Experiment 5 Ravi.K.Reddy.

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Presentation transcript:

Experiment 5 Ravi.K.Reddy

Ravi.K.Reddy-Fab Course1 Outline Everything you already learnt + NEW pictures 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 What you will Learn What is Fabrication Lithography How to Fabricate Molds Microelectrode Arrays Learn to use Spin Coater Mask Aligner ssls.nus.edu.sg/.../ limint/beamline.htm 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Litho/Fabrication PhotoLithoGraphy :Light- stone-writing 11/22/2018 Ravi.K.Reddy-Fab Course1 Lithoguru.com

Ravi.K.Reddy-Fab Course1 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Photo Mask Design Software Manufacture Quartz Optics Chrome coated 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Processing 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Substrate Cleaning RCA Clean 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Primer HMDS Hexa Methly Di Silazane Good Adhesion Dehydration 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Spin Coating Use Data Sheets. 30% of the solvent is evaporated 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Spin Coating… Striations Edge Bead Streaks Comets 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Pre Bake :Soft Bake To make the resist denser and evaporate the solvent Hot plate still the best method compared to IR Lamps and Microwave heating 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Exposure www.bio-logic.info/ rapid-kinetics/spectros.html 11/22/2018 Ravi.K.Reddy-Fab Course1 www.wacom-ele.co.jp/

Ravi.K.Reddy-Fab Course1 Expose/Develop Steps 11/22/2018 Ravi.K.Reddy-Fab Course1

More about Photo Resists Dills Paramaters Α=AM+B A B M A=(aPAC –aP)C0 B=Absorption of other components which don’t change there properties. M=C/C0 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Optics 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Resist chemistry 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Early Photo Resists 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Azides Negative Photo Resist Problems Issues with Contrast Bridging Swelling during development 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 New Generation -DNQ “Wave length Limited” resolution achieved for the first time here Low Contrast 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Second Turning Point PAG- Photo Acid Generators High Contrast Used in 193nm Tech. Fast Reaction 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Chemistry Behind it 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Recap of Litho 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Aligners 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Mask Aligners 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Steppers 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 ASML Stepper 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 THE LATEST AND BEST 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Post Exposure Bake Sometimes the Chemical Amplification is improved by PEB. SU-8 forms cross linking here. Data Sheets of the Resists define what temperature 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Developing the PR Use developers provided by the company 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Hard Bake To have better Etch resistance. Required for process steps like Etch Little bad for profiles of the resist Reflow of the resist occurs 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Photo resist removal Positive Resists Acetone Trichloroethylene (TCE) Negative Resits Methyl Ethyl Ketone (MEK) Methyl isobutyl ketone (MIBK) 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Challenges Complex Multidimensional Phase Space Careful Optimization and tight process control 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Some Facts Litho accounts to 1/3 of the entire cost Close to 30 Masks used in each process. Process Steps >250 New Masks- Cost $3M CD determines the cost of the mask NGL >$50 per stepper 11/22/2018 Ravi.K.Reddy-Fab Course1

Ravi.K.Reddy-Fab Course1 Experiment Both Positive and Negative PR used. Understand the process better-I hope. THANK YOU 11/22/2018 Ravi.K.Reddy-Fab Course1