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Mega Fluid System Business Global supplier, leader, and center of excellence for the design and manufacture of slurry and UHP chemical delivery systems for > 20 years Largest installed base > 1,250 tools worldwide Supplying 4 – 14/16nm node Fabs with tools today Developing Systems for Expanding Legacy Systems (200mm) Provide global Field Service support and training Maintain an integrated supply chain management system CMP R&D Lab w/ full-scale tools for developing systems, analytics & components Joint development with most large CMP slurry suppliers Documented knowledge of slurry and chemical properties and optimal handling

Our Vision & Mission VISION: To engage with industry leaders to provide innovative and complete liquid blend and delivery solutions that enhance our customers’ success. MISSION: Mega Fluid Systems is a trusted industry supplier of high-performance blend and delivery systems in semiconductor, solar, and emerging manufacturing applications. We achieve this by: Collaborating with our customers and suppliers to solve complex problems and enhancing cost of ownership Executing with efficiency and delivering on commitments Infusing integrity and quality into everything we do.

2014 Accomplishments Developed R&D System for Custom Blends – ProQual™ Shortens time to qualify new processes Tightens correlation to full production systems Modular platform for expansion or modification Successfully implemented by Fab Customers Designed Chemical MegaBlend System in Modular Platform Lower Cost base, accommodates modular expansion and retrofits. 18 L/min High Volume Slurry & Chemical Blend/Dispense Platform 12 different slurry and chemical blends with appropriate analytics Successfully implemented in HVM Fabs Developed Strategic Alliances with Partners for Ramps & Full Support Assemblers, Installers & Field Service Analytics Companies & Slurry Suppliers Combined Slurry Dispense and Filter into 1 SBD Cabinet Requested by Key Customer,, Smallest footprint complete blend and filtration system in the industry

2014 Accomplishments Sales and Service ~3x Increase Revenue 2014 over 2013 Products Shipped to New Major Customers with Excellent Results Pursuing Customers Outside of Semi First Turn-Key Contract for CMP Room Management Expanded Field Service Organization Operations No Reportable Safety Incidents Shipped > 30 Tools, > 70 VMBs, and Ancillary Equipment Implemented Pure Safety Program Implemented Concentric Ring Strategy for Growth

Integrated Systems, Engineering and R&D Design Engineering Manufacturing Engineering Custom Engineering Specials Software Design and Testing Manufacturing Controls Integration System Integration Functional Testing Field Service & Support Warranty Support Spare Parts Global Support Locations CAD ProE Wildfire 5 SolidWorks ProPipe AutoCAD (Mechanical and Electrical) MasterCAM Windchill Vaulting System ERP & PLM Dynamix AX BlueStar Windchill Analysis AFT Fathom – Fluid System Modeling (flow, pressure, blend, etc.) MathCAD JMP ProMechanica Controls and Automation Rockwell, Siemens, Indusoft, Omron, Panasonic LabView C, C++, VB

Slurry Blending & Distribution Solutions SBD25 Slurry Blend & Distribution SBD100 Slurry Blend & Distribution SA200 Particle Measurement SF200 Slurry Filtration SA100 Slurry Analytical

Mega Partners with Fabs & Slurry Suppliers Mega Continuously Optimizing Systems for Fab Performance Demands Evaluate Slurries in Mega R&D Lab to Optimize Slurry Quality & Tool Availability Understand and Optimize Blend & Delivery Systems for Slurry Needs Slurry Particle unique requirements Developing New Systems to Monitor Slurry Quality As Fab Needs Evolve, Develop New Supporting Systems, examples: Particle Distribution in Line (esp. Barrier Slurries) In-Line H2O2 Concentrations <1% Continued Learning on Large Particle Analytics Mega ProQual for Slurry/CMP Process Yield & Cost Optimization Wet Chemicals – Specialty Cleans and Strips Slurries – Optimize Dilution, Oxidizers, etc.

Research and Development Lab R&D Lab at Mega Fluid Systems Tualatin, Oregon site Full-scale tools for process development, analytics and component testing Complete array of slurry characterization tools to address nanoslurries Simulation of single and dual global loop configurations and POU consumption (300 meters total with 6 meter rise, up to 20 LPM per loop) Running several tests in slurry and chemical simultaneously

Optimizing Systems for Advanced Slurries 11/17/2018 Optimizing Systems for Advanced Slurries Example HVM Fab Customer Simulated operational performance in global loops modeled on customer design for Priority Slurries Ceria Slurry with H2O2 and Polymer coated Alumina Silicas: Cu, Barrier and W Identified operational outliers and areas of concern that need to be understood and accommodated prior to full production (including Analytics issues) Worked with Slurry Suppliers for their learning and support Provided data to customer to utilize in the process of creating operational guidelines to optimize process control and minimize risk factors

