A very brief introduction to beam manipulation John Power

Why do Beam Manipulation? May eliminate the need for the electron damping ring for the ILC and replace it a RF photocathode based injector system ILC requirement  g(ex, ey, ez) = (8, 0.02, 3000) mm e6D=(ex*ey*ez)1/3 = 10 mm RF Photoinjector capability  (ex, ey, ez) = (5, 5, 8) mm e6D=(ex*ey*ez)1/3 = 5 mm Can we manipulate the RF Photoinjector phase space to put the emittance where we need it?

Can we replace the ILC electron damping ring with an RF photoinjector? Yes, maybe, on paper  flat-beam transformation + emittance exchange round-to-flat-beam transformation (5, 5, 8)  (1250, 0.02, 8)  (8, 0.02, 1250) Emittance exchange

EEX experiment at the AWA ex= 5 mm ey=18 mm ez= 21 mm ex=21 mm ey=17 mm ez= 3 mm Emittance Exchanger Gun Linac TQ1,TQ2,TQ3 TM110 ILC requirement: g(ex, ey, ez) = (8, 0.02, 3000) mm e6D=g (ex*ey*ez)1/3 = 10 mm RF Photoinjector capability: g(ex, ey, ez) = (5, 5, 8) mm ge6D=gex*ey*ez = 5 mm in collaboration with FNAL/NIU

Original MaRIE 50-keV XFEL Baseline Concept Electron Injector Linear Accelerator Bunch Compressor Undulator X-rays Beam Electron Beam Dump Wavelength 0.024 nm Beam energy 35.3 GeV Pulse length 74 fs Bunch charge 0.25 nC Peak current 3.4 kA Normalized rms emittance 0.2 mm rms Energy spread 0.01% Undulator period 3 cm Undulator Krms 2.624 Undulator type Length Planar hybrid PM 120 m Probably wouldn’t work – ISR leads to energy spread

MaRIE 50-keV XFEL using Beam Manipulation 2-cm period wiggler S-band linac to 20 GeV S-band linac to 1 GeV EEX or Stupakov echo Emittance manipulation stage Prebunch stage FBT 1: L=0 mm ex ~ 3.5 mm ey ~ 0.14 mm ez ~ 1.4 mm EEX 1: L=20 mm ey ~ 1.4 mm ez ~ 0.14 mm EEX 3: L=0 mm ex ~ 100 mm ey ~ 0.14 mm ez ~ 0.14 mm EEX 4: L=0 mm ex ~ 0.14 mm ez ~ 100 mm 0.25 nC (prebunched) FBT 2: L=0 mm ex ~ 35 mm ey ~ 0.14 mm ez ~ 0.14 mm EEX 2: L=0 mm ex ~ 0.14 mm ez ~ 35 mm 500 kV DC injector or AFEL copy or CTF3 copy 0.50 nC, L=1.75 mm ex ~ 0.7 mm ey ~ 0.7 mm ez ~ 1.4 mm

High frequency bunch train generation spatial temporal Dt TM110 1/f Dx e-beam mask + Exchanger Advantage: High Q potential since the mask is after space charge regime Disadvantage: Difficult to independently control the intensity of the drive and witness *in collaboration with P. Piot at NIU

High frequency bunch train generation beam loading in PWFA Dt Dx laser mask NDF Ramp TM110 Exchanger Advantage: Easy to control spatial profile of the laser Independent control of drive and witness intensity Disadvantage: Difficult to control space charge effects in gun

High frequency bunch train generation laser mask Dt TM110 Dx 1/f Dx e-beam mask Advantage: Allows possibility of High Charge and easy to control witness

Summary Beam Manipulation is being studied for light sources and linear colliders, many other applications may benefit too. Beam Manipulation Experiments are underway at Fermilab and Argonne