Update on Chemical WG Proposal 4/9/2019 11:57 PM SIA in the US Update on Chemical WG Proposal Shanghai, China February 21-23, 2011 Reed Content GLOBALFOUNDRIES Talking Points

Proposal (From Kobe Meeting) Background Governments in several regions are creating chemical regulations that have the potential to affect IC production and products: EU – REACH US - TSCA Rewrite Japan - reform of the Chemical Control Law Regardless of regulations source region, these impact IC manufacturing globally It is increasingly difficult to understand impact of new chemical regulations to operations and products Benefit It is important to understand how our chemical and raw material uses impact human health and the environment. This information should be considered precompetitive. Working collectively to understand these regulations and their impacts will more quickly help us to determine: Criticality Uses and controls Voluntary agreements for use elimination Raw material supply protection until replacement ESH Task Force, PFOS Working Group Proposal

Proposal (From Kobe Meeting) We anticipate the majority of PFOS activity will conclude in 2011 and chemical use and control expert resources will become more available to work on a larger variety of issues Beginning in 2011 a shorter amount of time can be provided in the PFOS WG to begin formal work on identifying global chemical risk issues As PFOS work diminishes, global chemical work can increase while PFOS is worked to its conclusion A risk assessment will be used to push real issues to the surface for expert review while assessing a wide variety of chemical risk issues The PFOS Working Group would change names to the Chemical Working Group Proposed Meeting Schedule Activity Feb-11 Jun-11 Sep-11 Feb-12 Sep-12 Feb-13 Jun-13 Sep-13 PFOS Report 75% Report 25% 10% 0%   Chemical Risk Model 5% Identified chemical issues 30% 45% 50% Consider collective actions 15% 20% 35% ESH Task Force, PFOS Working Group Proposal

Proposed New Chemical WG Charter (From Kobe Meeting) Purpose/Scope: Identify potential regulation risks and develop policy positions for chemicals used in semiconductor manufacturing and products. Team deliverable/product The team will continue reporting PFOS activities until Voluntary Agreement commitments are fulfilled, and the potential risk to the environment is greatly diminished. The team will create a chemical risk assessment process that identifies global regulatory listings that could impede or limit supply of critical chemicals and materials used in semiconductor manufacturing. A status report will be presented at each ESH Task Force meeting. The team will consider high risk chemicals and create a case for action that may include voluntary agreements or development of technical information in support of establishing an industry-wide policy. Measures of success Robust risk evaluation process that considers eco and human toxicity, impending regulations, supply concerns, manufacturing use and final product considerations. The process will be considered and improved at each WG meeting to ensure effectiveness and keep pace with evolving risk criteria. Regional SIA’s are confident that issues are being identified with enough time to determine the appropriate courses of action without severe impact to manufacturing operations. Maintain a positive reputation for environmental stewardship in the Semiconductor industry, consistent with our demonstrated record of successful management of chemical risks. ESH Task Force, PFOS Working Group Proposal

Action Item from Kobe ESH TF Meeting “ESH TF agreed to review example chemical concern topics and consider value derived for each association. If value is agreed the TF will determine the need for formal Chemical WG activity in Shanghai.” Issue Examples Responses of SIA in each region CHINA CHINESE TAIPEI EUROPE JAPAN KOREA US CA Green Chemistry Law   Yes No India RoHS Maybe China RoHS Nanomaterials REACH SVHCs-products Conflict / critical metals ESH Task Force, PFOS Working Group Proposal