(WP2) Characterization of Novel Materials for APDs

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(WP2) Characterization of Novel Materials for APDs PROMIS Workshop 2, Cadiz Shumithira Gandan 18th May 2016

Avalanche Photodiodes Avalanche multiplication in APDs allow use in applications requiring high sensitivity levels. Security applications of APDs– LIDAR and X-ray spectroscopy nm wide avalanche region allows exploitation of ‘dead space’ effects(w <50nm) Dead space – distance required by carrier to acquire sufficient energy to impact ionize 18th May 2016 Cadiz Workshop

Novel Materials Combining InGaAs with nanoscale AlAsSb is expected to improve soft X-ray detection especially for X-ray imaging arrays Benefits for low photon sensing applications: Lower excess noise performance Comparable to Si APDs but at IR wavelengths >1100nm, k <0.2 High immunity to temperature fluctuation Two orders of magnitude reduction compared to ~100mV/K in typical InGaAs/InP SPAD Higher sensitivity with shallow pixels Thickness of >20um in Si makes fabricating high format imaging arrays difficult. InGaAs and nm avalanche region -> high sensitivity with <6um shallow pixels 18th May 2016 Cadiz Workshop

Time-resolved Photoluminescence Allows measurements of transition energies and lifetimes of carriers ns and ps resolution possible with the use of a streak camera Intensity of emission α number of photo-generated carriers Decay times reflect recombination rates and reveals quality of crystalline structure Presence of impurities and defects significantly reduce decay times 18th May 2016 Cadiz Workshop

Streak image Warmer colours correlate to higher photon counts Wavelength(nm) Time(ps)

Schematic of PL & TRPL Setup 18th May 2016 Cadiz Workshop

AlGaAsSb Avalanche layer 18th May 2016 Cadiz Workshop

AlGaAsSb PL 18th May 2016 Cadiz Workshop

AlGaAsSb TRPL 18th May 2016 Cadiz Workshop

InAlAs PL 18th May 2016 Cadiz Workshop

InAlAs TRPL 18th May 2016 Cadiz Workshop

Semi-metallic InGaAs layer prevents complete penetration of light into APD layers New samples with InGaAs etched and covered with photoresist was received After removal of p.r layer, samples need to be placed in vacuum conditions immediately to prevent oxidation of high Al content in the samples 18th May 2016 Cadiz Workshop

Latest Results : AlGaAsSb 18th May 2016 Cadiz Workshop

18th May 2016 Cadiz Workshop

Latest Results : InAlAs 18th May 2016 Cadiz Workshop

18th May 2016 Cadiz Workshop

Plan for next 6 months Match the PL spectra with bandgap structure modelled for each layer for both samples Vary the excitation wavelength with a tunable laser to change the penetration depth of light into the structure Obtain time-resolved spectra for all the emission peaks of each sample 18th May 2016 Cadiz Workshop