Electronic structure of the SiO2 slab

Slides:



Advertisements
Similar presentations
Electronic transport properties of nano-scale Si films: an ab initio study Jesse Maassen, Youqi Ke, Ferdows Zahid and Hong Guo Department of Physics, McGill.
Advertisements

ECE 663 Ideal Diode I-V characteristic. ECE 663 Real Diode I-V characteristic.
6.4.3 Effect of real surfaces Departure from the ideal case is due to Work function difference between the doped polysilicon gate and substrate The inevitably.
Phasing Goal is to calculate phases using isomorphous and anomalous differences from PCMBS and GdCl3 derivatives --MIRAS. How many phasing triangles will.
National Science Foundation Materials for Next-Generation Power Electronics Sokrates T. Pantelides, Vanderbilt University, DMR Outcome: Collaborative.
Fick’s Laws Combining the continuity equation with the first law, we obtain Fick’s second law:
Deal-Grove Model Predictions Once B and B/A are determined, we can predict the thickness of the oxide versus time Once B and B/A are determined, we can.
Roadmap of Microelectronic Industry. Scaling of MOSFET Reduction of channel length L  L/α Integration density  α 2 Speed  α; Power/device  1/α 2 Power.
Ideal Diode Equation.
COMSATS Institute of Information Technology Virtual campus Islamabad
Nature and origin of X-rays Interaction of X-rays with atoms
Physics 452 Quantum mechanics II Winter 2012 Karine Chesnel.
Spring 2007EE130 Lecture 36, Slide 1 Lecture #36 ANNOUNCEMENTS Updated information for Term Project was posted on 4/14 Reminder: Coffee Hour today at ~4PM!
L. Head//ECE Dept./Rowan University Engineering Electromagnetics Fall 2004 Linda Head ECE Department Rowan University
1 Perspectives of the anodic aluminium oxide Presented by G.Drobychev on behalf of Savoie University-Belarus State University Collaboration 15/06/2006.
Nanocrystal Non-volatile Memory Devices Kedar Patel Liu et al (April 2006) Blauwe (Trans. on Nanotechnology, March 2002) Lin et al (TED, April 2006)
Lecture 25: Introduction to Molecular Orbital Theory The material in this lecture covers the following in Atkins. 14 Molecular structure Molecular Orbital.
Device Physics – Transistor Integrated Circuit
Reliability of ZrO 2 films grown by atomic layer deposition D. Caputo, F. Irrera, S. Salerno Rome Univ. “La Sapienza”, Dept. Electronic Eng. via Eudossiana.
Tunneling Outline - Review: Barrier Reflection - Barrier Penetration (Tunneling) - Flash Memory.
Laboratoire Matériaux et Microélectronique de Provence UMR CNRS Marseille/Toulon (France) - M. Bescond, J-L. Autran, M. Lannoo 4 th.
Resonant field emission through diamond thin films Zhibing Li 1. The problem 2. The picture 3. A simple model 4. Solution 5. Emitted current 6. Discussions.
Simulation of transport in silicon devices at atomistic level Introduction Properties of homogeneous silicon Properties of pn junction Properties of MOSFET.
© 2012 Eric Pop, UIUCECE 340: Semiconductor Electronics ECE 340 Lecture 30 Metal-Semiconductor Contacts Real semiconductor devices and ICs always contain.
Fundamental concepts of integrated-circuit technology M. Rudan University of Bologna.
Phasing Today’s goal is to calculate phases (  p ) for proteinase K using PCMBS and EuCl 3 (MIRAS method). What experimental data do we need? 1) from.
Development of an analytical mobility model for the simulation of ultra thin SOI MOSFETs. M.Alessandrini, *D.Esseni, C.Fiegna Department of Engineering.
Figure 3.1. Schematic showing all major components of an SPM. In this example, feedback is used to move the sensor vertically to maintain a constant signal.
Semiconductor Devices Lecture 5, pn-Junction Diode
F. Sacconi, M. Povolotskyi, A. Di Carlo, P. Lugli University of Rome “Tor Vergata”, Rome, Italy M. Städele Infineon Technologies AG, Munich, Germany Full-band.
Scanning Tunneling Microsopy Basics Transmission coefficient critically dependent on the distance btw. tip & surf. Electron energy level densities Electron.
