Vector Raptor Overlay Analysis for High-Density ASML Data Vector Raptor measured Modeled Rotation showing Full-Field and slit rotation in fields (upper plot) BCD data from scatter Tool (bottom) Vector Raptor Overlay Analysis for High-Density ASML Data ASML measured overlay data 14,900+ data points June 12, 2007

Vector Raptor Advanced Overlay Analysis & Modeling ASML Scanner measured data Model raw data for each structure separately Remove outliers by using the model’s ability for variable-based culling Apply a simple wafer model Remove wafer-model errors Examine IntraField overlay variation error sources

ASML Data file 14,918 overlay data points after 20 data points are removed using the X-Reg variable for culling

Raw vectored data and sites on field Field-Site Layout Total of 14,918 sites 20 sites excluded by culling (> 10 nm error) Raw Overlay Data

X & Y overlay – Contour Plots of raw data Xreg data Yreg data Y-reg alignment error Fine-structure rib variation of 3-5 nm due to reticle-scan Process error in both X & Y

Wafer Model, magnitude variation Y-reg alignment error

Wafer-modeled X overlay Full-wafer modeled variation of X-overlay due to process and setup errors.

Residuals to wafer model, X-overlay Xreg Variation along a field vertical axis Note cycle every 4 mm on scan Wafer-modeled errors removed IntraField variation Note graph above showing X-overlay as a function of row-position on field 4 mm cycle due to reticle-stage travel. Approximately 1.5 nm of error Yreg error is greater

Residuals to wafer model, X-overlay 5 mm scan-period Row location on field

X & Y Vector residuals to wafer registration Vector plot , Same data as previous slide

Variation across wafer diameter Xreg data Yreg data Residuals to wafer model Plotted X & Y overlay across center row of wafer Note greater variation of Yreg data