ALD work status and next plan Nov-23-2010 Anil Mane, Qing Peng, Jeff Elam ALD Research Program, Process Technology Research Group Energy Systems Division.

ALD work current status: Two 33mm MCPs to Prof. Ossy (10/22/10) Working MCPs (4) to Matt and presented data and testing continue Processed 3x 33mm AAO MCPs with active area of ~1.5cm2 20µm pores form Hau Prior to ALD coating 2 MCP has cracked and chip off These MCPs are very fragile and got random crack during handling but active area is good Sent for electrode coating at Fermi lab Demonstrated 8”x8” Grid spacer coating by ALD with appropriate resistance (3M) Demonstrated first time 8”x8” MCP coating by ANL ALD group Processed with ALD resistive chemistry (1 ,2) and SEE ( 1, 2) MCP sent to Prof. Ossy for electrode deposition, gain test and many more test…. Note: these MCPs has cracked prior to deposition (during shipping from Incom to ANL)

ALD Plan-1: Goal: Mock tile we need following items to prepare: (Target date = Feb/11) 4x pairs of 33mm MCPs with same resistance (ALD chemistry -2) 2 pair will have MgO and other 2 pairs will have ALO SEE layer 3x  8”x8” grid spacers coating Resistance of grid will be depend on the MCP resistance and current flowing through circuit 2x “George space” glass pate with 4x 33 mm holes 10x higher resistance than MCP for charge dissipation Ship mock tile to Prof. Ossy for testing 2x pairs (4x  33mm MCPs) with same chemistry to Matt RGeorge >>RMCP

Resistance calculations for one section: The resistance calculation will based on MCP resistance Layer Thickness (mm) number of items R Item (MOhm) R Layer (MOhm) V(V) I(μA) grid 1 0.7 1 8.75 140 16 MCP 1 1.2 4 30 7.5 1200 grid 2 1.1 13.75 220 MCP 2 grid 3 2.5 31.25 500 Total 6.7   68.75 3260 Note: R George >= 750 MOhms

ALD Plan-2: Goal: To study simulation vs. experimental data comparison (Target date: Mid Dec/10) 3x 33mm MCPs to Matt gain test: Half resistive-only, half 2 nm MgO Half resistive-only, half 20 nm MgO Half resistive-only, half 20 nm Al2O3   Coupons to Slade for SEE measurements: Only resistive 2nm MgO on resistive 20 nm MgO on resistive 20 nm Al2O3 on resistive Both gain and SEE data will supply to Zeke, Valentin for simulation Resistive Layer Resistive Layer + SEE SEE layer Resistive layer Substrate Resistive layer Substrate

Near term requirements: Good 33mm MCPs (Received 11/22/10) Good 8”x8” MCPs Good 8”x8” Grids Good 8”x8” George Spacers For better electrical data: 8”x8” MCP holder for electrode (design is given to Fermi lab) 8”x8” Grid holder for electrode (Al plate with grid impression grove)

8”x8” Grid holder for electrode Grove in Al plate as per 8”x8” Grid dimension Push rods/screws To hold the MCP 8.5”x8.5”x10mm Al plate

8”x8” Grid holder for electrode

8”x8” Grid holder for electrode

8”x8” Grid holder for electrode Evaporation source