SFR Workshop November 8, 1999 A.B. Wengrow, and N.W. Cheung

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Presentation transcript:

Modeling and experiments on surface charge accumulation during plasma processing SFR Workshop November 8, 1999 A.B. Wengrow, and N.W. Cheung Berkeley, CA Multiple-species model developed to investigate effect of high density plasmas (HDP) on wafer charging 11/8/99

Plasma Assisted Materials Processing Lab Large Area Plasma Source Plasma Immersion Ion Implanter General purpose HPD tools for plasma research (charging studies, etching, implantation, materials modification) Large selection of species available (BF3, O2, H2, Ar, N2, F, He, CO2, H2O, plus others). Substrate bias 0-80kV DC, and 0-20 kV pulsed-AC. Transformer Coupled Plasma Source 11/8/99

Multiple-Species Effects on Charging Plasma composition will effect charging flux (e.g. molecular gas sources CFx+, carrier gas ionization, and plasma instability) 11/8/99

Single Ion Species Model Ion Current Sheath Diff. Eq. Electron Current Secondary Electrons Displacement n i ion density u b ion Bohm velocity s sheath width M ion mass V sheath voltage v e electron velocity p plasma potential k secondary electron constant o applied voltage C sheath capacitance 11/8/99

Multiple Ion Species Model and Results Effective mass concept: Effective ion Bohm velocity concept: BF3 Plasma Results 11/8/99

Plasma Mass Attenuator Set-up Processing Chamber Wafer Bias Plasma Sheath ECR Plasma Source Microwave & Gas Input Magnetic Coils Biased Ion Shutter Mass/Energy Spectrometer 3/2 " diameter 3/4 " diameter 3/8 " diameter 11/8/99

Small Diameter Shutter (3/8”) 300W m-wave power 5 sccm of both Ar and H Multi-cusp magnet mode (240Amps, plasma confined) No wafer bias 300W m-wave power 10 sccm of Oxygen Multi-cusp magnet mode (220Amps, plasma not confined) No wafer bias 11/8/99

Progress vs. Milestones Year 1 Develop an ion flux model for multiple-species plasma Preliminary results demonstrating mass attenuation effect with different source apertures Year 2 Work in progress to verify effective mass separation using mass attenuation concept Verification of multiple-species charging model with various antenna ratios and thin dielectrics 11/8/99

Future Work for 2000-2002 Development and verification of a unified model to predict particle flux and charge flux related to HDP processing. 11/8/99