Example: Tungsten Slurries Fumed or Colloidal Silica or Polymer Coated Alumina particles with >0.5% H2O2, pH 2.2-2.5 Process Concern MFS Addresses Concerns Explanation Removal Rate Reproducibility Engineered tank mixing Need to keep particles suspended without shear; protect the stern layer for silicas & protect polymer coating for W8xxx slurries. Removal rates are a function of nominal particle size, particle concentration, pH & H2O2 Mixing in blend/day tanks optimized for the slurry reduces settling & RR variation. Temperature controlled systems Precise dilution & chemical dosing (H2O2) Analytical capability to monitor slurry density, pH, H2O2, chemical concentration, particle size & size distribution, etc. Dishing / Erosion Precise chemical dosing (H2O2), dilution and mixing Dishing & Dielectric Erosion may vary with temperature, particle size, particle concentration, pH & H2O2. Analytical capability to monitor pH, H2O2, slurry density, etc. Scratching Low shear system components and in tank mixing High shear can cause silica particle agglomeration (or pull polymer of particles), resulting in scratches on wafers. Correct filtration can reduce numbers of large particles without removing “good” particles. State of the art filtration. Analytical capability to monitor large particles Maximize CMP Tool Availability Near 0 downtime due to system component redundancy CMP tool availability already difficult with pad life, etc. Slurry delivery should have no negative affect on availability

Colloidal Silica Particles with H2O2 Cu Bulk Slurries Colloidal Silica Particles with H2O2 Process Concern MFS Addresses Concerns Explanation Removal Rate Reproducibility Engineered tank mixing Need to keep particles suspended without shear; protect the stern layer – diffuse layer separation that keeps the slurry particles in suspension. RR is a function of nominal particle size, particle concentration, temperature, pH, chemistry, H2O2 concentration, etc. Constant temperature systems Precise dilution & chemical dosing (H2O2) Analytical capability to monitor slurry density, pH, H2O2, chemical concentration, particle size & size distribution, etc. Dishing / Corrosion Precise chemical dosing (H2O2), dilution and mixing Cu Dishing may change w/ temperature and vary with particle size, particle concentration, pH & H2O2. Analytical capability to monitor pH, H2O2, slurry density, etc. Scratching Low shear system components and in tank mixing High shear can cause silica particle agglomeration, resulting in scratches on wafers. Correct filtration can reduce numbers of large particles without removing “good” particles. State of the art filtration. Analytical capability to monitor large particles Maximize CMP Tool Availability Near 0 downtime due to system component redundancy  

Low concentration colloidal silica particles with <1% H2O2 Cu Barrier Slurries Low concentration colloidal silica particles with <1% H2O2 Process Concern MFS Addresses Concerns Explanation Removal Rate Reproducibility Engineered tank mixing Need to keep particles suspended without shear; protect the stern layer – diffuse layer separation that keeps the slurry particles in suspension. RR changes w/ pH & temperature, . Cu:Barrier:Dielectric removal rate ratios are a function of nominal particle size, particle concentration, pH & H2O2 Constant temperature systems Precise dilution & chemical dosing (H2O2) Analytical capability to monitor slurry density, pH, H2O2, chemical concentration, particle size & size distribution, etc. Dishing / Erosion Precise chemical dosing (H2O2), dilution and mixing Cu Dishing & Dielectric Erosion may change w/ temperature and vary with particle size, particle concentration, pH & H2O2. Analytical capability to monitor pH, H2O2, slurry density, etc. Scratching Low shear system components and in tank mixing High shear can cause silica particle agglomeration, resulting in scratches on wafers. Correct filtration can reduce numbers of large particles without removing “good” particles. State of the art filtration. Analytical capability to monitor large particles Maximize CMP Tool Availability Near 0 downtime due to system component redundancy  

CMP Slurry Analytics Particle Monitoring Large Particle (e.g., Slurry Agglomerate) Monitoring Particle Measuring Systems for 0.5 μm or 0.2 μm (minimum) Vantage in-line SlurryScope (typical 1 μm minimum, but also monitors trends) Other Techniques in R&D Additive Concentration Conductivity pH Index of Refraction (Entegris Jetalon) Auto-Titrator KPatents H2O2 Analysis New Proprietary System in Development

R&D Roadmap – Performance Driven   Parameter  Year  pre-2012 2014 2015 Particle size, precision mean +/-0.5nm offline size distribution online Large particle count (slurry) >0.5um dilution ≥1um non-dilution >0.5um non-dilution Specific gravity, precision +/- 0.002 +/- 0.0002 +/- 0.00001 pH, precision +/- 0.1 A/D far from probe +/- 0.05 digital +/- 0.025 digital conductivity, precision +/- 20 uS/cm A/D far from probe +/- 5 uS/cm digital +/- 2 uS/cm digital Peroxide concentration, on-line accuracy N/A within 3% of manual titration <0.5% H2O2 +/- 0.1%, within 2% manual titration

Summary of Mega Advantages Highest Availability Slurry & Chemical Systems with Redundancy and Auto-Switching within Each System Systems Optimized for Large, Medium or Small Blend and/or Distribution of Chemistries & Slurries Extensive Knowledge/Insight into Slurry and Analyticals to Monitor Slurry Quality Continued Development of Analytics for Monitoring and Measuring Slurry Quality Understanding the Impact of Blend and Distribution Systems Optimization of Blend & Dispense Systems to Optimize Slurry at CMP Tool POU Working to Improve Both Performance & Yield for the Fab

Quality Policy We ensure compliance to our Quality Management System. We empower our employees with the authority & responsibility to effect change to meet or exceed customer expectations. We manage our systems and processes to provide safe, consistent and predictable results, with the speed and flexibility ensuring customer satisfaction. We monitor performance and drive continual improvement to achieve greater results, securing Mega Fluid Systems as an industry leader.

We Are Mega Fluid Systems www.megafluidsystems.com