1 Semiconductor Devices  Metal-semiconductor junction  Rectifier (Schottky contact or Schottky barrier)  Ohmic contact  p – n rectifier  Zener diode.
Lecture 8. Chemical Bonding
Diamond Tetrahedral Lattice of Carbon. Graphite Sheets or Layers of Rings of Carbon.
Doping-type Dependence of Damage in Si Diodes Exposed to X-ray, Proton, and He + Irradiation MURI Meeting - June 2007 M. Caussanel 1, A. Canals 2, S. K.
Introduction to semiconductor technology. Outline –6 Junctions Metal-semiconductor junctions –6 Field effect transistors JFET and MOS transistors Ideal.
ECE 875: Electronic Devices
Diodes. Silicon Crystal structure From column IVa of the periodic table and has 4 electrons to share with adjacent atoms.
A Creative Chemistry PowerPoint Presentation By Nigel Saunders Copyright © 2003 Nigel Saunders, all rights reserved Permission is granted for personal.
2. What are isotopes? Use two particles from the table above to illustrate your answer. (3 marks) 17 O & 18 O (1) Same Atomic mass / number of protons.
MOS Transistor Theory The MOS transistor is a majority carrier device having the current in the conducting channel being controlled by the voltage applied.
Electronegativity What is it? Electronegativity is the power of an atom to attract electron density Remember the definition … … look for where you get.
L ECE 4243/6243 Fall 2016 UConn F. Jain Notes Chapter L11 (page ). FET Operation slides Scaling Laws of FETs (slides 9-22)
Van der Waals dispersion in density functional theory
Floating-Gate Devices / Circuits
Lecture 25 Molecular orbital theory I
Lecture 20 OUTLINE The MOSFET (cont’d) Qualitative theory
6.3.3 Short Channel Effects When the channel length is small (less than 1m), high field effect must be considered. For Si, a better approximation of field-dependent.
Phasing Today’s goal is to calculate phases (ap) for proteinase K using MIRAS method (PCMBS and GdCl3). What experimental data do we need? 1) from native.
ECE574 – Lecture 3 Page 1 MA/JT 1/14/03 MOS structure MOS: Metal-oxide-semiconductor –Gate: metal (or polysilicon) –Oxide: silicon dioxide, grown on substrate.
Supplementary Slides for Lecture 22
The Two-Dimensional Electron Gas (2DEG)
Two-Dimensional Signal and Image Processing Chapter 8 - pictures
Device Physics – Transistor Integrated Circuit
MOS Capacitor Basics Metal SiO2
ATOMIC STRUCTURE Central cell of the Al-SiO2-nSi atomic structure. This cell is connected to Al atomic planes extending to to the left, and n-Si atomic.
Lecture 18 OUTLINE The MOS Capacitor (cont’d) Effect of oxide charges
Elements scavenger hunt
Mechanical Stress Effect on Gate Tunneling Leakage of Ge MOS Capacitor
Molecular Orbital Theory
S8 + O2  SO3 C10H16 + Cl2  C + HCl MOLES REVIEW, NOV 26,2007MFC 12 8
Device Physics – Transistor Integrated Circuit
Lecture 20 OUTLINE The MOSFET (cont’d) Qualitative theory
QM2 Concept Test 17.1 The ground state wavefunction of the electron in a hydrogen atom is Ψ 100

Acquisition Parameter Instrument : JCM-5700 Acc. Voltage : 15.0 kV
Modified at -
Fig. 3 Electrical characterization and TCAD simulations of 1D2D-FET.
Fig. 4 Resistance oscillations in Nc-G film.
Investigation of global uniformity of pattern quality in a large area
Presentation transcript:

Electronic structure of the SiO2 slab Obtained through constructing a periodic system in z direction Obtained by projecting out states associated with Al and n-Si atoms

Modification of the Hamiltonian in the SiO2 region Scale function used for modification of the Hamiltonian Current density as a function of scale function parameter

IV curves for different doping densities With original Hamitonian With modified Hamiltonian

Number of Channels in the Al and n-Si leads Al lead

Tunneling coefficients T(kx,ky) of MOS WKB result for a model barrier LDA result for a real MOS structure