M. Laitinen, M. Rossi, P. Rahkila, H. J. Whitlow and T. Sajavaara

Slides:



Advertisements
Similar presentations
Accelerator Physics, JU, First Semester, (Saed Dababneh).
Advertisements

Secondary Ion Mass Spectrometry
Equipe Couches Nanométriques : Formation, Interfaces, Défauts
Ion beam Analysis Joele Mira from UWC and iThemba LABS Tinyiko Maluleke from US Supervisor: Dr. Alexander Kobzev Dr. Alexander Kobzev.
GEANT4 Simulations of TIGRESS
Ion Beam Analysis techniques:
Rutherford Backscattering Spectrometry
ERDA, for measurement of hydrogen in PV applications
Study of sputtering on thin films due to ionic implantations F. C. Ceoni, M. A. Rizzutto, M. H. Tabacniks, N. Added, M. A. P. Carmignotto, C.C.P. Nunes,
Isobarentrennung bei Teilchenenergien unterhalb 1 MeV/amu mit einem  TOF Detektor Peter Steier, Robin Golser, Walter Kutschera, Alfred Priller, Christof.
Setup for large area low-fluence irradiations with quasi-monoenergetic 0.1−5 MeV light ions M. Laitinen 1, T. Sajavaara 1, M. Santala 2 and Harry J. Whitlow.
Review of PID simulation & reconstruction in G4MICE Yordan Karadzhov Sofia university “St. Kliment Ohridski” Content : 1 TOF 2 Cerenkov.
number of coulombs in a mole mass of liberated substance.
Rutherford Backscattering Spectrometry
Hybrid emulsion detector for the neutrino factory Giovanni De Lellis University of Naples“Federico II” Recall the physics case The detector technology.
Cross section measurements for analysis of D and T in thicker films Liqun Shi Institute of Modern Physics, Fudan University, Shanghai, , People’s.
Secondary Ion Mass Spectrometry (SIMS)
Chapter 8 Ion Implantation Instructor: Prof. Masoud Agah
Development of research around 1.7 MV Pelletron in Jyväskylä during five years of operation Mikko Laitinen, J. Julin, L. Mättö, M. Napari, N. Puttaraksa,
Large area transition-edge sensor array for particle induced X-ray emission spectroscopy M Palosaari1, K Kinnunen1, I Maasilta1,
PC4250 Secondary Ion Mass Spectrometry (SIMS). What is SIMS? SIMS is a surface analysis technique used to characterize the surface and sub-surface region.
Centre de Toulouse Radiation interaction with matter 1.
Ruđer Bošković Institute, Zagreb, Croatia CRP: Development of a Reference Database for Ion Beam Analysis Measurements of differential cross sections for.
Lecture 1.3: Interaction of Radiation with Matter
Ion Beam Analysis Dolly Langa Physics Department, University of Pretoria, South Africa Blane Lomberg Physics Department, University of the Western Cape,
Korea Institute of Geoscience and Mineral Resources (KIGAM) Thin Film Analysis by Ion Beam Techniques W. Hong, G. D. Kim, H. J. Woo, H. W.
Space Instrumentation. Definition How do we measure these particles? h p+p+ e-e- Device Signal Source.
Study of the 40 Ca(  ) 44 Ti reaction at stellar temperatures with DRAGON Christof Vockenhuber for the DRAGON collaboration Vancouver, B.C., Canada.
FRANK LABORTORY OF NEUTRON PHYSICS ION BEAM ANALYSIS
DDEP 2012 | C. Bisch – Study of beta shape spectra 1 Study of the shape of  spectra Development of a Si spectrometer for measurement of  spectra 
Time of Flight (ToF): basics Start counterStop counter TOF – General consideration - early developments combining particle identifiers with TOF TOF for.
