ANL MCP #145 Phosphor Tests 1/24/2011 Incom substrate, 33mm diameter, ANL MCP#145 20µm pores, 8° bias, 60:1 L/D, 65% OAR Chemistry 2 resistive layer, MgO.

Slides:

Advertisements

Similar presentations

First 8 Ranks Top 4 Ranks.

Advertisements

NALHFA 2012 Annual Educational Conference Meeting the Challenge: Creating Opportunities and Developing New Solutions in Affordable Housing April 25-28,

SOGANG UNIVERSITY SOGANG UNIVERSITY. SEMICONDUCTOR DEVICE LAB. Power MOSFET (3) SD Lab. SOGANG Univ. BYUNGSOO KIM.

The Advantages of Group Relamping

PHEMOS UV Imager Summary. Status on Tasks COM DEV and U of C signed a contract in December Provided feedback on science requirements Started to look at.

End-Spoiling of Electrodes from Photonis June, 24 th 2010 Qing Peng, Anil U. Mane, Jeffery W. Elam ALD Research Program, Process Technology Research Group.

Capacitive-Resistive Spacers by ALD Jeffrey Elam, Qing Peng, Anil Mane, Joe Libera Argonne National Laboratory May 4, 2010.

Speed-I View from Material Side Qing Peng, Anil U. Mane, Jeffrey W. Elam Energy Systems Division Argonne National Laboratory Limitations on Fast Timing.

MCP Electrodes and End Spoiling

O. Siegmund 11/15/11 20 cm and 33mm MCP Test Progress Lifetest with #164/163 continues – now close to 2 C cm -2 New batch of 33mm test MCPs arrived Chem-3.

ALD 20µm Microchannel Plates

Facilities and Program for Coating 8” Plates Jeffrey Elam, Anil Mane, Qing Peng, Joseph Libera Argonne National Laboratory LAPD Collaboration Meeting June.

Scale-Up Activities in Atomic Layer Deposition at Argonne Jeffrey Elam, Anil Mane, Joe Libera December 9, 2011 Large Area Picosecond Photodetector Collaboration.

WSO/UV-LSS Detector with large dimension MCP Baosheng Zhao* National Astronomical Observatories of CAS *

High-Temp Life Test #1 Update Jason McPhate LAPP Tuesday Telecon 17 May 2011.

Update on Channel Plate Testing B. Adams, K. Attenkofer, M. Chollet, Z. Insepov, J. McPhate, O. Siegmund, D. Walters, M. Wetstein, Z. Yusof for the LAPPD.

Design and fabrication of electrical measurement system for microchannel plates (LAPD weekly group meeting) Feb Anil Mane, Qing Peng, Jeffrey Elam.

Gas measurements and CsI photocathode studies at WIS Ilia Ravinovich November 2002 Weizmann Institute.

Test Beam the μ-RWELL Test Beam the μ-RWELL G. Bencivenni (a), R. de Oliveira (b), M. Gatta (a), G. Felici (a), G. Morello (a), M. Poli Lener (a) (a),

Preparation of Mock tile MCPs Anil Mane, Qing Peng, Jeffrey Elam Argonne National Laboratory.

Berkeley Update Oswald Siegmund & Jason McPhate LAPP Weekly Telecon 11 January 2011.

MCP MicroPitting and Performance Issues Latest 40µm pore 8” MCPs had some patchy discoloration Cleaning using standard techniques at SSL made no difference.

O. Siegmund, UCB, SSL 1 Incom substrate, 33mm diameter, ANL#103 20µm pores, 8 deg bias, 60:1 L/D, 65% OAR Electrode deposited last (on top/bottom) ANL.

© Synkera Technologies, Inc.

Space Sciences Laboratory, University of California, Berkeley Arradiance ALD/Incom MCP Scrub and Life Test Incom substrate 40µm pores, 8 deg bias, 40:1.

LAPPD Collaboration Review 12/9/2011 Ossy Siegmund, Sharon Jelinsky, Jason McPhate, Joe Tedesco Experimental Astrophysics Group, Space Sciences Laboratory,

Resistive protections Rui de Oliveira 09/12/15

Space Sciences Laboratory, University of California, Berkeley SSL-UCB, ALD MCP Test Progress ML201-B-2 12nm ALD After cleaning ML201-B-1 6nm ALD.

