11.09.2018 SiO2 coating of TiO2 nanoparticles from DBD in a gaseous mixture of SiH4 and N2 Dipl.-Phys. Sebastian Dahle Institut für Energieforschung und.

Slides:

Advertisements

Similar presentations

2012 Transfer-to-Excellence Research Experiences for Undergraduates Program (TTE REU) Characterization of layered gallium telluride (GaTe) Omotayo O Olukoya.

Advertisements

Materials Science in Quantum Computing. Materials scientist view of qubit Materials –SiOx sub substrate –Superconductor (Al,Nb) –SiO x dielectric –Al0.

Compact Power Supplies Based on Heterojunction Switching in Wide Band Gap Semiconductors NC STATE UNIVERSITY UCSB Measurements of the E-field Breakdown.

Low SEY Engineered Surface for Electron Cloud Mitigation

Alternative representation of QW Phase accumulation model.

Fiona Beck Small Particles, Big Hopes: Absorption Enhancement in Silicon using Metallic Nanoparticles.

Janusz Podliński, Artur Berendt, Jerzy Mizeraczyk Centre for Plasma and Laser Engineering The Szewalski Institute of Fluid-Flow Machinery Polish Academy.

KIT – University of the State of Baden-Wuerttemberg and National Research Center of the Helmholtz Association Thermal stability of the ferromagnetic in-plane.

Composition and thickness dependence of secondary electron yield for MCP detector materials Slade J. Jokela, Igor V. Veryovkin, Alexander V. Zinovev, Jeffrey.

DC breakdown experiments M.Taborelli, S.Calatroni, A.Descoeudres, Y.Levinsen, J.Kovermann, W.Wuensch CERN Ranking of materials Cathode mechanism Field.

Sputtering Deposition System R eginald B ryant X u S un MAS 961, Spring 2004 Project Proposal.

McGill Nanotools Microfabrication Processes

III. Analytical Aspects Photoelectron Spectroscopy Cheetham & Day, Chapter 3 Surface Technique: cannot provide completely reliable analysis for bulk samples.

Reforming and Fixation of Carbon Oxides in Atmospheric Pressure Non- thermal CO/CO 2 Plasmas Robert Geiger Advisor: Dr. David Staack Texas A&M Mechanical.

Investigation of Deposits in a Carbon Monoxide DBD Robert Geiger Advisor: Dr. David Staack Texas A&M Mechanical Engineering Plasma Engineering & Diagnostics.

Investigate Laser induced desorption (LID) of hydrogen retained in co-deposited layers on JT-60 open-divertor tile 20 ps-pulsed Nd:YAG laser for wide laser-intensity.

1 K. Overhage, Q. Tao, G. M. Jursich, C. G. Takoudis Advanced Materials Research Laboratory University of Illinois at Chicago.

Low dislocations density GaN/sapphire for optoelectronic devices Low dislocations density GaN/sapphire for optoelectronic devices B. Beaumont, J-P. Faurie,

Mitglied der Helmholtz-Gemeinschaft DEPOSITION OF CORROSION PREVENTING COATINGS FOR DUAL-ION BATTERIES Motivation The CV and CA diagrams confirm the electrochemical.

Plasma and Fusion Research Unit T Traikool 1, N Poolyarat 1, M Fuangfung 1 S Chittapun 2 N Amnuaysin 2 and T Onjun 3 1 Department of Physics, Faculty of.

Effects of NH 3 as a Catalyst on the Metalorganic Chemical Vapor Deposition of Al 2 O 3 Final Presentation for REU program August 3 rd, 2006 Ashlynne Rhoderick.

Energy Postgraduate Conference 2013

Protection of Archaeological Artefacts by Deposition of Parylene and SiO x Thin Films Radka Balastikova, Michal Prochazka, Premysl Mencik, Jakub Horak,

Gaetano Granozzi Francesco Sedona (PhD thesis) TiOx NANOSTRUCTURES ON A MONOCRYSTALLINE Pt SUBSTRATE Università degli Studi di Padova Dipartimento di Scienze.

CAFMaD Centre for Advanced Functional Materials and Devices Aberystwyth University & Bangor University, Wales, UK. Progress on the Aberystwyth Electron.

Atomic Layer Deposition - ALD

Understand and predict materials with atomic accuracy Giovanni Cantele Coherentia CNR-INFM and Università di Napoli “Federico II.

Yufan Xu 1 Ken Flanagan 1 Jason Milhone 1 Cary Forest 1 Mike Clark 1 Paul Nonn 1 Steven Hardcastle 2 1: University of Wisconsin-Madison

DC Sputtering Disadvantage #1 Low secondary electron yield

The Performance Of A Continuous Supersonic Expansion Discharge Source

The Performance Of A Continuous Supersonic Expansion Discharge Source

Fabrication of Hybrid Solar Cells using ZnS Nanoparticles

Pulsed Energetic Condensation of Nb Thin Film Cavities at JLab

Surface, interface and bulk sensitive X-ray absorption spectroscopy probed by total electron yield in liquid cell Daniela Schön, Jie Xiao, Ronny Golnak,

Ching-Rong “Ada” Chung Mentor: Dr. Jing Zhou Department of Chemistry

Professor James Whitten Department of Chemistry Chairman Surface Chemistry, Metal Oxides, Chemical Sensors, Photocatalysis, Spectroscopy Research Group:

THE EFFECT OF SPIN COATING RATE ON MICROSTRUCTURES OF CUPROUS OXIDE THIN FILM PREPARED BY SOL-GEL TECHNIQUE DEWI SURIYANI BT CHE HALIN School of Material.

