Study of radiation damage induced by 26MeV protons and reactor neutrons on heavily irradiated MCz, FZ and Epi silicon detectors N. Manna Dipartimento.

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Study of radiation damage induced by 26MeV protons and reactor neutrons on heavily irradiated MCz, FZ and Epi silicon detectors N. Manna Dipartimento Interateneo di Fisica & INFN di Bari on behalf of the SMART Collaboration* (*) INFN sections of Bari, Firenze, Perugia, Pisa; External collaborators INFN Padova, Trieste & ITC-IRST Trento Layout and materials of SMART detectors Post-irradiation measurements Analysis: MCz n Inversion or Double Junction? CCE MCz p Epitaxial MOS – Interstirp Capacitance Conclusions 8th RD50 - Workshop on Radiation hard semiconductor devices for very high luminosity colliders PRAGUE, 25-28 June, 2006

Wafer Layout Test2: GCD, Van der Paw Test1: Diode+Mos Square MG-diodes Microstrip detectors Inter-strip Capacitance test Test2: GCD, Van der Paw Test1: Diode+Mos Square MG-diodes Round MG-diodes 50 mm pitch 64 strips 100 mmpitch 32 strips S1 S2 S3 S4 S5 S6 S7 S8 S9 S10 RD50 common wafer procurement (produced by Okmetic - Vantaa, Finland) Wafer Layout designed by the SMART Collaboration Masks and process by ITC-IRST 10 different strip geometries

PRODUCTION MCz Samples RUN I p-on-n 22 wafers RUN II n-on-p 24 wafers Fz Samples MCz Samples <111> ρ>6KΩ*cm th.=300μm Standard Process <100> ρ>500 W*cm thick=300μm Standard: LTO, sintering @ 420C no LTO (pass. layer), sint. @ 380C no LTO, sintering @ 350C no LTO, sintering @ 380C + TDK RUN I p-on-n 22 wafers Epi Samples ρ≈500Ω*cm th.=150μm <100> ρ>1.8 KW*cm thick=300μm No over-glass passivation Low dose p-spray (3.0E12 cm-2) High dose p-spray (5.0E12 cm-2) MCz Samples RUN II n-on-p 24 wafers <100> ρ>5KΩ*cm th.=200 mm Low dose p-spray (3.0E12 cm-2) High dose p-spray (5.0E12 cm-2)

Irradiation April 2006 Irradiation with reactor neutrons in Ljubljana Set up for the irradiation @ JSI(Ljubljana) Irradiation with reactor neutrons in Ljubljana 12 fluences: 5.0x1013 8.5x1015 1-MeV n/cm2 27 mini-sensors, 11 test structure (capts),100 diodes 60 % n-type, 40 % p-type Thanks to V.Cindro and G.Kramberger Set up for the irradiation @ FZK(Karlsruhe) June 2006 Irradiation with 26 MeV protons at the Cyclotron of the Forschungszentrum Karlsruhe 10 fluences: 1.2x1014 - 6x1015 1-MeV n/cm2 20 mini-sensors, 8 test structure(capts), 100 diodes 60 % n-type, 40 % p-type Thanks to A. Furgeri

Post Irradiation Characterization On Diodes: IV and CV measurements (@ 0 °C or 20 °C) - immediately after irradiation before annealing - repeated after annealing steps (@ 20, 60 or 80 °C) - Charge Collection Efficiency in order to: (1) follow the radiation damage evolution on bulk current and effective doping concentration; (2) determine the effective irradiation fluences (3) estimate the inversion and double junction fluence (4) test Vdep with charge collection to validate CV measurements and Determine Charge Collection Efficiency at full depletion On Mos devices: CV (@ 0 0C) - repeated after annealing steps(@ 80 0C) in order to study: variation of the oxide charge as a function of the irradiation fluence in order to understand the behavior of the interstrip capacitans

Depletion voltage after irr. (Fz n Type inversion) PROTON IRRADIATION We are following annealing at room temperature Typical behaviour for standard FZ_n T=200C

