Crystallization of Thin Films under Spatial Confinement

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Presentation transcript:

Crystallization of Thin Films under Spatial Confinement Sally Jiao, Anna Hailey Rubinstein, Lynn Loo Loo Group: Organic and Polymer Electronics Laboratory Princeton University

Organic semiconductors Characteristics: Easy to process Inexpensive Applications: Flexible displays Solar cells http://images.dailytech.com/nimage/29214_large_main.JPG

TES-ADT crystallization Number and orientation of crystalline grains affect charge transport How do various factors affect TES-ADT’s crystallization behavior? How does changing film thickness affect crystallization behavior? 1 Lee, Stephanie. (2012). Processing-Structure- Function Relationships In Solution-Processed , Organic-Semiconductor Thin Films for Transistor Applications. Ph.D. Thesis. Princeton University.: US.

TES-ADT (triethylsilylethynyl anthradithiophene) Small-molecule organic semiconductor Dissolves easily in toluene TES-ADT crystals TES-ADT solution Amorphous TES-ADT film Crystallized TES-ADT film Dissolve in toluene Spin coat onto a silicon dioxide wafer Expose to solvent vapor Lee, Stephanie. (2012). Processing-Structure- Function Relationships In Solution-Processed , Organic-Semiconductor Thin Films for Transistor Applications. Ph.D. Thesis. Princeton University.: US.

Quantifying crystallization behavior Nucleation density Growth rate 0.2 nuclei/mm2 17 +/- 1 um/s

Results: growth rate v. thickness

Results: growth rate v. thickness 100nm, 12um/s 130nm, 27um/s

Results: nucleation density v. thickness 29nm 75nm 120nm

Results: nucleation density v. thickness no nucleation instantaneous nucleation progressive nucleation y = 3.0x – 310 y = 0.042x – 2.0

Summary Found that increasing film thickness increases nucleation density, nucleation “rate”, and crystallization growth rate Could use these results to produce patterned films for electronic device applications Experienced research in an academic setting Developed practical lab skills Reinforced my interest in materials science research with real world applications

Acknowledgments

Additional material

Results: growth rate v. thickness PFBT-Au HMDS-SiO2 Au SiO2 UVO-SiO2 UVO-Au