Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Experimental ALD system with residual gas analyzer (RGA) to characterize the methane emissions

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Contour plots of gaseous species distributions and the bulk species deposition rates: (a) 0.02 s at the end of TMA pulse and (b) 10.04 s at the end of water pulse

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Gaseous species distributions during the full Al2O3 ALD cycle

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Surface coverage for the main surface species during the full ALD cycle

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Contour plots of surface coverage and precursor distributions in the entire ALD system: (a) 0.02 s at the end of TMA pulse and (b) 10.04 s at the end of water pulse

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Correlation of the bulk species deposition rate and precursors concentration during the ALD cycle

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Effects of chamber temperatures on the process wastes and emissions: (a) precursor dosage, precursor wastes, and methane emissions and (b) film growth rate and precursor waste rate

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Effects of pulse time on the process wastes and emissions: (a) precursor dosage, precursor wastes, and methane emissions and (b) film growth rate and precursor waste rate

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Effects of purge time on the process wastes and emissions: (a) precursor dosage, precursor wastes, and methane emissions and (b) film growth rate and precursor waste rate

Date of download: 11/6/2017 Copyright © ASME. All rights reserved. From: Atomic Layer Deposition Process Modeling and Experimental Investigation for Sustainable Manufacturing of Nano Thin Films J. Manuf. Sci. Eng. 2016;138(10):101010-101010-9. doi:10.1115/1.4034475 Figure Legend: Effects of carrier gas flow rate on the process wastes and emissions: (a) precursor dosage, precursor wastes, and methane emissions and (b) film growth rate and precursor waste rate