Metal Assisted Chemical Etching (MacEtch)

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Presentation transcript:

Metal Assisted Chemical Etching (MacEtch) Professor: Xiuling Li Graduate mentors: Dr. Munho Kim, Jeong Dong Kim Andy Haige Chen Simon Shixin Wu

Overview of the Project Etching: a method in microfabrication to remove layers from the surface of a wafer MacEtch: uses metal (such as Au) as catalyst; produces extremely high ratio semiconductor nanostructure

Overview of the Project Scanning Electron Microscope (SEM): a type of electron microscope that produces images of a sample by scanning it with a focused beam of electrons; we use it to inspect the quality of etching

Progress Reading literatures Attending weekly group meetings Writing proposal for MRL Attending lectures Taking trainings both online and onsite for the equipment (we still have two sessions to complete the JEOL 6060 SEM training)

Goal by the End of Semester To be able to work on the project independently To get trained and gain access on all the techniques we need To have a better understanding of semiconductor materials and devices

Citations http://mocvd.ece.illinois.edu/research/MacEtch.html https://en.wikipedia.org/wiki/Etching_(microfabrication) https://en.wikipedia.org/wiki/Scanning_electron_microscope http://www.oxfordplasma.de/process/si_afm_k.htm https://www.photonicsonline.com/doc/dsi-solderable-face-metallization-optical-coatings-0001 http://test.web.deu.edu.tr/metalurjimalzeme/index.php?option=com_content&view=article&id=166&Itemid=186&lang=tr