GEM: A new concept for electron amplification in gas detectors Contents 1.Introduction 2.Two-step amplification: MWPC combined with GEM 3.Measurement of.
Sputter deposition.
Mass spectrometry (Test) Mass spectrometry (MS) is an analytical technique that measures masses of particles and for determining the elemental composition.
Reminders for this week Homework #4 Due Wednesday (5/20) Lithography Lab Due Thursday (5/21) Quiz #3 on Thursday (5/21) – In Classroom –Covers Lithography,
Ion Beam Analysis Today and Tomorrow Ferenc Pászti Research Institute for Particle and Nuclear Physics, Budapest 20+5 min.
2. RUTHERFORD BACKSCATTERING SPECTROMETRY Basic Principles.
Modification of Si nanocrystallites in SiO2 matrix
The physics of electron backscatter diffraction Maarten Vos AMPL, RSPHYSSE, Australian National University, Acton 0200, Canberra Aimo Winkelmann Max Planck.
Nuclear Physics. The famous Geiger-Marsden Alpha scattering experiment (under Rutherford’s guidance) In 1909, Geiger and Marsden were studying how alpha.
Daniela Adriana LĂCĂTUŞ1 Supervisor: Alexander Pavlovich KOBZEV
Accelerator Physics, JU, First Semester, (Saed Dababneh). 1 Electron pick-up. ~1/E What about fission fragments????? Bragg curve stochastic energy.
Atomic Layer Deposition for Microchannel Plates Jeffrey Elam Argonne National Laboratory September 24, 2009.
Basics of Ion Beam Analysis
Ion Beam Analysis of the Composition and Structure of Thin Films
Rutherford Backscattering Spectrometry (RBS)
Questions/Problems on SEM microcharacterization Explain why Field Emission Gun (FEG) SEM is preferred in SEM? How is a contrast generated in an SEM? What.
Karolina Danuta Pągowska
Lecture 5: Secondary ion mass spectroscopy (SIMS) Assoc. Prof. Dr. Zainovia Lockman, PPKBSM, USM EBB 245. Materials Characterisation.
Overview of Tandem Accelerator Facility and related R&D Work at NCP Ishaq Ahmad
Scanning Transmission Electron Microscope
MICRO-STRIP METAL DETECTOR FOR BEAM DIAGNOSTICS PRINCIPLE OF OPERATION Passing through metal strips a beam of charged particles or synchrotron radiation.
Picosecond timing of high energy heavy ions with semiconductor detectors Vladimir Eremin* O. Kiselev**, I Eremin*, N. Egorov***, E.Verbitskaya* * Physical-Technical.
Potku – A New Analysis Software for Heavy Ion Elastic Recoil Detection Analysis K. Arstila 1, J. Julin 1, M.I. Laitinen 1, J. Aalto 2, T. Konu 2, S. Ka.
Efficient transfer reaction method with RI BEams
Coatings for neutron conversion for n_TOF
What is XPS? XPS (x-ray photoelectron spectroscopy) is also known as ESCA (electron spectroscopy for chemical analysis). XPS provides chemical information.
Monte Carlo simulation of the GEM-based neutron detector
Prof. Jang-Ung Park (박장웅)
Carbon-Foil for reducing first strike issues
Quadropole Mass Analyzer
1. Introduction Secondary Heavy charged particle (fragment) production
ION BEAM ANALYSIS.
PHL424: Rutherford scattering discovery of nucleus
Semiconductor Detectors
Co-Al 시스템의 비대칭적 혼합거동에 관한 이론 및 실험적 고찰
PbWO4 Cherenkov light contribution to Hamamatsu S8148 and Zinc Sulfide–Silicon avalanche photodiodes signals F. KOCAK, I. TAPAN Department of Physics,
Thin Film Analysis by Ion Beam Techniques
PHYS 3446 – Lecture #17 Wednesday ,April 4, 2012 Dr. Brandt
Ion Beam Analysis (IBA)
Presentation transcript:

