Quantum Mechanical Description of Displacement Damage

Slides:



Advertisements
Similar presentations
Electronic transport properties of nano-scale Si films: an ab initio study Jesse Maassen, Youqi Ke, Ferdows Zahid and Hong Guo Department of Physics, McGill.
Advertisements

MURI Neutron-Induced Multiple-Bit Upset Alan D. Tipton 1, Jonathan A. Pellish 1, Patrick R. Fleming 1, Ronald D. Schrimpf.
Dynamics of Vibrational Excitation in the C 60 - Single Molecule Transistor Aniruddha Chakraborty Department of Inorganic and Physical Chemistry Indian.
International Workshop of Computational Electronics Purdue University, 26 th of October 2004 Treatment of Point Defects in Nanowire MOSFETs Using the Nonequilibrium.
Radiation damage in SiO2/SiC interfaces
Quantum liquids in Nanoporous Media and on Surfaces Henry R. Glyde Department of Physics & Astronomy University of Delaware National Nanotechnology Initiative.
Joo Chul Yoon with Prof. Scott T. Dunham Electrical Engineering University of Washington Molecular Dynamics Simulations.
Kinetic Lattice Monte Carlo Simulations of Dopant Diffusion/Clustering in Silicon Zudian Qin and Scott T. Dunham Department of Electrical Engineering University.
ECE/ChE 4752: Microelectronics Processing Laboratory
Quantum Electronic Effects on Growth and Structure of Thin Films P. Czoschke, Hawoong Hong, L. Basile, C.-M. Wei, M. Y. Chou, M. Holt, Z. Wu, H. Chen and.
Molecular Dynamics Simulations of Cascades in Nuclear Graphite H. J. Christie, D. L. Roach, D. K. Ross The University of Salford, UK I. Suarez-Martinez,
Measurement and modeling of hydrogenic retention in molybdenum with the DIONISOS experiment G.M. Wright University of Wisconsin-Madison, FOM – Institute.
“Influence of atomic displacement rate on radiation-induced ageing of power reactor components” Ulyanovsk, 3 -7 October 2005 Displacement rates and primary.
Molecular Dynamic Simulation of Atomic Scale Intermixing in Co-Al Thin Multilayer Sang-Pil Kim *, Seung-Cheol Lee and Kwang-Ryeol Lee Future Technology.
Iain D. Boyd and Brandon Smith Department of Aerospace Engineering University of Michigan Ann Arbor, MI Molecular Dynamics Simulation of Sputtering.
Measurement and Simulation of the Variation in Proton-Induced Energy Deposition in Large Silicon Diode Arrays Christina L. Howe 1, Robert A. Weller 1,
Atomic Scale Understanding of the Surface Intermixing during Thin Metal Film Growth 김상필 1,2, 이승철 1, 정용재 2, 이규환 1, 이광렬 1 1 한국과학기술연구원, 계산과학센터 2 한양대학교, 재료공학부.
Atomic Scale Computational Simulation for Nano-materials and Devices: A New Research Tool for Nanotechnology Kwang-Ryeol Lee Future Technology Research.
Engineering & Computer Science 1 RADSAFE - An Integrated Radiation Effects Simulation Framework Robert A. Weller,
1 S.K. Dixit 1, 2, X.J. Zhou 3, R.D. Schrimpf 3, D.M. Fleetwood 3,4, S.T. Pantelides 4, G. Bersuker 5, R. Choi 5, and L.C. Feldman 1, 2, 4 1 Interdisciplinary.
Vanderbilt MURI meeting, June 14 th &15 th 2007 Band-To-Band Tunneling (BBT) Induced Leakage Current Enhancement in Irradiated Fully Depleted SOI Devices.
Quantum Physics II.
MURI kick-off: 5/10/05 Total-Dose Response and Negative-Bias Temperature Instability (NBTI) D. M. Fleetwood Professor and Chair, EECS Dept. Vanderbilt.
Development of an analytical mobility model for the simulation of ultra thin SOI MOSFETs. M.Alessandrini, *D.Esseni, C.Fiegna Department of Engineering.
The International Conference On Metallurgical Coatings And Thin Films ICMCTF 2005 CMSELCMSEL Hanyang Univ. Co/CoAl/Co Trilayer Fabrication Using Spontaneous.
Effects of Surrounding Materials on Proton-Induced Energy Deposition in Large Silicon Diode Arrays Christina L. Howe 1, Robert A. Weller 1, Robert A. Reed.
Molecular Dynamics Study of Ballistic Rearrangement of Surface Atoms During Ion Bombardment on Pd(001) Surface Sang-Pil Kim and Kwang-Ryeol Lee Computational.
