Semiconducting SWCNTs: from materials to thin film transistors

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Presentation transcript:

Semiconducting SWCNTs: from materials to thin film transistors Information, data and drawings embodied in this document are strictly confidential and are supplied to the team members of the Printable Electronics Consortium participating in this Project on the understanding that they will be held confidentially and not disclosed to third parties without the prior written consent of the NRC Executive Director responsible for the Printable Electronics Program. Semiconducting SWCNTs: from materials to thin film transistors Zhao Li, Patrick R. L. Malenfant, Jianfu Ding, Jacques Lefebvre Security and Disruptive Technologies Portfolio, National Research Council Canada, Ottawa, ON, Canada Nov. 16, 2015, Nanotek San Antonio

Outline Single wall carbon nanotubes (SWCNTs) Introduction of SWCNTs Purification and application Our hybrid process: high yield and high purity materials Fabrication of high performance TFTs with organic SWCNT dispersion Substrates surface treatment Effect of Polymer/tube ratio Multiple soaking process for high density uniform network Raman microscopy mapping for SWCNTs network purity assessment Introduction of the Raman mapping method Two samples with different purity

Structure and electrical properties of SWCNTs (6,6) Diverse distribution of chirality and diameter n-m =3q: metallic; n-m ≠3q: semiconducting Raw as grown materials contain tubes with sc/m=2/1 Applications: Metallic: transparent conductor Semiconductor: TFT

Purification and Enrichment of SWCNTs Density Gradient Ultracentrifugation Conjugated polymer extraction Chromatography Nat. Nanotechnol., 2007, 2, 640. • ACS Nano, 2013, 7, 2971 Simple scalable process Low cost High tube content Organic solvent based Nat. Nanotechnol., 2006, 1, 60.

sc-SWCNTs Enrichment ---- by PFDD Extraction Raw Plasma CNTs 100k 16k 12k Raw Enriched RBM Raman intensity (a.u.) 8k 75k M 4k 100 50k 150 200 250 300 25k 1.2 Sample Sediment Raw(x1/20) sc-SWCNT  0.047 0.082 0.406 S11 1000 2000 Wavenumber (cm-1) 3000 Absorbance (a.u.) Enriched CNTs Filtrate(x1/20) ------ S22 0.8 1000 M 11 0.4 S33 Ex/nm (10,9) 900 PFDD 400 800 1200 1600 Wavelength (nm) Single extraction yield: ~2% Purity: >99% 0.0 2000 800 1400 1500 1600 1700Em/nm Nanoscale, 2014, 6, 2328

sc-SWCNTs Enrichment ----Hybrid Processing dispersing + Conjugated Polymer Extraction Silica Gel Adsorption (1) Adding SiO2 Dispersing Separating (2) Mixing Separating Nanoscale, 2015, 7, 15741

sc-SWCNTs Enrichment ---- SiO2 Adsorption 600k b-2 PFDD/CNT = 8/1 Ex: 785 nm, RBM Ex2 Hy2 Ad2 Adding SiO2 + centrifugation Raman intensity (count) 400k Supernatant (Hy) Supernatant (Ex) Sediment (Ad) 200k For a single extraction Yield: 10% vs. 2% Purity: >99% 100 150 200 250 300 1.2 b: PFDD/CNT=8/1 Sample  (%) Ex2 0.356 11.0 Hy2 0.413 10.0 Ad2 0.255 0.72 600k Wavenumber (cm-1) a-2 PFDD/CNT = 8/1 Ex: 633 nm, D and G band G+ Absorbance (a.u.) Raman intensity (count) G  G m sc 0.8 S 400k 22 Ex2 Hy2 Ad2 M11 0.4 200k 0.0 400 600 800 1000 1200 1400 1600 Wavelength (nm) 1800 2000 1300 1400 1500 Wavenumber (cm-1) 1600 1700

sc-SWCNTs Enrichment by Hybrid Processing---- Commercialized by Raymor NanoIntegris Patent: USP 61/867,630.WO 2015024115 A1 IsoSol-S100®: The highest-ever purity semiconducting carbon nanotube ink that is produced using a simple, cost-effective, truly scalable route, Award: Best New Materials Award at IDTechEx’s PE USA 2014. .

TFT device fabrication and characterization Deposit electrodes O H N For aqueous SWCNT solution, PLL has to be used for adhesion n PLL NH2 Nano Lett. 2009, 9, 4285 How to get a high density uniform network with an organic ink system?

SWCNT network on SiO2: with or without PLL CSWCNT (mg/L) 2.6 26.4 With PLL Without PLL Clean SiO2 without PLL shows better adhesion to SWCNT/CP organic dispersion, especially at high concentration.

