EOD@XFEL Bernd Steffen, DESY 12.03.2013

EO@FLASH-BC2

EO@XFEL: Positions First systems required for XFEL operation ≈ 06/2015 EOD EOD EOD EOD-Placeholder First systems required for XFEL operation ≈ 06/2015

EOD: Parameters position injector injector (alternativ config.) before BC1 after BC1 lower BL limit for EO-SD energy MeV 150 600 2000 expected bunch length (used for parameter optimization) rms, ps 8 2.5 0.3 0.15 crystal thickness mm 5 2 0.5 chirped laser pulse length FWHM, ps 20 10 6 min. measurable bunch length rms, fs 500 300 250 100 minimum charge nC 0.25 0.05 0.10 resolution 400 200 50 30 useful time window ps 15 9 3 0.75

EOD: Simulations <- Injector simulation before BC2 -> 2.5ps gauss <- after BC2 simulation after BC2 -> 300fs gauss

EOD: Electronics layout

1 MHz line detector 256 pixel linear PDA 40MHz clock via 8 ADCs 1MHz continuous line rate or 5 pulses with 40MHz FPGA for width etc. calculation with 1MHz for fast feedback

1 MHz line detector First 3 prototypes currently under test InGaAs in the current version, Si planned (no vendor found yet)

1 MHz line detector: first tests Laser power: Sub 1nJ (10ns)

Thank you for your attention!

SRM: Summary First systems required for XFEL operation ≈ 06/2015 TDS EOD EOD EOD BAM SRM EBPM Before you start editing the slides of your talk change to the Master Slide view: Menu button “View”, Master, Slide Master: Edit the following 2 items in the 1st slide: 1) 1st row in the violet header: Delete the existent text and write the title of the EoI for WPnumber 2) The row in the footer area: write the institute name Close Master View EBPM EBPM CRD BCM BCM BCM BCM First systems required for XFEL operation ≈ 06/2015