Auger Electron Spectroscopy (AES)

Carlos Andrés Jarro Dr. J. Todd Hastings

Syedah Sadaf Zehra DCU and UNIPD Supervisors

A Study on Aluminum Oxide (Al2O3) Insulator Deposited by Mist-Chemical Vapor Deposition based on atmospheric pressure Dong-Hyun Kim1,Hyun-Jun Jung1 and.

University of Leicester

CNR-Istituto del Sistemi Complessi, Roma

What is XPS? XPS (x-ray photoelectron spectroscopy) is also known as ESCA (electron spectroscopy for chemical analysis). XPS provides chemical information.

X-Ray Photoelectron Spectroscopy of MgO on Graphene

Characterization of CNT using Electrostatic Force Microscopy

J. Appl. Phys. 112, (2012); Scanning Tunneling Microscopy/Spectroscopy Studies of Resistive Switching in Nb-doped.

Meeting 指導教授:李明倫學生:劉書巖.

SYNTHESIS AND CHARACTERIZATION OF SILICA THIN FILMS

Study of vacuum stability at cryogenic temperature

From: Nonthermal Dielectric Barrier Discharge (DBD) Plasma Suppresses Herpes Simplex Virus Type 1 (HSV-1) Replication in Corneal Epithelium Trans. Vis.

PIC SIMULATIONS of ATMOSPHERIC PRESSURE He/H2O DISCHARGES

PLASMA-WATER INTERACTIONS: O ATOMS

Gisselle Gonzalez1, Adam Hinckley2, Anthony Muscat2

DOE Plasma Science Center Control of Plasma Kinetics

Total Dose Response of HfSiON MOS Capacitors

Light-Triggered Differentiation of Human Neural Stem Cells to Neurons

Photoelectron Spectroscopy AKA Photoemission Spectroscopy

Surface and Interface Characterization of Polymers

Non-Aqueous Surface Passivation of Silicon Germanium

Determining Composition through X-Ray Photoelectron Spectroscopy

IC AND NEMS/MEMS PROCESSES

Studies of the Interfaces between Conjugated Oligomers and Self-Assembled Monolayers James E. Whitten, Department of Chemistry and Center for Advanced.

Volume 5, Issue 3, Pages (March 2019)

S. Dahle, T. Waters, W. Maus-Friedrichs

Biomedical Engineering and Nanotechnologies Institute

PLASMA-SURFACE INTERACTION (PSI) AT

Ismael Catovic October 4, 2013

Ionic liquid gating of VO2 with a hBN interfacial barrier

Main Text Figures.

Presentation transcript:

11.09.2018 SiO2 coating of TiO2 nanoparticles from DBD in a gaseous mixture of SiH4 and N2 Dipl.-Phys. Sebastian Dahle Institut für Energieforschung und Physikalische Technologien TU Clausthal

Motivation Photocatalytically active TiO2 nanoparticles, e.g. for protection against moss and algae But: phase transformation at 900°C Possible solution: protective SiO2 coating 1000°C TiO2 SiO2 / TiO2 SiO2 / TiO2 substrate TiO2 substrate F. Qi et. al., J. Nanoparticle Res. 13 (2011) 1325-1334

11.09.2018 Plasma treatment Dielectric Barrier Discharge alternating HV pulses peak voltage 11 kV repetition rate 10 kHz discharge gap 1 mm power density 1 W/cm² temp. increase < 10 K

Electron Spectroscopy X-ray Photoelectron Spectroscopy (XPS) core level states EP = 1486,6 eV (Al Kα) information depth ~ 15 atom layers Ultraviolet Photoelectron Spectroscopy (UPS) valence band EP = 21,2 eV (HeI) information depth ~ 2-4 atom layers Metastable Induced Electron Spectroscopy (MIES) valence band EP = 19,8 eV (He*) information depth < 1 atom layer

Sample preparation TiO2 nanoparticle Degussa P25 deposited onto Mo washer as suspension in ethanol

SiO2 deposition process scheme 1 SiH4/N2 plasma O2 plasma air plasma TiO2 / Mo substrate Si3N4 / TiO2 / Mo substrate SiO2 / TiO2 / Mo substrate

XPS results for O2 plasma C1s N1s O1s Ti2p Si2p

MIES/UPS results for O2 plasma

AFM results for O2 plasma

Summary SiH4/N2 plasma: deposits non-stoichiometric Si3N4 film O2 plasma air plasma TiO2 / Mo substrate Si3N4 / TiO2 / Mo substrate SiO2 / TiO2 / Mo substrate SiH4/N2 plasma: deposits non-stoichiometric Si3N4 film TiO2 unaffected besides a few oxygen vacancies at the interface Cleaning effect from most atmospheric adsorbates Oxygen or air plasma: Transformation of the Si3N4 in nearly stoichiometric SiO2 Removal of residual carbon SiO2 film encloses clusters of P25 nanoparticles Conclusion: Effective method for SiO2 film deposition & easy to implement!

Acknowledgements M.Sc. Lienhard Wegewitz Prof. Alfred Weber Dipl.-Ing. Fei Qi Deutsche Forschungsgemeinschaft (DFG) for financial support under project nos. MA 1893/18-1 and VI 359/9-1