3/6/ APS March Meeting1 Structure and interface properties of the electrolyte material Li 4 P 2 S 6 * Zachary D. Hood, a Cameron M. Kates, b,c.
F. Sacconi, M. Povolotskyi, A. Di Carlo, P. Lugli University of Rome “Tor Vergata”, Rome, Italy M. Städele Infineon Technologies AG, Munich, Germany Full-band.
Korea Institute of Science and Technology Seung-Hyeob Lee, Churl-Seung Lee, Seung-Cheol Lee, Kyu-Hwan Lee, and Kwang-Ryeol Lee Future Technology Research.
1 Molecular Simulations Macroscopic EOS (vdW, PR) Little molecular detail Empirical parameters (  ) Seeking understanding of complex systems Surfactants.
Doping-type Dependence of Damage in Si Diodes Exposed to X-ray, Proton, and He + Irradiation MURI Meeting - June 2007 M. Caussanel 1, A. Canals 2, S. K.
Effects of Device Aging on Microelectronics Radiation Response and Reliability D. M. Fleetwood, M. P. Rodgers, L. Tsetseris, X. J. Zhou, I. Batyrev, S.
Radiation Damage Quick Study Edward Cazalas 3/27/13.
June 13, MURI Annual Review X. J. Zhou, et al 1 Effects of Switched-Bias Annealing on Charge Trapping in HfO 2 high-  Gate Dielectrics X. J.
ATOMIC-SCALE THEORY OF RADIATION-INDUCED PHENOMENA Sokrates T. Pantelides Department of Physics and Astronomy, Vanderbilt University, Nashville, TN and.
June MURI Review1 Total Dose Response of HfO 2 /Dy 2 O 3 on Ge and Hf 0.6 Si 0.2 ON 0.2 on Si MOS Capacitors D. K. Chen, R. D. Schrimpf, D. M.
UNCLASSIFIED Fundamental Aspects of Radiation Event Generation for Electronics and Engineering Research Robert A. Weller Institute for Space and Defense.
Lecture 5. Particle Properties of Waves (cont’d)
CODES: component degradation simulation tool ESA Project 22381/09/NL/PA.
Ion Implantation CEC, Inha University Chi-Ok Hwang.
Single-molecule transistors: many-body physics and possible applications Douglas Natelson, Rice University, DMR (a) Transistors are semiconductor.
Experiments at LCLS wavelength: 0.62 nm (2 keV)
Sanghamitra Mukhopadhyay Peter. V. Sushko and Alexander L. Shluger
Sang-Pil Kim1,2, Kwang-Ryeol Lee1, Jae-Sung Kim3 and Yong-Chae Chung2
of interfaces in glass/crystal composites for nuclear wasteforms
Exploring Galactic Scaling Relations with Numerical Simulations
Structural Quantum Size Effects in Pb/Si(111)
Total Dose Response of HfSiON MOS Capacitors
Atomistic simulations of contact physics Alejandro Strachan Materials Engineering PRISM, Fall 2007.
Prof. Sanjay. V. Khare Department of Physics and Astronomy,
Carbon Nanotube Diode Design
Fragmentation cross sections of Fe26+, Si14+ and C6+ ions of 0
Yuwen Jiang, Delin Mo, Xiaofeng Hu, Zuimin Jiang*
Schrödinger Equation Outline Wave Equations from ω-k Relations
2005 열역학 심포지엄 Experimental Evidence for Asymmetric Interfacial Mixing of Co-Al system 김상필1,2, 이승철1, 이광렬1, 정용재2 1. 한국과학기술연구원 미래기술연구본부 2. 한양대학교 세라믹공학과 박재영,
Growth Behavior of Co on Al(001) substrate
Co-Al 시스템의 비대칭적 혼합거동에 관한 이론 및 실험적 고찰
Sang-Pil Kim and Kwang-Ryeol Lee Computational Science Center
High resolution transmission electron microscopy (HRTEM) investigations of defect clusters produced in silicon by electron and neutron irradiations Leona.
Open-State Models of a Potassium Channel
Quantitative Analysis of the Viscoelastic Properties of Thin Regions of Fibroblasts Using Atomic Force Microscopy  R.E. Mahaffy, S. Park, E. Gerde, J.
Materials Computation Center, University of Illinois
Volume 82, Issue 3, Pages (March 2002)
Multiscale Modeling and Simulation of Nanoengineering:
Mechanism of Anionic Conduction across ClC
Quasiparticle interference of the Fermi arcs and surface-bulk connectivity of a Weyl semimetal by Hiroyuki Inoue, András Gyenis, Zhijun Wang, Jian Li,
Fig. 3 Scan rate effects on the layer edge current.
The Atomic-scale Structure of the SiO2-Si(100) Interface
Ultrahigh mobility and efficient charge injection in monolayer organic thin-film transistors on boron nitride by Daowei He, Jingsi Qiao, Linglong Zhang,
Presentation transcript:

