Status of CMS GEM production in Korea CERN

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Presentation transcript:

Status of CMS GEM production in Korea RD51 @ CERN Feb. 22, 2016 Presented by Archana Sharma for Inkyu PARK on behalf of the Korea CMS Dept. of Physics, University of Seoul 1

KCMS-MECARO consortium

MECARO www.mecaro.com *Founded in 1999 Address : 103-14, Sandan-ro, Pyeongtaek-si, Gyeonggi-do, Korea(Mogok-dong 439-5) Address : 261, Wonnamsandan-ro, Wonnam-myeon, Eumseong-gun, Chungcheongbuk-do, Korea *Founded in 1999

GEM foil production site Semiconductor parts manufacturer in Korea. Products: Heater block, Chemical Precursor, GEM foil etc. Head Quarter & Production Facility Clean room : 1000 m2 R&D and Production Facility Clean room : 1300 m2 R&D for GEM foil production

GEM foil production facilities Test production R&D lab for small size GEM Test production R&D lab for large size GEM Real production machine for large size GEM GE11 for CMS

GEM foil Quality Assurance Optical Inspection System Hole inspection x400 Inner holes x1200 Outer holes x1200 Leakage Current Measurement System ~0.5 nA at 500 V GOOD N2 box & GEM KEITHLAY 2410 PS DAQ Laptop

Production facilities built so far 2013-2014 2014-2015 Wet station for mass production Wet station for GEM (up to 50x50 cm2) Current measurement Optical inspection 2015-2016 Etching/cleaning bath for Large GEMs UV systems for removing DFR 7

Production status

Production status Small size GEM (10x10 cm2) Mid-size GEM (30x30 cm2) Mass production phase since 2015 capability: ~2000 foils/year Mid-size GEM (30x30 cm2) Order-based production MECARO 5 + 5 under test Large size GEM (50x100 cm2) Still R&D phase (almost done) Chemistry is different frm CERN Hole shape; single mask foil source is KANEKA Utilizing PI+LsMTRON FCCL middle cut For the CMS upgrade (GE11) Capability: ~500 GEM foils by 2017 Custom design GEM IBS LAMPS project : 10 x 20 cm2 Produced & shipped KU-KEK: GEM-TPC 10 x 20 cm2

Mass production of small size GEM Mecaro-50 RH% s03 2.0nA good  s02 3.0nA good Leakage current (Δi) s01 3.5 nA good  s02 3.0 nA good  s03 2.0 nA good  s04 4.0 nA good  s05 5.0 nA good  s06 3.5 nA good  s07 3.5 nA good  s08 2.0 nA good  s09 2.5 nA good  s10 4.0 nA good  … s31 3.0 nA good  s39 5.0 nA good  s41 5.0 nA good  s42 2.0 nA good  s43 3.5 nA good  s44 5.0 nA good  s45 5.0 nA good  s46 5.0 nA good  s48 8.0 nA need clean s49 4.0 nA good  s81 5.0 nA good  s82 3.0 nA good  s83 3.0 nA good  s84 3.0 nA good s85 3.5 nA good  s81 5.0 nA good  Δi s48 8.0 nA need clean Δi Yield is good enough. Mass production stage. 10

Status of Large GEM foil production

R&D for Large GEM foil: 2013 2013: A very first GE11 foil was produced by the double-side etching method Mask misalignments ~ 𝟏𝟎𝝁𝒎 Thus, we concluded that we needed a finer mask alignment tool. Top side Bottom side

R&D for Large GEM foil: 2014 A successful GE11 production was done. By using a high definition bi-polar lithography machine with the alignment precision of ~𝟏𝝁𝒎 (Japanese optics company) However, the machine price ~ 1 million dollars! KCMS wanted to buy this machine anyway, if the CMS management was willing to consider the investment as the in-kind contribution of Korea  But, denied. We hold the procedure to purchase the machine.

R&D for Large GEM foil: 2015 Thus, we started the single-side etching method in 2015, as followed in CMS The production seemed to be quite straightforward, and well progressed. Young Gun JENG Yeonsu Yu The production qualities were not stable over the productions. The PI hole shapes were not uniform over the GE11 area for some production.  serious yield cut.

Plans & remarks

Plan To overcome the current obstacle (PI dependence), we have to return back to the double-side method. The double-side method doesn’t suffer from the irregular PI etching shape problem (Both Cu holes on top and bottom are circular). Again, everything becomes a money issue. But now, the CMS management may agree to purchase the machines as the in-kind contribution of Korea.  Then, we’ll buy the following machines using KCMS funds. (See the next page) Rough estimation of the total investment ~ about 300KCHF.

