ALE APPLICATIONS In Corial 210IL

ICP-RIE equipment for ALE applications Corial 210IL 12/5/2018 ICP-RIE equipment for ALE applications Enlarged functionality with capability to etch silicon, GaN, 2D materials, … at the atomic scale Support time-multiplexed processes in conventional dry etch reactor Smaller wafer pieces up to full 200 mm wafer Corial 210IL ALE Applications

performances atomic scale etching on corial 210IL with cosma pulse software

Atomic scale process reminder 12/5/2018 Process Steps Adsorption step Formation of reactive monolayer Purge step Evacuation of the excess adsorbent species Desorption step Exposure of the reactive monolayer to form volatile species Cleaning the reactor of all species KEREN J. KANARIK et. al., Moving atomic layer etch from lab to fab, Solid State Technology 2014 Applications of Atomic Scale Etching Power and RF&MW electronics R&D, nanotechnology nm-scale IC technology… Corial 210IL ALE Applications

Atomic scale etching of silicon 12/5/2018 Process Steps Advanced tuning of RF pulsing (red) to control ion energy Independent and rapid pulsing of chlorine (blue) and argon (green) flows during adsorption and desorption steps The laser signal shows an etch rate of 1.68 Å/cycle Corial 210IL ALE Applications

Atomic scale etching of silicon 12/5/2018 Performances Si wafer before etching Roughness = 0.188 nm Si wafer after etching of 0.5 µm Roughness = 0.277 nm Corial 210IL ALE Applications

Atomic scale etching of gan 12/5/2018 Process Steps CORIAL process steps for GaN recess etch Process steps RF Power (W) Pressure (mT) Chemistry Pulsed parameters Step 1 - Adsorption 10 25 Cl2 Ar Chlorine Step 2 - Purge Step 3 - Desorption 100 RF power Weak RF plasma activation of Cl2 is used to enhance chlorination of GaN surface Desorption of by-products is achieved in RIE mode by Ar+ Corial 210IL ALE Applications

CORIAL process steps for GaN recess etch Atomic scale etching of gan 12/5/2018 Process Steps CORIAL process steps for GaN recess etch Corial 210IL ALE Applications

Atomic scale etching of gan 12/5/2018 Performances 2’’ Sapphire wafer AlxGa1-xN / AlxGa1-xN <Si> / AlN stack GaN 50 A 1.2 µm Recess etch CORIAL process performances Process Total process duration (min) Number of cycles Period (s) Etch depth (Å) Etch rate (Å/cycle) (Å/min) ALE GaN recess etch 20 300 6 50 0.4 4 Corial 210IL ALE Applications

Atomic scale etching of gan 12/5/2018 Performances HEMT Transistor performances before (left curves) and after recess etching (right curves) Higher transconductance is obtained No deterioration of the drain current is obtained after ALE-like recess etching Corial 210IL ALE Applications

Software description cosma pulse

COSMA Pulse is a control software that broadens conventional tools’ process capabilities to enable time-multiplexed processes

Cost effective upgrade Cosma pulse benefits 12/5/2018 Advanced Process Control Enhanced functionality ALL PARAMETERS CAN BE CONTROLLED AND PULSED Short step times 10 ms DATA AQUISITION Cost effective upgrade FOR CORIAL SYSTEMS INSTALLED AT CUSTOMERS’ SITES Advanced process editing SET TO, RAMP TO AND PULSE FUNCTIONS +/-0,1% ACCURACY ON BIAS FINE TUNING Corial 210IL ALE Applications

System description Corial 210IL

Corial 210IL ALE Applications System description 12/5/2018 General View THE MOST COMPACT MACHINE ON THE MARKET ICP source 960 750 360 1570 600 420 390 490 30 % SMALLER FOOTPRINT Corial 210IL ALE Applications

Corial 210IL ALE Applications System description 12/5/2018 Detailed View EPD with laser ICP reactor Load lock Pumping system (TMP 500l/s and dry pump 110 m3/h) Chiller / Heater HV and LV power supplies ICP generator (2 Mhz) RF generator (13,56 Mhz) Process controller Corial 210IL ALE Applications

< 180 s Vacuum robot Shuttle System description Loading 12/5/2018 LOADING TIME Vacuum robot FAST AND REPEATABLE LOAD AND UNLOAD Shuttle EASY EXCHANGE BETWEEN SUBSTRATE SHAPE AND SIZE Corial 210IL ALE Applications

Shuttle holding approach corial 210IL

Shuttle holding approach 12/5/2018 Portfolio Clamping ring Quartz shuttle Wafers Wafer Moving plate O’rings O’ring Base plate Aluminum table Guaranteed no wafer damage due to SOFT wafer clamping Corial 210IL ALE Applications

Shuttle holding approach 12/5/2018 Benefits Quick adaptation to sample shape and size Optimum process conditions with NO modification of process chamber Limited cross contamination between processes by using dedicated shuttles Shuttles for single wafer treatment: 1 x 2”, 1 x 3”, 1 x 4”, 1 x 6”, 1 x 8” Shuttles for batch processing : 7 x 2”, 3 x 3” Customized shuttles are available (4” x 4”, 5” x 5”, etc) Corial 210IL ALE Applications

usability corial 210IL

Process control software 12/5/2018 COSMA COSMA CORIAL OPERATING SYSTEM FOR MACHINE The simplest, most efficient software to develop processes, operate, and maintain CORIAL systems DESKTOP APPLICATION Process Editing I Process Adjustment I Process Operation I Process Tracability I System Maintenance REMOTE CONTROL MOBILE APPLICATION Module & Process Follow-Up I Alarms & Warnings Connected Users NEW 2018 Corial 210IL ALE Applications

Reprocessing software 12/5/2018 COSMA RS DISPLAY UP TO 4 PARAMETERS FROM A RUN Simple and efficient software to analyze process runs and accelerate process development REMOTE ANALYSIS OF RUNS DRAG AND DROP CURVES TO CHECK PROCESS REPEATABILITY Corial 210IL ALE Applications

End point detection EPD with laser Real-Time etch rate measurement 12/5/2018 EPD with laser A CCD camera and laser diode, in the same measuring head, enables simultaneous visualization of the wafer surface and the laser beam impact on it. A 20 µm diameter laser spot facilitates the record of interference signals. Real-Time etch rate measurement Real-Time etched depth measurement Corial 210IL ALE Applications

ICP-RIE equipment for ALE applications Corial 210IL 12/5/2018 ICP-RIE equipment for ALE applications Enlarged functionality with capability to etch silicon, GaN, 2D materials, … at the atomic scale Support time-multiplexed processes in conventional dry etch reactor Smaller wafer pieces up to full 200 mm wafer Corial 210IL ALE Applications