Recurrent implantation failure: definition and management C. Coughlan, W. Ledger, Q. Wang, Fenghua Liu, Aygul Demirol, Timur Gurgan, R. Cutting, K. Ong, H. Sallam, T.C. Li Reproductive BioMedicine Online Volume 28, Issue 1, Pages 14-38 (January 2014) DOI: 10.1016/j.rbmo.2013.08.011 Copyright © 2013 Terms and Conditions
Figure 1 The initial stage of implantation, when the embryo is invading the epithelial layer of the endometrium to be embedded in the stroma compartment. Reproductive BioMedicine Online 2014 28, 14-38DOI: (10.1016/j.rbmo.2013.08.011) Copyright © 2013 Terms and Conditions
Figure 2 Salpingectomy for hydrosalpinx to improve the implantation rate. Diathermy and incision should be made as close as possible to the under surface of the tube and as far as possible from the ovary to avoid compromising the ovarian supply, which may in turn reduce ovarian response to stimulation during IVF treatment. Reproductive BioMedicine Online 2014 28, 14-38DOI: (10.1016/j.rbmo.2013.08.011) Copyright © 2013 Terms and Conditions
Figure 3 Endometrial scratch to improve implantation rate in women with recurrent implantation failure. (A) First, the pipelle sample is inserted until it reaches the fundus. (B) The inner plunger is withdrawn to apply a suction force to the endometrial cavity. (C) Endometrial scratch of the superficial layer of the endometrium is performed with the use of a ‘hoovering’ movement, combining a rotational and in-and-out movement of the pipelle sampler several times. Reproductive BioMedicine Online 2014 28, 14-38DOI: (10.1016/j.rbmo.2013.08.011) Copyright © 2013 Terms and Conditions