Technical review August-2017 E-beam Lithography

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Presentation transcript:

Technical review August-2017 E-beam Lithography

CD Trend chart for August 2017, Raith e-line, Process Details: Resist: PMMA 950 A2 Spin coating : 6000rpm , 45 seconds. Pre Bake: Hot plate: 170°C for 120 seconds Exposure: EHT: 20KV, Aperture : 20um Dose: 300pc Development: 40sec in MIBK(1:3),7 degree Celsius 20.2nm 37.8nm 41nm 39.1nm 22.16nm Developed at 7 degree celsius

Raith pioneer, Process Details: 21.5nm 20nm 36.18nm 39nm Resist: PMMA 950 A2 Spin coating : 6000rpm , 45 seconds. Pre Bake: Hot plate: 170°C for 120 seconds Exposure: EHT: 20KV, Aperture : 20um Dose: 300pc Development: 30sec in MIBK(1:3) 21.5nm 19.5nm 20nm 38.7nm 36.18nm 39nm Developed in room temperature

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