Depletion voltage after irr. (MCz n Type inversion?) The annealing behaviour is typical of type inverted (p-type) material after Φ4 , but …… T=200C PROTON IRRADIATION

Double Junction (DJ) effect For very high fluences (of the order of 1014 neq/cm2) a depletion region can be observed on both sides of the device for STFZ p+/n diodes. In STFZ DJ arises after inversion. The opposite in MCz! This may explain Vdep(F,t) profiles. Double junction effect has been observed on MCz already at F = 3×1014 n/cm2 At the fluence F=1.3×1015 n/cm2 the dominant junction is still on the p+ side Strip readout side: no over depletion p+ n+ Electric field extracted from fit - TCT data Fake “SCSI” on MCz at F ~2×1014 neq/cm2 Minimum on Vdep vs fluence Slope of annealing curves No SCSI on MCz up to F ~1.3×1015 neq/cm2 TCT measurements

bi = introduction rate of defect in the junctions Double junction model PROTON IRRADIATION bi = introduction rate of defect in the junctions Фi =inversion fluence Ф0 =double junction formation fluence

Annealing @60 0C (MCz n Type) Φ (1014n*cm-2) Φ (1014n*cm-2) NEUTRON IRRADIATION T=600C

Annealing @ 800C Type non-inverted: depletion voltage has a maximum PROTON IRRADIATION NEUTRON IRRADIATION Up to 60 min at 80 C for neutron irr. Fz and MCz show the same behavior. extrapolated The difference in the annealing for protons started at longer ann. Times, where MCz improved. Type non-inverted: depletion voltage has a maximum Type inverted: depletion voltage has a minimum

Charge Collection Efficiency Si detectors MCz p-type PROTON IRRADIATION F = 6.8 1013 cm-2 CCE 100% At full depletion VCCE ~ VCV Carlo Tosi, Mara Bruzzi II Workshop Trento 2006

Charge Collection Efficiency of Si detectors MCz p-type PROTON IRRADIATION F = 2.7 1014 cm-2 VCCE = 540 V VCV = 500V but CCE ~ 86% 500V CCE ~ 96% 700V Carlo Tosi, Mara Bruzzi II Workshop Trento 2006

CCE of single pad MCz Si n-on-p PROTON IRRADIATION F = 1.36 1014 cm-2 CCE 100% at full depletion VCCE ~ VCV = 340V F = 6.8 1014 cm-2 CCE 75 % @ Vfd = 350V CCE 90% @ 700V V = 800V T = - 30°C

Epitaxial 150µm Strong increase of the depletion voltage vs fluence Vdepl at the minimum is around 10 V: inversion or double junction effect?

Epitaxial Annealing Neutrons: “inverted-like” behaviour Protons: “not inverted-like” behaviour

Measured before annealing @ 0oC MOS vfb Cint Measured before annealing @ 0oC See Piemonte’s talk 7th RD50 - Workshop

Annealing studies at 80 °C on the MOS structure Fz p-type with high p-spray f= 1K Hz The Vfb decreases with annealing time until saturation - Vgate (V)

Conclusions From TCT measurements the MCz n-type diodes irradiated with protons are not type inverted up to fluence 1*1015 ncm-2 and DJ observed above 3*1014ncm-2 Experimental measurements are in better agreement with a Double Junction model than standard one. Work in progress to improve this model in agreement with the experimental measurements and investigate the annealing behavior through this model. No difference with the irradiation (proton-neutron) in terms of DJ model. CV and CCE profiles and full depletion voltage values in good agremeent up to Φ = 1.36 1014 cm-2. CCE 96% and 90% at the highest fluences tested (2.7 - 6.8*1014cm-2 ) and at different annealing steps ( 0 and 252min at 80°C). Epitaxial-150μm n-type diodes behaves like “inverted” @ 8*1014cm-2 The Vfb increases continuously with fluence Interstrip Capacitance variation observed on Microstrip sensors up to 6*1014cm-2.