Quantum Mechanical Description of Displacement Damage Matthew J. Beck1, Ryan Hatcher1, R.D. Schrimpf2, D.M. Fleetwood2,1, and S. T. Pantelides1 1Department of Physics and Astronomy 2Department of Electrical Engineering and Computer Science Vanderbilt University, Nashville, TN 37235 USA MURI Review June 13th, 2007 Support: AFOSR

Introduction NIEL, Kinchin-Pease — threshold displacement energy Molecular dynamics (MD) — full atomistic dynamics Limitation: empirical potentials >1 keV: Accurate methods exist …but “terminal subclusters” are <1 keV events! Figure out how to say why empirical is less than ideal… Indicate that track sizes on the order system sizes of interest for <1keV events…. highly scaled techs are now on the scale of systems that can be directly simulated… (e.g. devices with active regions with size scales 10s nm) (fix) That low events can generate disordered regions on this size scale… for large device sizes, volume averaged properties are sufficient, while for highly scaled devices require single event level understandings…. for hihgly scaled devices, statistical understanding is insufficient… *Not integrated approach, rather approach for highly scaled studies… PKA Secondary Terminal Subclusters

First-principles Molecular Dynamics State-of-the-art quantum mechanical calculations Density functional theory, local density approximation Cell sizes: 216 atoms Calculation times: 100s of fs Dynamic “messiness” @ 100 fs Red atoms: KE > 0.22 eV Black atoms: displaced > 0.2 Å

Identifying Terminal Subclusters PKA Secondary Terminal Subclusters 500 eV displacement 15 eV displacement Write that XYZ is (100,010,001) in Si…

Identifying Terminal Subclusters Fraction of initial momentum along displacement direction remaining 500 eV 500 eV Fraction of initial momentum 15-100 eV 15-100 eV Time

Identifying Terminal Subclusters Fraction of initial momentum along displacement direction remaining 500 eV Fraction of initial momentum Fix discussion of agreement with empirical <>1keV understanding <=100 eV Time

Damage Scaling with Energy Natoms with KE > 0.22 eV  Natoms with Δr > 1.17 Å Even small KE events contribute! “Hot” atoms predict disordered atoms Damage Scaling: Density of secondary atoms independent of direction and energy Energy of secondary atoms dependent on initial displacement energy 25 eV displacement: Dynamic “messiness” @ 100 fs Red (hot) atoms: KE > 0.22 eV Black atoms: displaced > 0.2 Å Note: 0.22 eV  TmSi

Damage Scaling with Energy  1.5 nm 15 eV, 8 atoms 500 eV,  8 secondaries,  64 total atoms? Melt cylinder along ion track! Diameter for 500 eV ion:  3 nm

Experimental Melt Tracks A.F.M.J. Carvalho, et al., APL 90 073116 (2007) “A MURI collaborator”, don’t forget to put in citation…. FIG. 1. Top view of an AFM topographical measurement tapping mode of 0.63 MeV 208Pb32+ ion tracks in Si crystals with an 11.8 nm SiO2 layer irradiated at grazing incidence under 1° at 51010 ions/cm2. Ions have traversed from bottom to top white arrow. The number of tracks is in agreement with the expected average ion impact areal density of 9 per m2. The brightest regions correspond to the highest topographical areas and the darkest zones represent the lowest topographical edges. The outline around a track corresponds to the reference mark for the topographic height profile along the track. The white arrow refers to the ion beam direction. AFM image of recrystalized Si along glancing Pb ion tracks at the Si/SiO2 interface. White arrow shows incident ion direction

Conclusions Quantum mechanical calculations are effective tools for probing atomic scale dynamics of <1 keV displacements Quantitatively identify terminal subclusters Low energy displacements contribute to dynamical damage formation Single displacement damage events can disorder volumes of atoms which are significant in highly scaled devices Fix bullets. Highly scaled stuff, not just QM issues…