SWCNT network on SiO2: CP/SWCNTs weight ratio 1:1 5:1 30:1 CP/SWCNTs weight ratio Solution stability Adhesion Network 1:1 poor Good bundles 5:1 30:1 Very good alignment Choose 5/1 weight ratio in the following study Organic Electronics, 2015, 26, 15

SWCNT network on SiO2: concentration and density solution (mg/L) Tube density /μm2 Mobility cm2/Vs On/off ratio 1.0 3.8 Under percolation threshold 3.0 31 4.8±1.5 7.4x105 9.0 68 18±1.6 1.6x106 27 87 25±3.8 7.3x105 Source Drain SC-SWCNT SiO2 Gate (Doped Si) 5:1 CP:SWCNT Good control of network density and device performance

Network density: higher concentration CSWCNT = 80 mg/L (5/1 CP/SWCNT), mobility decreased to 10 cm2/Vs Non-uniform network Dispersion: gel-like behaviour Stronger tube-tube interaction Stacked frame structure

Network density: multiple layer coating Soaking, rinsing annealing Repeat 3-5 times with 27 mg/L solution

Multi-layer coating for high density network 55 56 60 58 54 59 57 53 61 64 66 65 63 69 On-current distribution of 25 TFTs covering 5X5 mm2 area: 60±4 µA Other methods for high density network: Chemical self-assembly Langmuir-Schaefer assembly Nat. Nanotechnol. 2012, 7, 787 Nat. Nanotechnol. 2013, 8, 180

TFT device performance Uniform SWCNT network High purity sc-tubes • μ= 39 ± 3.7 cm2/Vs • On/off = 105.0±0.4 2E-4 7E-5 6E-5 2E-4 VG=-5 V -4 V -3 V -2 V -1 V 0 V 2E-5 5E-5 2E-6 4E-5 ISD (A) 1E-4 ISD (A) ISD (A) 3E-5 2E-7 2E-5 5E-5 2E-8 1E-5 2E-9 0E+0 0E+0 -10 -8 -6 -4 -2 0 VG (V) 2 4 6 8 10 -2 -4 -6 -8 -10 VSD (V)

SWCNT network: dip-coating without rinsing CSWCNT=26.5 mg/L, uniform SWCNT network buried in CP matrix (80% wt) • μ= 35 cm2/Vs, on/off=1.3 x 104 Attractive due to this process is compatible with printing process

Purity assessment of SWCNT materials UV absorption spectrum Massive device testing 1.2 b: PFDD/CNT=8/1 Sample  Ex2 0.356 Hy2 0.413 Ad2 0.255 (%) 11.0 10.0 0.72 Absorbance (a.u.) 0.8 S 22 M11 0.4 0.0 400 600 800 1000 1200 1400 1600 Wavelength (nm) 1800 2000 Qualitative information Solution samples Hard to access instrument Tedious device fabrication and testing Nature Nano. 2012, 7, 787

Raman spectroscopy for SWCNTs RBM band: diameter D band: defects G band: m or sc Physics Reports 2005, 409, 47

E22sc E33 E11sc E11m Kataura plot 514 nm laser: 2.41 eV 633 nm laser: Plasma or laser tube: ~1.3 nm

Raman microscopy mapping method SEM Renishaw inVia confocal Raman microscopy

Raman spectra and maps at 514 nm 16 X 16 µm2 Nano Research, 2015, 8, 2179

Raman spectra and maps at 633 nm (15, 6) (16, 4) (14, 5) Counted 21 m-tubes

Two samples with different sc-purity: UV and Raman 1 1000 0.8 800 SC1 Absorption (a.u.) SC1 SC2 0.6 SC2 Intensity 600 0.4 400 0.2 200 400 800 1200 1600 Wavelength (nm) 2000 1200 1300 1400 1500 1600 1700 1800 Raman Shift (cm-1) UV and regular Raman only give qualitative purity information

Two samples with different sc-purity: Raman G- map m-tubes 135 20 m-tube content 1.0% 0.2% sc-purity 99.0% 99.8%

Two samples with different sc-purity: TFT performance 25 1E+8 SC1SC1 1E+7 20 1E+6 Mobility (cm2/Vs) On/off ratio 1E+5 15 1E+4 10 1E+3 1E+2 5 1E+1 SC1 SC2 2.5 5.0 2.5 5.0 Channel Length (µm) SC1 SC2 2.5 5.0 2.5 5.0 Channel Length (µm) 1E+0

Thank you, question? Conclusion Conjugated polymer extraction can provide high purity, organic solvent based SWCNT materials. Hybrid process can further improve yield. High density and uniform SWCNT networks were fabricated on SiO2 surface which shows high TFT performance. A Raman microscopy mapping method was developed to assess the sc-purity of SWCNT networks. Thank you, question?