ALD Thin Film Materials LDRD review 2009NuFact09.

Atomic Layer Deposition for Microchannel Plates Jeffrey Elam Argonne National Laboratory September 24, 2009.

Status of ALD MCP Program at Argonne within last Six Months Qing Peng, Anil Mane, Joe Libera, Jeffrey Elam Energy Systems Division.

3.TRANSISTOR CIRCUIT CONFIGURATION

33mm MCP Testing at UC Berkeley

Atomic Layer Deposition for Microchannel Plate Fabrication at Argonne

Thermal annealing effect of tetrahedral amorphous carbon films deposited by filtered vacuum arc Youngkwang Lee *†,Tae-Young Kim*†, Kyu Hwan Oh†, Kwang-Ryeol.

Fluroscopy and II’s. Fluroscopy Taking real time x-ray images Requires very sensitive detector to limit the radiation needed Image Intensifier (II) is.

Update from ALD group IN ANL Qing Peng, Anil Mane, Jeff Elam Energy System.

Team Corrosion EE412 Week 4 Alex and Joey Mentor: J Provine.

(8”x8”) MCPs Resistance Measurements Oct 04, 2011 Anil Mane, Jeffrey Elam.

(8”x8”) MCPs Resistance Optimization by ALD Sept 20, 2011 Anil Mane, Jeffrey Elam.

O. Siegmund, UCB, SSL 1 Incom substrates, 33mm diameter, no notches 20µm pores, 8 deg bias, 60:1 L/D, 65% OAR ANL processed for resistive and emissive.

Simulation geometry 2000 V terminal Vacuum Glass substrate, ε = 5.8 Resistive coating, ε = 6.8 and σ = 1e-8 S/m The pore has a 40μ diameter and 40:1 aspect.

Discrete Dynode Structures Using ALD and Other Techniques for MCPs

Detector development for

ALD MCP 116 Life Test Update

Nanocrystal Diamond SEE Layer for MCP’s

Progress of ALD Group for MCP

MCP Electrodes and End Spoiling

SSL-UCB, ALD/Incom MCP Test

ALD work status and next plan Nov

Single 20µm MCP Phosphor Tests 7/27/2010

Detector development for

UCB Progress with 8” MCPs and Testing

MCP from Glass Substrates

Insulators and Conductors

Plans for ALD on Large Substrates (8”x8”) July 5, 2011

Large area Inconel coatings

Arradiance ALD/Incom MCP Test

SSL-UCB, ALD MCP Test Progress

Status of ALD on (8”x8”) MCPs/Substrates Jan

Grid space coating-updates 05/01/2012

Status of AAO 33mm plates at ANL

ALD work status and next plan Nov

Incom MCP 20µm Substrates 7/27/2010

Characterization Update

Status of ALD 33 mm MCP Development at Argonne

Anil Mane, Qing Peng, Jeffrey Elam Argonne National Laboratory

ALD on MCPs updates LAPD group meeting presentation 10/16/2012

Progress of DLC Resistive Electrode

Presentation transcript:

ANL MCP #145 Phosphor Tests 1/24/2011 Incom substrate, 33mm diameter, ANL MCP#145 20µm pores, 8° bias, 60:1 L/D, 65% OAR Chemistry 2 resistive layer, MgO SEE layer Electrode deposited on top of ALD layers Annealing conditions unknown (Anil?) 25MΩ in air with DMM. 25MΩ in vacuum initially with DMM, then drifts up to 70MΩ. 25MΩ in vacuum at voltage (20µA at 500V) 25 January 2011J. McPhate – LAPP Main Telecon1

MCP #145, Phosphor Imaging 25 January 2011J. McPhate – LAPP Main Telecon2 1000V900V Screen 3000V for all

Output vs. Voltage 25 January 2011J. McPhate – LAPP Main Telecon3 Hard to make direct comparison to MCP #103 (Ar anneal discolored MCP), but looks to be significantly higher gain. Note use of one penray lamp on MCP #145, versus two lamps for MCP #103, yet output is about twice.