Arradiance ALD/Incom MCP Test

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Presentation transcript:

Arradiance ALD/Incom MCP Test Incom substrate 40µm pores, 8 deg bias, 40:1 L/D Sent to Arradiance for resistive and emissive layer application + electrode Resistance approx 750 MΩ in vacuum Arradiance tests show 50,000 gain @ 1000v Tested as a single MCP + Phosphor High resolution images and scrubbing progress.

Arradiance ALD/Incom MCP Test UV light 550v Bright scratch on phosphor 1000v background, no obvious hotspots other than phosphor defects

SSL-UCB, ALD/Incom MCP Test Multifiber pattern fades as the MCP gain is increased Gain is quite uniform

SSL-UCB, ALD/Incom MCP Test We can see the 40µm pores We can see the Hex boundary distortions are uneven 800v MCP 2900v screen

ALD/Borosilicate MCP Test We can see the Hex boundary distortions cause gain nonuniformity 550v MCP 1000v MCP

Arradiance conduction and emission films 10 mm pore NO LEAD glass substrate, 40:1 L/D, Bias = 880V, Iout~0.4 pA/pore, gain under electron bombardment Tremsin - LAPD workshop Arradiance, Inc.

UV Scrub 25mm 40µm 40:1 ALD MCP Quite stable after 0.03 C/cm2, Starts at Bias = 700V, gain x1000, 0.6µA, change to 850v, 0.8µA at 0.03C/cm2 Quite stable after 0.03 C/cm2, vs 0.2 C/cm2 for normal MCP Note: no pre-vacuum bake