Technology Roadmap for Nano-electronics

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Presentation transcript:

Technology Roadmap for Nano-electronics Rational You ITRI-IEK-NEMS 2001/08/01 Source: IST (2000/11)

Contribution of Electronics to the Gross Product Source: IST (2000/11)

Electronic Market Forecast Source: IST (2000/11)

Minimum Feature Size versus Year of Introduction Source: IST (2000/11)

Selected data from ITRS 1999 Source: IST (2000/11)

Technical Requirements for Memory Applications Source: IST (2000/11)

The System-on-a-Chip of the Future? Source: IST (2000/11)

Technical Requirements fir Logic Applications Source: IST (2000/11)

Estimated Governmental Support to Nanoscience and Technology in Europe Source: IST (2000/11)

Nature of the NID Projects Source: IST (2000/11)

Energy -- Delay Diagram for Electronics Source: IST (2000/11)

Cost of a Semiconductor Facility Source: IST (2000/11)

Principle of a Single Electron Transistor Source: IST (2000/11)

Comparison between Conventional and Single Electron Memories Source: IST (2000/11)

Concept of an Interband Tunnelling Diode Source: IST (2000/11)

An Interband Tunnelling Device in Operation Source: IST (2000/11)

Concept of a Resonant Tunnelling Device. Source: IST (2000/11)

Oscillation Frequencies for ITD and RTD Source: IST (2000/11)

Comparison of Tunnelling Devices Parameters Source: IST (2000/11)

Concepts for three terminal tunnelling devices-1” Source: IST (2000/11)

Concepts for three terminal tunnelling devices-2 Source: IST (2000/11)

Transport through a Molecule Source: IST (2000/11)

Scheme of a Hybrid Metal-Molecule-Semiconductor Structure Source: IST (2000/11)

Scheme of a Spin Valve Source: IST (2000/11)

Scheme of a Tunnel function Source: IST (2000/11)

Y-branch Switch Source: IST (2000/11)

Maturity of Lithography Options Source: IST (2000/11)

Practical and Ultimate Resolution Limits for Lithography Source: IST (2000/11)

Sensitivity perType of Lithography Source: IST (2000/11)

Resolution and Sensitivity for E-beam Lithography Source: IST (2000/11)

The Imprint Process Source: IST (2000/11)

The Inking Process Source: IST (2000/11)

Comparison of Printing Techniques Source: IST (2000/11)

Throughput us resolution for Different Exposure Techniques Source: IST (2000/11)

Design Hierarchies for Nanoscale Circuits Source: IST (2000/11)

CMOS Gate Delay vs Gate Length Source: IST (2000/11)

RTD/HFET Circuits Source: IST (2000/11)

Performance for Tunnelling Based SRAM and Si Memory Source: IST (2000/11)

The Two Polarization States in a QCA Cell Source: IST (2000/11)

Logic Functions Based upon a QCA Majority Voting Gate Source: IST (2000/11)

Dot Distance Requirements for a QCA Circuit Source: IST (2000/11)

Intelligent RAM Chip (IRAM) Source: IST (2000/11)

Propagated Instruction Processor Source: IST (2000/11)

The Re-configurable Architechture Workstation (RAW) Source: IST (2000/11)

Redundant Interconnections of the Teramac Source: IST (2000/11)

Aspects of Architectures for Nano-electronic Systems Source: IST (2000/11)

Components of Nano-electronic Architectures Source: IST (2000/11)

Comparison of Architectures Source: IST (2000/11)

Comparison Memory Devices Year 2000 Source: IST (2000/11)

Forecast Memory Devices Year 2006 Source: IST (2000/11)

Forecast Memory Devices Year 2012 Source: IST (2000/11)

Comparison Logic I High Frequency Devices Year 2000 (in production) Source: IST (2000/11)

Comparison Logic I High Frequency Devices Yar 2000 (in research) Source: IST (2000/11)

Forecast Logic I High Frequency Devices Yar 2006 Source: IST (2000/11)

Forecast Logic I High Frequency Devices Year 2012 Source: IST (2000/11)

Comparison Circuit Performance Year 2000 Source: IST (2000/11)

Forecast Circuit Performance Year 2006 Source: IST (2000/11)

Forecast Circuit Performance Year 2012 Source: IST (2000/11)

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