, Y. Furukawa1, K

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Presentation transcript:

Development of CdTe Pixel Detectors combined with Aluminum Schottky sensor and Photon-Counting ASICs H. Toyokawa1, C. Saji1, M. Kawase1, S. Wu1, Y. Furukawa1, K. Kajiwara1, K. Osaka1, M. Sato1, T. Hirono2, A. Shiro3, T. Shobu3, A. Suenaga4, H. Ikeda5 1Japan Synchrotron Radiation Research Institute, 2Universitaet Bonn, 3Japan Atomic Energy Agency, 4Howa Sangyo Co., Ltd., 5Japan Aerospace Exploration Agency H. Toyokawa, PIXEL2016, Sestri Levante, Italy, 5-9 Sep. 2016

Motivation and Design Concepts SP8-04F10K detector Overview Motivation and Design Concepts SP8-04F10K detector Threshold trimming Bias voltage Long term stability Laue diffraction measurements Large area detector Summary and outlook

H. Toyokawa, PIXEL2016, Sestri Levante, Italy, 5-9 Sep. 2016 SACLA (XFEL) 8 GeV Linac March 2012 SPring-8 8 GeV Storage Ring Oct. 1997 We have been developing 2D-type high energy X-ray detectors combined with CdTe Schottky diode sensors and photon-counting readout ASICs in use for synchrotron radiation experiments. H. Toyokawa, PIXEL2016, Sestri Levante, Italy, 5-9 Sep. 2016

Pixelated sensor structures CdTe CZT Ge Si density (g/cm3) 5.85 ~5.8 5.33 2.33 atomic number 48, 52 48, 30, 52 32 14 band gap energy (eV) 1.44 ~1.65 0.67 1.12 Ionization energy (eV) 4.43 ~5.0 2.96 3.62 resistivity (Ωcm) 109 109~1011 3900 1400 μe (cm2/V・s) 1100 1000 μh (cm2/V・s) 100 50~80 1900 480 τe (s) 3×10-6 >10-3 τh (s) 2×10-6 10-6 1×10-3 2×10-3 Pt Al h e- ASIC X-ray - Bias voltage Pt/CdTe/Al-pixel CdTe sensor is generally fabricated with a metal/CdTe/metal structure. We have investigated Pt/CdTe/Al-pixel configuration by using high resistivity p-type CdTe wafers 750 μm in thickness. This configuration has the advantage of providing a high Schottky barrier formed on the Al/CdTe interface, and, hence, a benefit to operate the CdTe as an electron-collecting pixelated diode.

Upgrade to SP8-04 ASIC 2010 SP8-01 16×16 pixels 2011 SP8-02 SP8-02B SP8-03 SP8-04 (final) pixel size (μm2) 200 × 200 format 16 × 16 20 × 50 20 × 50 A1K 20 × 100 W2K 95 × 50 L5K 95 × 100 F10K preamp high / low gain tunable gain comparator upper / lower upper/lower×3 counter 20 bits 24 bits process 0.25 μm (TSMC) 0.18 μm (TSMC) Cybershuttle Full wafer run 2010 SP8-01 16×16 pixels 2011 SP8-02 20×50 pixels 2012 SP8-02B (optimized ASIC) 20×50, 41×50 pixels 2013 SP8-03 (3-window comp.) 20×50 pixels

Bump-bonding SP8-04 SP8-01, 02, 02B, 03 Au-stud bonding Bi-Sn solder bonding

SP8-04F10K single chip detector Thickness : 750μm Pixel size : 200μm2 Format : 95×100

Threshold scan (W fluorescence, untrim) Thr = -90 mV Total counts Pixel (20,65) Threshold dispersion Kα edge Kα

Threshold scan (W fluorescence, trimed) Thr = -90 mV Total counts Pixel (29,60) Threshold dispersion Kα edge Kα

Depletion voltages (W theshold scan)

Comparison of CdTe and Si detector PILATUS CeO2 diffraction pattern and line profile at 70 keV

Water-cooled detector

Stability measurement @ 20 degrees Lower threshold scan 10 sec 0.6% Pb fluorescence Temperature = 20 degrees HV = 500V Threshold = -90 mV 10 min

Micro white-Xay Laue diffraction Experimental setup with Al sample

Energy measurement with comparator scan Comparator threshold Experimental setup with Al sample

Grain boundary imaging with SP8-02B silicon steel plate 40×30 positions 0.25mm steps white x-rays 10×10μm2

2 × 2 single-board detector

2 × 2 ASICs large area detector CdTe 190 × 200 pixels SP8-04 F10K 95×100 4 cm 3.8 cm

Summary and Outlook We have been developing 2D high energy X-ray detectors combined with CdTe Schottky diode sensors and photon-counting readout ASICs in use for synchrotron radiation experiments. SP8-04 ASICs have been processed with TSMC 180 nm technology and F10K ASIC single-chip detector could function as designed. 2 x 2 ASICs large area detector has been newly developed and performances are investigated currently. 2-side buttable design could achieved 8cm x 8cm area detector. For going to further large are detector, 4-side buttable module will be designed next step.

H. Toyokawa, PIXEL2016, Sestri Levante, Italy, 5-9 Sep. 2016 Thank you for your attention! H. Toyokawa, PIXEL2016, Sestri Levante, Italy, 5-9 Sep. 2016