Plan for new machines for production Big $$$ investment is needed, but they are crucial for mass production of GE11 DFR coating system Oven for dry Cu etching Lithography system Development of DFR

Summary Work flow KCMS GEM TF  Very successful Small size GEM foil 10x10 cm2 : mass production ready (by the double-side method) Mid-size GEM foil 30x30 cm2 : production upon request (by the double-side method) Large size GEM foil GE11 production: Using single-side method: doable, but hole shape uniformity is not good Using double-side method: recommended, but the machine cost is high (additional 300kCHF needed) Technology Transfer CMS Upgrade MOU Production MOU RD51

Backup slides

Test results of 10x10 and 30x30 GEMs produced by KCMS&MECARO Min Sang RYU on behalf of the Korea CMS GEM R&D team University of Seoul (UoS) 2016.03.10 RD51 meeting

2DxID with GEM1(#2), GEM2(#9), GEM3(#10) at LHC lab GEMs are stretched about 4-7 N/cm2 summed with values in opposite direction. GEM test in LHC lab in UoS Customized DAQ program with K2410 SMU GEM1(#2) Typical stretching tension ~5-10 N/cm GEM2(#9) GEM3(#10) is on the stretcher now (2016.03.09), we designed and fabricated. 21

Leakage current of GEM from MECARO (2015) Leakage current (Δi) s1 3.5 nA good  s2 3 nA good  s3 2 nA good  s4 4 nA good  s5 5 nA good  s6 3.5 nA good  s7 3.5 nA good  s8 2 nA good  s9 2.5 nA good  s10 4 nA good  s31 3 nA good  s39 5 nA good  s41 5 nA good  s42 2 nA good  s43 3.5 nA good  s44 5 nA good  s45 5 nA good  s46 5 nA good  s48 8 nA need to clean s49 4 nA good  s81 5 nA good  s82 3 nA good  s83 3 nA good  s84 3 nA good s85 3.5 nA good  sample #2  s2 on the right list 3 nA @ 600V with 18.3 ℃ and ~52 % humidity <1 nA @ 600V with 18 ℃ and 18 % humidity TEST in MECARO (August 2015) TEST at Univ. of Seoul (UoS) in Korea (March 2016) s1 and s48 used for GEM stretcher, we’ve designed. 22

Leakage current of GEM from MECARO (2015) Leakage current (Δi) s1 3.5 nA good  s2 3 nA good  s3 2 nA good  s4 4 nA good  s5 5 nA good  s6 3.5 nA good  s7 3.5 nA good  s8 2 nA good  s9 2.5 nA good  s10 4 nA good  s31 3 nA good  s39 5 nA good  s41 5 nA good  s42 2 nA good  s43 3.5 nA good  s44 5 nA good  s45 5 nA good  s46 5 nA good  s48 8 nA need to clean s49 4 nA good  s81 5 nA good  s82 3 nA good  s83 3 nA good  s84 3 nA good s85 3.5 nA good  sample #9  s9 on the right list 2.5 nA @ 600V with 18.3 ℃ and ~52 % humidity <1 nA @ 600V with 18 ℃ and 18 % humidity TEST in MECARO (August 2015) TEST at UoS in Korea (March 2016) s1 and s48 used for GEM stretcher, we’ve designed. 23

Leakage current of GEM from MECARO (2015) Leakage current (Δi) s1 3.5 nA good  s2 3 nA good  s3 2 nA good  s4 4 nA good  s5 5 nA good  s6 3.5 nA good  s7 3.5 nA good  s8 2 nA good  s9 2.5 nA good  s10 4 nA good  s31 3 nA good  s39 5 nA good  s41 5 nA good  s42 2 nA good  s43 3.5 nA good  s44 5 nA good  s45 5 nA good  s46 5 nA good  s48 8 nA need to clean s49 4 nA good  s81 5 nA good  s82 3 nA good  s83 3 nA good  s84 3 nA good s85 3.5 nA good  sample #10  s10 on the right list 4 nA @ 600V with 18.3 ℃ and 52 % humidity <1 nA @ 600V with 18 ℃ and 18 % humidity TEST in MECARO (August 2015) TEST at UoS in Korea (March 2016) s1 and s48 used for GEM stretcher, we’ve designed. 24 It is due to the noise from static electricity.

30x30 GEM detector with MECARO GEMs (FCCL from 3M) Open Detector in Dec 2015 Bad sector check by message on the board Very poor HV connection by customized ceramic resistance ???

Leakage current of GEM (30x30 cm2) from MECARO (3M) in Dec 2015 ~60 nA at 200 V It was tested at CERN in 2015 but there was bad sectors. black dot at GEM1 Holes ?? ~5 nA at 500 V GEM2&3 are OK. 15.5 ℃ 45 % humidity TEST SETUP (MECARO) ~5 nA at 500 V 26

Leakage current of GEM1 (30x30 cm2) from MECARO (3M) in Jan 2016 6th HV sector HV (V) I (A) Time (sec) ~35 nA Leakage current of GEM1 (30x30 cm2) from MECARO (3M) in Jan 2016 Leakage current at 500V: 20-50 nA for each HV sectors Similar pattern ~60 nA at 550 V Damaged at 600 V 1st HV sector Time (sec) HV (V) I (A) 600V 550V ~60 nA GEM1 showed ~60 nA at 200 V. 27

MECARO Contact Contact Homepage : http://www.mecaro.com Contact persons Sujin, Lee (Sales-Japan) T: +82-31-646-4414, E: sjlee@mecaro.com Sangwook, Park (Sales-USA) T: +82-31-646-4413, E: swpark@mecaro.com Yeonsu, Yu (Engineer) T: +82-70-4613-2751, E: ysyu@mecaro.com Head Office address 103-14, Sandan-ro Pyeongtaek-si, Gyeongi-do, Korea(Mogok-dong 439-5) T: +82-31-646-4400, F: +82-31-663-4447 Eumsung Office address 261, Wonnamsandan-ro, Wonnam-myeon, Eumseong-gun, Chungchengbuk-do, Korea (717) T: +82-70-4613-2700, F: +82-70-8250-8232