Spray Combustion Synthesis of Oxide Transistors

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Spray Combustion Synthesis of Oxide Transistors X. Yu,a,b J. Smith,a N. Zhou,a L. Zeng,a P. Guo,a Y. Xia,c A. Alvarez,c S. Aghion,f H. Lin,a,b J. Yu,b R. P. H. Chang,a M. J. Bedzyk,a R. Ferragut,d T. J. Marksa, A. Facchettia,c aNorthwestern University; bUniversity of Electronic Science and Technology of China; ePolyera Corporation; fPolitecnico di Milano Metal oxide (MO) semiconductors have recently emerged as contenders for next-generation transparent electronics. Impressive progress in solution-processed MO electronics has been achieved, however, due to incomplete lattice condensation and film densification, high-quality MO films having technologically-relevant thicknesses have not been realized. Now a MRSEC team has invented a new low-temperature thickness-controlled film growth process to create high-performance solution-processed MO electronics, spray-combustion synthesis (SCS), demonstrating for the first time amorphous indium-gallium-zinc oxide (a-IGZO) transistors having densification, nanoporosity, electron mobility, trap densities, transistor bias stability, and film transport approaching those of sputtered films, and compatible with conventional FAB manufacture. Top: SCS process schematic. Bottom: Mobility statistics vs. processing temperature for conventional (red) and SCS (blue) IGZO TFTs with SiOx dielectric. Green: with an SCS ZrOx dielectric NSF MRSEC Grant DMR-1121262 X. Yu, et al. Proc. Nat. Acad. Sci. USA 112, 3217 (2015).