Microstructure and Properties of the Cr-Si-N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering (HiPIMS) and Pulsed DC Magnetron Sputtering.

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Microstructure and Properties of the Cr-Si-N Coatings Deposited by Combining High-Power Impulse Magnetron Sputtering (HiPIMS) and Pulsed DC Magnetron Sputtering Wang Tie-Gang, Dong Yu, Abera Gebrekidan Belachew, Liu Yan-Mei, Fan Qi-Xiang, Ho Kim Kwang 1 Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing, Tianjin University of Technology and Education, Tianjin 300222, China 2 Global Frontier R&D Center for Hybrid Interface Materials, Pusan National University, Busan 609-735, South Korea Acta Metallurgica Sinica(English letters),2017,30(7),688-696.DOI:10.1007/s40195-017-0609-0

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