Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4):041002-041002-8. doi:10.1115/1.4025461 Figure Legend: Schematic representations of (a) CAD model slicing strategy in bulk lithography and (b) cured depth experimental setup and 3D microfabrication using bulk lithography [19]

Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4):041002-041002-8. doi:10.1115/1.4025461 Figure Legend: Experimental results of dimensionless cured depth against dimensionless energy at constant duration (s) of exposure for TMPTA-based resin (a) under lower energy exposure and comparison with published results and (b) under wide range of energy exposure [19]

Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4):041002-041002-8. doi:10.1115/1.4025461 Figure Legend: Experimental results of dimensionless cured depth against dimensionless energy at constant duration (s) of exposure along with proposed cure depth model: (a) resin, TMPTA and (b) resin, HDDA

Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4):041002-041002-8. doi:10.1115/1.4025461 Figure Legend: Variation of parameter “a” and “b” against exposure time for TMPTA-based resin

Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4):041002-041002-8. doi:10.1115/1.4025461 Figure Legend: SEM image of lateral surface of the 3D microstructure fabricated using conventional scanning MSL

Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4):041002-041002-8. doi:10.1115/1.4025461 Figure Legend: SEM image of the variable depth microstructure (sine wave) using bulk lithography corresponding to (a) regime I and (b) regime II

Date of download: 10/29/2017 Copyright © ASME. All rights reserved. From: Characterization of “Bulk Lithography” Process for Fabrication of Three-Dimensional Microstructures J. Micro Nano-Manuf. 2013;1(4):041002-041002-8. doi:10.1115/1.4025461 Figure Legend: Fabrication of microstructure having variable cured depth along radial direction