Structure and Operation of the MOSFET 24 February and 1 March 2017
FET Circa 1964-Commercial Introduction First FET IC Circa 1964 By RCA
MOS Inversion Layer - - - - - - - - - - - - + - Metal layer Oxide layer P-type + + + + + + + + + + + + + n-type inversion layer With large positive gate bias, there will be electrons at the interface between the oxide and semiconductor, which leads to formation of a thin n-type inversion layer Threshold voltage VT: applied gate voltage required to achieve the threshold inversion 10 10
Voltage-Current Relationship of NMOS (1) 19 19