Journal Club Articles from 2013.04.20. to 2013.04.27. Topological Insulator Materials - Yoichi Ando

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Journal Club Articles from to Topological Insulator Materials - Yoichi Ando Diamond shows promise for a quantum Internet - Richard Van Noorden Competition between the Superconducting Proximity Effect and Coulomb Interactions in a Graphene Andreev Interferometer - Fabio Deon, Sandra Šopić, Alberto F. Morpurgo A ballistic pn junction in suspended graphene with split bottom gates - Anya L. Grushina, Dong-Keun Ki, Alberto F. Morpurgo Nanoseminar

A ballistic pn junction in suspended graphene with split bottom gates Anya L. Grushina, Dong-Keun Ki, Alberto F. Morpurgo Department de Physique de la Matiere Condensee (DPMC) and Group of Applied Physics (GAP), University of Geneva, 24 Quai Ernest-Ansermet, CH1205 Geneve, Switzerland Nanosemiar Márton Attila

A ballistic pn junction in suspended graphene with split bottom gates Sample preparation Nanoseminar doped Si substrate covered with 300 nm SiO2 predefined gate electrodes (10 nm Ti/30 nm Au) 450-nm-thick LOR layer (polydimethylglutarimide (PMGI)-based lift-of resist) Ti/Au electrodes (10/60 nm) single layer graphene water soluble polymer a 9 wt.% poly(4- styrenesulfonic acid) solution in water) PMMA 1,6 um

A ballistic pn junction in suspended graphene with split bottom gates Sample preparation - Setup Nanoseminar doped Si substrate covered with 300 nm SiO2 predefined gate electrodes (10 nm Ti/30 nm Au) 450-nm-thick LOR layer (polydimethylglutarimide (PMGI)-based lift-of resist) Ti/Au electrodes (10/60 nm) single layer graphene water soluble polymer a 9 wt.% poly(4- styrenesulfonic acid) solution in water) PMMA 1,6 um V2V2 V1V1 high current 4.2K transport measurements as a function of V 1 and V 250 mK electrical tuning of the charge carrier density P-N junction

A ballistic pn junction in suspended graphene with split bottom gates Nanoseminar V2V2 V1V1 n 1 [10 10 cm -2 ] = 1.0xV 1 [V] xV 2 [V] n 2 [10 10 cm -2 ] = 0.2 xV 1 [V] + 1.4x V 2 [V] – 0.4 1,6 um

A ballistic pn junction in suspended graphene with split bottom gates Nanoseminar V2V2 V1V1 opposite polarity regions results p- n junction 1,6 um

A ballistic pn junction in suspended graphene with split bottom gates Nanoseminar V2V2 V1V1 opposite polarity regions results p- n junction large contribution to the resistance Fabry-Perot oscillations (previously in graphene p-n-p junctions on Si/SiO 2 substrate) 1,6 um

A ballistic pn junction in suspended graphene with split bottom gates Nanoseminar V2V2 V1V1 Fabry-Perot oscillations (previously in graphene p-n-p junctions on Si/SiO 2 substrate) two F-P vcavities (between M-G, GP-GN and G-M interface) checkboard pattern From n the size of the cavities can be extracted ~ 800um (a simple particle-in-a-box approximation) 1,6 um

A ballistic pn junction in suspended graphene with split bottom gates Nanoseminar Applying B magnetic field – further evidence for F- P oscillations

A ballistic pn junction in suspended graphene with split bottom gates Nanoseminar Applying B magnetic field – further evidence for F- P oscillations exhibits a phase shift at B ~20-30 mT (<< mT) the perpendicular B field bend the electron trajectories in the cavities critical B field when in p-space the origin is included additional Berry- phase ( π ) is acquired

A ballistic pn junction in suspended graphene with split bottom gates Nanoseminar Applying B magnetic field – further evidence for F- P oscillations exhibits a phase shift at B ~20-30 mT (<< mT) the perpendicular B field bend the electron trajectories in the cavities critical B field when in p-space the origin is included additional Berry- phase ( π ) is acquired temperature-dependaence of the oscillations - oscillations 40K ~3,5meV

A ballistic pn junction in suspended graphene with split bottom gates Anya L. Grushina, Dong-Keun Ki, Alberto F. Morpurgo Department de Physique de la Matiere Condensee (DPMC) and Group of Applied Physics (GAP), University of Geneva, 24 Quai Ernest-Ansermet, CH1205 Geneve, Switzerland 1,6 um Presence of p-n juntcion Ballistic regime comparable to the device size Preparation process preserves the high quality of the material