M. Laitinen, M. Rossi, P. Rahkila, H. J. Whitlow and T. Sajavaara New high resolution spectrometer for nanometer level elemental depth profiling M. Laitinen, M. Rossi, P. Rahkila, H. J. Whitlow and T. Sajavaara Department of Physics, P.O.B 35, FIN-40014 University of Jyväskylä, Finland email: mikko.i.laitinen@jyu.fi

The New Spectrometer: What does it look like and how does it works ?

The new spectrometer: How does it look like and how it works ? 1) Energetic ions from the accelerator are directed to the sample 2) while travelling in the material ions undergo collisions with sample atoms and as a result they lose energy and also they kick out sample atoms. Sometimes they also scatter out of the sample. 3) velocity and energy are measured from scattered particles and different masses can be distinguished In principle all sample elements can be quantified M. Putkonen, T. Aaltonen, M. Alnes, T. Sajavaara, O. Nilsen, and H. Fjellväg, Atomic layer deposition of lithium containing thin films, J. Mater. Chem. 19 (2009) 8767.

Time-of-Flight – Elastic Recoil Detection (ToF-ERD) Quantitative method: Energy from well known kinematics Time-resolution better than E-detector resolution Element (mass) from ToF and E signals Scattering propability to detectors Coulombic interaction potential Depth information Semi-empiric parametrization for energy loss “Quantitative TOF-ERD analyses are based on well know measurement geometry and kinematics, separation of different masses, well known scattering probability and trusted energy losses. Energiaspektrit ja siis syvyysprofiilit lasketaan kahden syyn takia TOF-signaalista: (energia)resoluutio on parempi raskaille massoille ja kalibraatio on lineaarinen

TOF detection efficiency All sample elements, also H, can be detected Can get better only by getting more electrons out of the carbon foils -> coating the carbon foils with Atomic Layer Deposition, ALD Better than 98% for C and heavier masses ~ 90 % for 4He ~ 10-60% for H Sample holder backwall Energiailmaisimen tehokkuus on 100% mutta lentoaikaporttien tehokkuus on matalampi kevyille alkuaineille, koska hiilikalvosta irtoaa elektroneja silloin vähemmän. Measured with 1600 V MCP voltage, 3000 V mirror voltage and 200x preamplifier

Time-of-flight resolution Timing with external 200x preamplifier, CFD and TDC Current resolution timing resolution 300 ps for 4.5 MeV incident He ions scattered from 1 nm Au film on Si substrate Timing: 300 ps equals ~ 4mm for 4.4 MeV He Upgrade: fast preamplifiers inside the chamber 300 ps Tärkeää tässä on sanoa tuo että tämä on määritetty sironneelle suihkulle.

Diamond-like carbon films 2.3 µm thick diamond-like-carbon film on Si Measured with 9 MeV 35Cl All isotopes can be determined for light masses Light elements can be well quantified (N content 0.05±0.02 at.%) Menetelmä soveltuu bulk-näytteiden mittaamiseen.

First results: 8.6 nm Al2O3 Atomic layer deposited Al2O3 film on silicon (Prof. Ritala, U. of Helsinki) Density of 2.9 g/cm3 and thickness of 8.6 nm determined with XRR (Ritala) Elemental concentrations in the film bulk as determined with TOF ERDA are O 60±3 at.%, Al 35±2 at.%, H 4±1 at.%. and C 0.5±0.2 at.%. Parhaimmillaan menetelmä on ohutkalvotutkimuksessa. hiili eroaa pinnassa ja rajapinnassa (surface and interface).

Example with high mass element Atomic layer deposited Ru film on HF cleaned Si (Dr. Kukli, U. of Helsinki) Bulk density of 12 g/cm3 used in the depth profiles Monte Carlo simulations needed for getting reliable values for light impurities Metallic films have traditionally been difficult to deposit with ALD. This is one example of ongoing analysis of these Ru thin films. Scattered 35Cl is used for Ru depth profile, recoiled Ru suffers too much from multiple scattering.

Future improvements: New TOF-gate ALD-coated thin C-foils for high electron yields (coming) Timing from backwards emitted electrons Position (scattering angle) from forward emitted electrons and delay line anode Anodes made on PCB Myös etusironneita elektroneja: paikkaherkkään anodiin Commercial MCP stacks by TECTRA

Future improvements: Gas ionization detector Massaerotuskyky raskaammille massoille paranee huomattavasti, huomaa mm Si:n isotoopit TOF-E results from Paul Scherrer Institute Incident ion 12 MeV 127I and borosilicate glass target Nucl. Instr. and Meth. B 248 (2006) 155-162

Conclusions New high resolution spectrometer has been built in JYFL ToF-ERDA provides unique capabilities for quantitative depth profiling of all the sample elements, including hydrogen Depth resolution of <2 nm at the surface has been reached in Jyväskylä, further improvements coming within months 1st timing detector, 3 μg/cm2 C-foil 2nd timing detector, 10 μg/cm2 C-foil

Accelerator based materials physics goup in JYFL Acknowledgements Mikko Ritala, U. of Helsinki Matti Putkonen, Beneq Oy and Aalto University Kaupo Kukli, U. of Helsinki TEKES-EU Regional Funds Academy of Finland TEKES Accelerator based materials physics goup in JYFL

1st timing detector, 3 μg/cm2 C-foil 2nd timing detector, 10 μg/cm2 C-foil