3D/Active edge sensors with FBK

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Presentation transcript:

3D/Active edge sensors with FBK SoI Wafer Procurement 3D/Active edge sensors with FBK 8 January 2015 G. Darbo – INFN / Genova Indico: https://agenda.infn.it/conferenceDisplay.py?confId=9053

Questions to IceMos 1/2 Questions prepared by Gian-Franco and Maurizio, answers from Hugh Griffin from IceMOS contacted by Nanni. How much is the minimum thickness of the bonding oxide layer? We aim at having it as thin as possible) Minimum oxide thickness = 2000 A. Could the minimum oxide thickness be achieved by having only the sensor wafer oxidized, or would both wafers be oxidized anyway? The IceMOS standard process is to oxidise only one wafer – usually the handle. But we do have options to oxidise the handle or device wafer, or both! Depending on the full SOI specification. What buried oxide thickness do you require? Is the bonding oxide thermally grown? Yes, thermal oxide. Is the total thermal budget used for wafer bonding very high (in terms of temperature and/or time)? The wafer bonding thermal budget – 1200 ºC, 1 hour. Which is the minimum temperature that can be used? Minimum temperature under standard process conditions – 1150 ºC. What is the anneal temperate that you require?

Questions to IceMos 2/2 Can we have a low-dose (~1012 cm-2) boron layer (p-spray) implanted at the bottom of the sensor wafer? Buried implant layer (at bond interface) – yes, no problem. Can you secure a given doping concentration profile for this layer in the delivery configuration? Our stated process conditions (in terms of thermal budget) will not change. In this case, the doping profile will be stable – but this is not something that IceMOS can provide data on. Can you measure the resulting doping profile? We can outsource SRP measurement if necessary. What is the maximum doping concentration we can obtain for the p+ handle wafer? (we aim at having it as high as possible) 0.003 ~ 0.005 Ohm cm. Is this acceptable? Due to the low dose, the expected boron peak concentration is in the order of 10^16 cm^-3.Is the proposed SRP technique sensitive enough to yield an accurate profile at this concentration and below? Spreading resistance is sensitive to about 9 decades of resistivity / concentration. The resistivity range is from 1011 - 1020, so 1016 will be ok.